Patents by Inventor Mitsuharu Fujimoto

Mitsuharu Fujimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110143168
    Abstract: Disclosed is a Co—Fe alloy for soft magnetic films used in perpendicular magnetic recording media, etc., which maintains high soft magnetic properties and has excellent weather resistance. Disclosed is a Co—Fe alloy for soft magnetic films, which is a Co—Fe alloy the composition formula of which is expressed at atomic ratio as ((Co100?X—FeX)100?Y—NiY)100?(a+b+c)-Mla-M2b-Tic, where 5?X?80, 0?Y?25, 2?a?6, 2?b?10, and 0.5?c?10, the remainder of which is composed of unavoidable impurities, and wherein the element M1 in the aforementioned composition formula is one or two or more elements selected from (Zr, Hf, Y), and the element M2 in the aforementioned composition formula is one or two or more elements selected from (Ta, Nb).
    Type: Application
    Filed: October 30, 2009
    Publication date: June 16, 2011
    Applicant: HITACHI METALS, LTD.
    Inventors: Tomonori Ueno, Jun Fukuoka, Hide Ueno, Mitsuharu Fujimoto
  • Patent number: 7381282
    Abstract: A Co alloy target comprising 1 to 10 atomic % of Zr and 1 to 10 atomic % of Nb and/or Ta, the balance being unavoidable impurities and Co, is produced by rapidly solidifying a melt of the Co alloy to produce an alloy powder, classifying the alloy powder to maximum particle size of 500 ?m or less, and pressure-sintering the classified alloy powder.
    Type: Grant
    Filed: April 5, 2005
    Date of Patent: June 3, 2008
    Assignee: Hitachi Metals, Ltd.
    Inventors: Tomonori Ueno, Hide Ueno, Hiroshi Takashima, Mitsuharu Fujimoto
  • Publication number: 20080083616
    Abstract: The present invention relates to a Co—Fe—Zr based alloy target material for forming a soft magnetic film of the Co—Fe—Zr based alloy used in a perpendicular magnetic recording medium, and provides a Co—Fe—Zr based alloy target material having a low magnetic permeability and good sputtering characteristics and a process for producing this target material. A Co—Fe—Zr based alloy sputtering target material represented by the compositional formula based on the atomic ratio: (Cox—Fe100-X)100-(Y+Z)—ZrY-MZ (20?X?70, 2?Y?15 and 2?Z?10) in which the element(s) M is one or more elements selected from the group consisting of Ti, V, Nb, Ta, Cr, Mo, W, Si, Al and Mg, wherein a phase composed of HCP-Co and an alloy phase composed mainly of Fe are finely dispersed in the microstructure of the target material.
    Type: Application
    Filed: October 9, 2007
    Publication date: April 10, 2008
    Applicant: HITACHI METALS, LTD.
    Inventors: Jun Fukuoka, Hiroshi Takashima, Tomonori Ueno, Mitsuharu Fujimoto, Hide Ueno
  • Publication number: 20050223848
    Abstract: A Co alloy target comprising 1 to 10 atomic % of Zr and 1 to 10 atomic % of Nb and/or Ta, the balance being unavoidable impurities and Co, is produced by rapidly solidifying a melt of the Co alloy to produce an alloy powder, classifying the alloy powder to maximum particle size of 500 ?m or less, and pressure-sintering the classified alloy powder.
    Type: Application
    Filed: April 5, 2005
    Publication date: October 13, 2005
    Inventors: Tomonori Ueno, Hide Ueno, Hiroshi Takashima, Mitsuharu Fujimoto