Abstract: A packing device includes: a packing box with an internal space capable of storing a packing target object with a protection target part, and with a packing box inner surface that is at least one inner surface positioned to face the protection target part of the packing target object; and a holding material configured to, when stored in the internal space together with the packing target object, maintain a space between the protection target part and the packing box inner surface by coming into contact with the packing box inner surface and a contact surface of the packing target object facing the packing box inner surface, while staying out of contact with the protection target part of the packing target object.

Abstract: A packing device includes: a packing box with an internal space capable of storing a packing target object with a protection target part, and with a packing box inner surface that is at least one inner surface positioned to face the protection target part of the packing target object; and a holding material configured to, when stored in the internal space together with the packing target object, maintain a space between the protection target part and the packing box inner surface by coming into contact with the packing box inner surface and a contact surface of the packing target object facing the packing box inner surface, while staying out of contact with the protection target part of the packing target object.

Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3,000, of 70% or more.

Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3000, of 70% or more.

Abstract: It is to obtain a silica glass suitable as a material for an optical material constituting an optical system to be used for EUVL, which has a low coefficient of thermal expansion from 0 to 100° C., and on which formation of concave defects is suppressed in a polishing step to achieve a high level of flatness. A silica glass containing from 0.1 to 10 mass % of Sn calculated as SnO2 and from 3 to 10 mass % of Ti calculated as TiO2, which has a homogeneity of the coefficient of thermal expansion from 0 to 100° C. to the temperature of from 50 to 200 ppb/° C., a coefficient of thermal expansion from 0 to 100° C. of 0±250 ppb/° C., and a Vickers hardness of at most 650.

Abstract: It is to obtain a silica glass suitable as a material for an optical material constituting an optical system to be used for EUVL, which has a low coefficient of thermal expansion from 0 to 100° C., and on which formation of concave defects is suppressed in a polishing step to achieve a high level of flatness. A silica glass containing from 0.1 to 10 mass % of Sn calculated as SnO2 and from 3 to 10 mass % of Ti calculated as TiO2, which has a homogeneity of the coefficient of thermal expansion from 0 to 100° C. to the temperature of from 50 to 200 ppb/° C., a coefficient of thermal expansion from 0 to 100° C. of 0±250 ppb/° C., and a Vickers hardness of at most 650.

Abstract: To provide quartz-type glass for a microlithographic projection exposure apparatus, which contains at least 51 mass % of SiO2 and which further contains at least one member selected from the group consisting of lanthanum, aluminum, hafnium, nitrogen, scandium, yttrium and zirconium. It is a material which is useful for an illumination system for a microlithographic projection exposure apparatus or as a projection object lens and has a refractive index at 248 nm larger than 1.508 of quartz glass and a refractive index at 193 nm larger than 1.560 of quartz glass and which can be small-sized.

Abstract: External preparations for treating pruritus containing Aspirin as an active ingredient, which exert an excellent therapeutic effects on pruritus with less side effects.

Abstract: External preparations for allergic dermatitis containing Aspirin alone as the active ingredient, which exert an excellent therapeutic effects on allergic dermatitis with lower side effects; and a method for treating allergic dermatitis by using these agents for external use.