Abstract: The present disclosure relates to a method for manufacturing a color filter being capable of suppressing residue from being generated on a colored layer planarized by a planarization treatment, a color filter, and a solid-state imaging device.

Abstract: A photosensitive composition contains (A) a hollow or porous particle, (B) a compound capable of generating an active species upon irradiation with an actinic ray or radiation, and (C) a compound capable of changing in the solubility for an alkali developer by the action of the active species.

Abstract: The invention is directed to a colored composition for forming a green color filter, containing a color pigment, wherein a content of the color pigment to a total solid content of the colored composition is 60% by weight or more, and a layer having a thickness of 0.6 ?m formed from the colored composition has light transmittance of 80% or more at a wavelength of 550 nm and light transmittance of 50% or less at a wavelength of 450 nm, and a method of producing a color filter including (A) forming a first colored layer containing a first colored composition and (B) patterning with dry etching so as to from a through-hole group in the first colored layer, wherein the first colored composition is the colored composition as defined herein.

Abstract: The invention is directed to a colored composition containing a coloring agent and a resin, wherein a content of the coloring agent to a total solid content of the colored composition is 50% by weight or more and a solid content acid value of the resin is more than 80 mg KOH/g, and a method of producing a color filter including forming a first colored layer containing a first colored composition and patterning with dry etching so as to from a through-hole group in the first colored layer, wherein the first colored composition is the colored composition as defined herein.

Abstract: The invention provides a color filter producing method that is based on dry etching and makes it possible to produce a color filter which has fine and rectangular pixels and is excellent in flatness, and color filters produced by the method. The method is a color filter producing method of forming a first colorant-containing layer on a support, removing the first colorant-containing layer corresponding to a region where a second colorant-containing layer is to be formed by dry etching, forming the second colorant-containing layer so as to be embedded into the layer-removed region, removing the first and second colorant-containing layers corresponding to a region where a third colorant-containing layer is to be formed by dry etching, forming the third colorant-containing layer so as to be embedded into the layer-removed region, and removing the colorant-containing layers laminated on other colorant-containing layers.

Abstract: The present invention provides a method of manufacturing a color filter, including: forming a first color pattern in a repeating pattern on a support; forming, on the support, a second color pattern in a repeating pattern in regions where the first color pattern is not formed; removing at least one portion of one of the first color pattern and the second color pattern by dry-etching, the portion being in a region where a third color pattern is to be formed; and forming, on the support, the third color pattern in the region where the portion of one of the first color pattern and the second color pattern has been removed. The present invention also provides a color filter manufactured by the method, and a solid-state image pickup element using the color filter.

Abstract: A photosensitive composition contains (A) a hollow or porous particle, (B) a compound capable of generating an active species upon irradiation with an actinic ray or radiation, and (C) a compound capable of changing in the solubility for an alkali developer by the action of the active species.

Abstract: The present invention provides a production method for a color filter including forming a first colored layer on a support, forming a photoresist layer on the first colored layer, forming an image on the first colored layer by removing the photoresist layer in the form of an image pattern, etching the first colored layer in the form of the image formed in the forming the image by use of a dry etching process that uses a mixed gas in which a fluorine-based gas and oxygen (O2) are mixed at a mixing ratio (fluorine-based gas/O2), by flow rate ratio, in the range of from 2/1 to 8/1, and removing the photoresist layer remaining after the etching.

Abstract: A method for producing a color filter in such a manner that a first color pattern is formed in a stripe shape on a support, a second color layer is formed on the support on which the above-mentioned first color pattern has been formed, an area for forming a third color pattern in the above-mentioned first color pattern and/or the above-mentioned second color layer is removed by dry etching, and the third color pattern is formed in the area, from where the above-mentioned first color pattern and the above-mentioned second color layer have been removed, on the above-mentioned support.

Abstract: A semiconductor substrate has an active pixel area comprising a stack of lower electrodes, an intermediate layer of an organic photoelectric conversion material, an upper electrode, a transparent insulating layer and first to third color layers. Disposed outside the active pixel area is a polish stop layer having a high resistance to polishing. In planarizing the first to third color layers, the polishing operation is ended upon reaching the polish stop layer.

Abstract: The present invention provides a method of manufacturing a color filter, including: forming a first color pattern in a repeating pattern on a support; forming, on the support, a second color pattern in a repeating pattern in regions where the first color pattern is not formed; removing at least one portion of one of the first color pattern and the second color pattern by dry-etching, the portion being in a region where a third color pattern is to be formed; and forming, on the support, the third color pattern in the region where the portion of one of the first color pattern and the second color pattern has been removed. The present invention also provides a color filter manufactured by the method, and a solid-state image pickup element using the color filter.

Abstract: The present invention provides a production method for a color filter including forming a first colored layer on a support, forming a photoresist layer on the first colored layer, forming an image on the first colored layer by removing the photoresist layer in the form of an image pattern, etching the first colored layer in the form of the image formed in the forming the image by use of a dry etching process that uses a mixed gas in which a fluorine-based gas and oxygen (O2) are mixed at a mixing ratio (fluorine-based gas/O2), by flow rate ratio, in the range of from 2/1 to 8/1, and removing the photoresist layer remaining after the etching.

Abstract: The invention provides a color filter producing method that is based on dry etching and makes it possible to produce a color filter which has fine and rectangular pixels and is excellent in flatness, and color filters produced by the method. The method is a color filter producing method of forming a first colorant-containing layer on a support, removing the first colorant-containing layer corresponding to a region where a second colorant-containing layer is to be formed by dry etching, forming the second colorant-containing layer so as to be embedded into the layer-removed region, removing the first and second colorant-containing layers corresponding to a region where a third colorant-containing layer is to be formed by dry etching, forming the third colorant-containing layer so as to be embedded into the layer-removed region, and removing the colorant-containing layers laminated on other colorant-containing layers.