Patents by Inventor Mitsuhiro Nishio
Mitsuhiro Nishio has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8304323Abstract: [PROBLEMS] To provide a semiconductor element manufacturing method by which a semiconductor element having high accuracy and high function can be manufactured by controlling diffusion depth and diffusion concentration in a pn junction region with high accuracy. [MEANS FOR SOLVING PROBLEMS] A diffusion control layer (2) composed of a thin film of a substance having a smaller diffusion coefficient than that of a diffusion source (3) is formed between a surface of a substrate (1) and the diffusion source (3), and an element of the diffusion source (3) is permitted to thermally diffuse through the diffusion control layer (2). Thus, the diffusion depth and the diffusion concentration in the semiconductor region, which is formed on the surface portion of the substrate and has a conductivity type different from that of the substrate, can be highly accurately controlled, and the semiconductor element having high accuracy and high function can be manufactured.Type: GrantFiled: January 5, 2005Date of Patent: November 6, 2012Assignee: Saga UniversityInventors: Thoru Tanaka, Hiroshi Ogawa, Mitsuhiro Nishio
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Patent number: 7637700Abstract: A milling tool includes a cutting tool insert, roughly plate-shaped and having a rake face on an upper face and a flank on a side face and a main cutting edge at an intersection ridge line part at the intersection of the rake face and the flank, fitted in the periphery of a substantially cylindrical holder removably and so that an axial rake angle of the cutting edge ridge line of the main cutting edge is positive. When the cutting tool insert is rotated about the axis of rotation of the holder, the shape of the locus of rotation of the main cutting edge in a section parallel to the axis of rotation is made an approximate circular arc shape swelling outward with progress from the ends to the center.Type: GrantFiled: October 7, 2008Date of Patent: December 29, 2009Assignee: Kyocera CorporationInventors: Mitsuhiro Nishio, Kaoru Hatta, Yoshihide Kojima
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Publication number: 20090209094Abstract: [PROBLEMS] To provide a semiconductor element manufacturing method by which a semiconductor element having high accuracy and high function can be manufactured by controlling diffusion depth and diffusion concentration in a pn junction region with high accuracy. [MEANS FOR SOLVING PROBLEMS] A diffusion control layer (2) composed of a thin film of a substance having a smaller diffusion coefficient than that of a diffusion source (3) is formed between a surface of a substrate (1) and the diffusion source (3), and an element of the diffusion source (3) is permitted to thermally diffuse through the diffusion control layer (2). Thus, the diffusion depth and the diffusion concentration in the semiconductor region, which is formed on the surface portion of the substrate and has a conductivity type different from that of the substrate, can be highly accurately controlled, and the semiconductor element having high accuracy and high function can be manufactured.Type: ApplicationFiled: January 5, 2005Publication date: August 20, 2009Applicant: Saga UniversityInventors: Thoru Tanaka, Niroshi Ogawa, Mitsuhiro Nishio
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Patent number: 7558624Abstract: An apparatus for reverse iontophoresis has a base, an electrode provided on the base, an electrolytic gel provided on the electrode adapted for contacting a first part of a specimen, and for extracting a molecule from a first part of the specimen, a sensor chip placed underneath the electrolytic gel and having a pigment membrane containing a pigment that changes color by reaction with the molecule, a light source irradiating light on the pigment membrane, and a light sensor receiving a reflection of the light from the pigment membrane.Type: GrantFiled: October 23, 2003Date of Patent: July 7, 2009Assignee: Kabushiki Kaisha ToshibaInventor: Mitsuhiro Nishio
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Publication number: 20090103992Abstract: A milling tool includes a cutting tool insert, roughly plate-shaped and having a rake face on an upper face and a flank on a side face and a main cutting edge at an intersection ridge line part at the intersection of the rake face and the flank, fitted in the periphery of a substantially cylindrical holder removably and so that an axial rake angle of the cutting edge ridge line of the main cutting edge is positive. When the cutting tool insert is rotated about the axis of rotation of the holder, the shape of the locus of rotation of the main cutting edge in a section parallel to the axis of rotation is made an approximate circular arc shape swelling outward with progress from the ends to the center.Type: ApplicationFiled: October 7, 2008Publication date: April 23, 2009Applicant: KYOCERA CORPORATIONInventors: Mitsuhiro Nishio, Kaoru Hatta, Yoshihide Kojima
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Patent number: 7452167Abstract: A milling tool includes a cutting tool insert, roughly plate-shaped and having a rake face on an upper face and a flank on a side face and a main cutting edge at an intersection ridge line part at the intersection of the rake face and the flank, fitted in the periphery of a substantially cylindrical holder removably and so that an axial rake angle of the cutting edge ridge line of the main cutting edge is positive. When the cutting tool insert is rotated about the axis of rotation of the holder, the shape of the locus of rotation of the main cutting edge in a section parallel to the axis of rotation is made an approximate circular arc shape swelling outward with progress from the ends to the center.Type: GrantFiled: June 30, 2005Date of Patent: November 18, 2008Assignee: Kyocera CorporationInventors: Mitsuhiro Nishio, Kaoru Hatta, Yoshihide Kojima
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Publication number: 20060115340Abstract: A milling tool includes a cutting tool insert, roughly plate-shaped and having a rake face on an upper face and a flank on a side face and a main cutting edge at an intersection ridge line part at the intersection of the rake face and the flank, fitted in the periphery of a substantially cylindrical holder removably and so that an axial rake angle of the cutting edge ridge line of the main cutting edge is positive. When the cutting tool insert is rotated about the axis of rotation of the holder, the shape of the locus of rotation of the main cutting edge in a section parallel to the axis of rotation is made an approximate circular arc shape swelling outward with progress from the ends to the center.Type: ApplicationFiled: June 30, 2005Publication date: June 1, 2006Inventors: Mitsuhiro Nishio, Kaoru Hatta, Yoshihide Kojima
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Publication number: 20040188256Abstract: An apparatus for reverse iontophoresis has a base, an electrode provided on the base, an electrolytic gel provided on the electrode adapted for contacting a first part of a specimen, and for extracting a molecule from a first part of the specimen, a sensor chip placed underneath the electrolytic gel and having a pigment membrane containing a pigment that changes color by reaction with the molecule, a light source irradiating light on the pigment membrane, and a light sensor receiving a reflection of the light from the pigment membraneType: ApplicationFiled: October 23, 2003Publication date: September 30, 2004Applicant: Kabushiki Kaisha ToshibaInventor: Mitsuhiro Nishio
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Patent number: 4876690Abstract: A metal vapor laser apparatus of this invention includes at least two high reflecting mirrors arranged one near each side end portion of a discharge tube, heating units for heating the high reflecting mirrors, and transmission windows formed to transmit a laser beam reflected by the high reflecting mirrors.Type: GrantFiled: December 20, 1988Date of Patent: October 24, 1989Assignee: Kabushiki Kaisha ToshibaInventors: Naoto Nishida, Mitsuhiro Nishio