Patents by Inventor Mitsuharu Isobe

Mitsuharu Isobe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming a pattern film with a narrower width
    Patent number: 7866029
    Abstract: A method for forming a pattern film with a narrower width than the resolution of an exposure machine and a resist used independently of etching is provided. The method comprises the steps of: forming a first frame layer having end surfaces facing each other across a space having a width W1; forming a second frame layer having end surfaces facing each other across a space having a width W2 that is larger than the width W1, the space having the width W2 being located right above the space having the width W1; forming a trench-forming film provided with a trench having a minimum width W3 that is smaller than the width W1 so as to fill at least a part of the spaces having the width W1 and the width W2 respectively; and forming a pattern film so as to fill at least a part of the trench.
    Type: Grant
    Filed: March 22, 2007
    Date of Patent: January 11, 2011
    Assignee: TDK Corporation
    Inventors: Hirotaka Gomi, Mitsuharu Isobe, Noriyuki Ito, Hiroaki Funada, Takeshi Yamana, Makoto Terasawa, Yasuhiro Hasegawa
  • Processing method of thin-film and manufacturing method of thin-film magnetic head
    Patent number: 7569332
    Abstract: A processing method of a thin-film includes a step of forming a predetermined pattern film or predetermined elements on a substrate or on a film formed in an upstream process, a step of forming a transparent film over the formed predetermined pattern film or predetermined elements, a step of forming a pattern-transferred film having shapes corresponding to shapes of the formed predetermined pattern film or predetermined elements, on the formed transparent film, and a step of forming an opaque film on the pattern-transferred film.
    Type: Grant
    Filed: February 25, 2005
    Date of Patent: August 4, 2009
    Assignees: TDK Corporation, SAE Magnetics (H.K.) Ltd.
    Inventors: Mitsuharu Isobe, Hiromichi Umehara, Hirotaka Gomi, Tomohide Yokozawa
  • Forming method of pattern film with narrower width and thin-film magnetic head having magnetic pole layer with narrower width
    Publication number: 20070223141
    Abstract: A method for forming a pattern film with a narrower width than the resolution of an exposure machine and a resist used independently of etching is provided. The method comprises the steps of: forming a first frame layer having end surfaces facing each other across a space having a width W1; forming a second frame layer having end surfaces facing each other across a space having a width W2 that is larger than the width W1, the space having the width W2 being located right above the space having the width W1; forming a trench-forming film provided with a trench having a minimum width W3 that is smaller than the width W1 so as to fill at least a part of the spaces having the width W1 and the width W2 respectively; and forming a pattern film so as to fill at least a part of the trench.
    Type: Application
    Filed: March 22, 2007
    Publication date: September 27, 2007
    Applicant: TDK Corporation
    Inventors: Hirotaka Gomi, Mitsuharu Isobe, Noriyuki Ito, Hiroaki Funada, Takeshi Yamana, Makoto Terasawa, Yasuhiro Hasegawa
  • Processing method of thin-film and manufacturing method of thin-film magnetic head
    Publication number: 20050233260
    Abstract: A processing method of a thin-film includes a step of forming a predetermined pattern film or predetermined elements on a substrate or on a film formed in an upstream process, a step of forming a transparent film over the formed predetermined pattern film or predetermined elements, a step of forming a pattern-transferred film having shapes corresponding to shapes of the formed predetermined pattern film or predetermined elements, on the formed transparent film, and a step of forming an opaque film on the pattern-transferred film.
    Type: Application
    Filed: February 25, 2005
    Publication date: October 20, 2005
    Applicants: TDK Corporation, SAE Magnetics (H.K.) Ltd.
    Inventors: Mitsuharu Isobe, Hiromichi Umehara, Hirotaka Gomi, Tomohide Yokozawa