Patents by Inventor Mitsuhiro Yoshinaga

Mitsuhiro Yoshinaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9925704
    Abstract: An in-mold molding method of the present invention is a method including: placing an in-mold transfer film in the cavity of an injection molding mold, the in-mold transfer film having a hard coating layer and a transfer section of a printed layer; and peeling, from the base material film of the in-mold transfer film, the transfer section transferred to a molding resin when a molding molded by injecting the molding resin into the cavity is removed by mold opening. The hard coating layer is ruptured in a mold opening process while the in-mold transfer film has a necessary elongation of A % on the side of the molding and the hard coating layer has a rupture elongation of at least A %+2% and less than A %+40% on the side of the molding. With this configuration, the in-mold transfer film can be stably peeled during in-mold molding.
    Type: Grant
    Filed: September 19, 2013
    Date of Patent: March 27, 2018
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Takashi Nakagawa, Mitsuhiro Yoshinaga
  • Publication number: 20150290852
    Abstract: An in-mold molding method of the present invention is a method including: placing an in-mold transfer film in the cavity of an injection molding mold, the in-mold transfer film having a hard coating layer and a transfer section of a printed layer; and peeling, from the base material film of the in-mold transfer film, the transfer section transferred to a molding resin when a molding molded by injecting the molding resin into the cavity is removed by mold opening. The hard coating layer is ruptured in a mold opening process while the in-mold transfer film has a necessary elongation of A % on the side of the molding and the hard coating layer has a rupture elongation of at least A %+2% and less than A %+40% on the side of the molding. With this configuration, the in-mold transfer film can be stably peeled during in-mold molding.
    Type: Application
    Filed: September 19, 2013
    Publication date: October 15, 2015
    Inventors: Takashi Nakagawa, Mitsuhiro Yoshinaga
  • Patent number: 7814796
    Abstract: Provided is a partial pressure measuring method and a partial pressure measuring apparatus by which a partial pressure distribution is easily measured in a vacuum chamber. The partial pressure measuring method and the partial pressure measuring apparatus includes: moving a local plasma source dedicated to partial pressure measuring provided in the vacuum chamber, to a location at which the measuring is to be performed; and measuring a partial pressure distribution in the vacuum chamber, by receiving emission of plasma generated by the local plasma source through a window which is formed in a wall part of the vacuum chamber and through which the emission passes, and thereby performing emission spectral analysis on intensity of the emission.
    Type: Grant
    Filed: April 16, 2008
    Date of Patent: October 19, 2010
    Assignee: Panasonic Corporation
    Inventors: Masahiro Yamamoto, Takeshi Koiwasaki, Hitoshi Yamanishi, Isao Muragishi, Mitsuhiro Yoshinaga
  • Publication number: 20080257014
    Abstract: Provided is a partial pressure measuring method and a partial pressure measuring apparatus by which a partial pressure distribution is easily measured in a vacuum chamber. The partial pressure measuring method and the partial pressure measuring apparatus includes: moving a local plasma source dedicated to partial pressure measuring provided in the vacuum chamber, to a location at which the measuring is to be performed; and measuring a partial pressure distribution in the vacuum chamber, by receiving emission of plasma generated by the local plasma source through a window which is formed in a wall part of the vacuum chamber and through which the emission passes, and thereby performing emission spectral analysis on intensity of the emission.
    Type: Application
    Filed: April 16, 2008
    Publication date: October 23, 2008
    Inventors: Masahiro Yamamoto, Takeshi Koiwasaki, Hitoshi Yamanishi, Isao Muragishi, Mitsuhiro Yoshinaga
  • Publication number: 20040232109
    Abstract: A mask unit is formed by providing a pattern forming mask disposed in close contact with the top face of a substrate held on a substrate holder and having prescribed pattern openings, and a shielding mask having pattern openings larger by prescribed dimension than the pattern openings in this pattern forming mask. The pattern forming mask and the shielding mask are held on the substrate. A prescribed clearance is provided between the pattern forming mask and the shielding mask.
    Type: Application
    Filed: May 19, 2004
    Publication date: November 25, 2004
    Inventor: Mitsuhiro Yoshinaga