Patents by Inventor Mitsuharu Obara

Mitsuharu Obara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photopolymerizable compositions including squarylium compounds
    Patent number: 6007965
    Abstract: The present invention relates to photopolymerizable compositions comprising an addition-polymerizable compound which has at least one ethylenically unsaturated double bond; a radical-producing agent and a squarylium compound represented by the formula (I): The compositions are highly sensitive to visible and near infrared lights, particularly He-Ne laser, LED, diode laser, etc. having oscillation wavelengths in a wavelength region of 600 nm or more, and thus are useful as materials for holograms, presensitized plate for laser direct process, dry film resists, digital proofs, photosensitive microcapsules.
    Type: Grant
    Filed: October 7, 1997
    Date of Patent: December 28, 1999
    Inventors: Tsuguo Yamaoka, Kenichi Koseki, Mitsuharu Obara, Ikuo Shimizu, Yukiyoshi Ito, Hitoshi Kawato
  • Photopolymerizable composition containing an addition polymerizable compound, a radical-producing agent and a squarylium compound
    Patent number: 5756258
    Abstract: The present invention relates to photopolymerizable compositions comprising an addition-polymerizable compound which has at least one ethylenically unsaturated double bond; a radical-producing agent and a squarylium compound represented by the formula (I): ##STR1## The compositions are highly sensitive to visible and near infrared lights, particularly He-Ne laser, LED, diode laser, etc. having oscillation wavelengths in a wavelength region of 600 nm or more, and thus are useful as materials for holograms, presentized plates for laser direct process, dry film resists, digital proofs, photosensitive microcapsules.
    Type: Grant
    Filed: February 10, 1995
    Date of Patent: May 26, 1998
    Assignee: Kyowa Hakko Co., Ltd.
    Inventors: Tsuguo Yamaoka, Kenichi Koseki, Mitsuharu Obara, Ikuo Shimizu, Yukiyoshi Ito, Hitoshi Kawato
  • Chemical amplification resist composition containing photochemical acid generator, binder and squarylium compound
    Patent number: 5527659
    Abstract: There is described a chemical amplification resist composition which comprises squarylium compounds represented by the formula (I): ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and represent substituted or unsubstituted aminophenyl, 9-julodidyl, Y.dbd.CH-- (wherein Y represents substituted or unsubstituted heterocyclic group containing nitrogen, or a group: ##STR2## (wherein Z.sup.1 and Z.sup.2 are the same or different and represent substituted or unsubstituted phenyl), photochemical acid generator and binders.
    Type: Grant
    Filed: October 28, 1994
    Date of Patent: June 18, 1996
    Assignee: Kyowa Hakko Kogyo Co., Ltd.
    Inventors: Tsuguo Yamaoka, Kenichi Koseki, Mitsuharu Obara, Ikuo Shimizu, Yukiyoshi Ito