Patents by Inventor Mitsumasa Taguchi

Mitsumasa Taguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SUBSTRATE FOR TEST USE, AND METHOD FOR PRODUCING SUBSTRATE FOR TEST USE
    Publication number: 20200231924
    Abstract: Provided are a substrate for test use that is preferable for use in a test such as a culture test, and a method for manufacturing the substrate for test use. The substrate for test use, in which a solution retaining part for retaining water or an aqueous solution, is formed at a surface of a substrate of polydimethylsiloxane (PDMS). The solution retaining part is a concave part having a hydrophilic surface layer. The surface layer has a maximum thickness of 1 ?m or larger.
    Type: Application
    Filed: May 17, 2018
    Publication date: July 23, 2020
    Applicants: IWASAKI ELECTRIC CO., LTD., NATIONAL INSTITUTES FOR QUANTUM AND RADIOLOGICAL SCIENCE AND TECHNOLOGY
    Inventors: Shinobu KINOSHITA, Takashi IDE, Tomoko OYAMA, Mitsumasa TAGUCHI, Bin Jeremiah Duenas BARBA
  • MICROSTRUCTURAL MATERIALS AND FABRICATION METHOD THEREOF
    Publication number: 20160193756
    Abstract: There are provided a microstructural material allowing a concavo-convex pattern of a mold to be imprinted thereon by hardening a pattern formative layer through an unprecedented method, and a fabrication method thereof. A PTFE dispersion liquid is used in a pattern formative layer 2a forming an imprint section 2, thereby allowing such pattern formative layer 2a formed on a concavo-convex pattern of a mold 5 to be hardened when irradiated with an ionizing radiation. Accordingly, the fabrication method of a microstructural material 1 of the present invention employs an imprinting method allowing the pattern formative layer 2a to be hardened through an ionizing radiation R, which is completely different from a thermal imprinting and an optical imprinting. That is, the pattern formative layer 2a can be hardened, and the concavo-convex pattern of the mold 5 can thus be imprinted thereon, through an unprecedented method.
    Type: Application
    Filed: March 17, 2016
    Publication date: July 7, 2016
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Akihiro OSHIMA, Seiichi TAGAWA, Masakazu WASHIO, Tomoko OYAMA, Tomohiro TAKAHASHI, Satoshi OKUBO, Akinobu KOBAYASHI, Naotsugu NAGASAWA, Mitsumasa TAGUCHI
  • MICROSTRUCTURAL MATERIALS AND FABRICATION METHOD THEREOF
    Publication number: 20120231220
    Abstract: There are provided a microstructural material allowing a concavo-convex pattern of a mold to be imprinted thereon by hardening a pattern formative layer through an unprecedented method, and a fabrication method thereof. A PTFE dispersion liquid is used in a pattern formative layer 2a forming an imprint section 2, thereby allowing such pattern formative layer 2a formed on a concavo-convex pattern of a mold 5 to be hardened when irradiated with an ionizing radiation. Accordingly, the fabrication method of a microstructural material 1 of the present invention employs an imprinting method allowing the pattern formative layer 2a to be hardened through an ionizing radiation R, which is completely different from a thermal imprinting and an optical imprinting. That is, the pattern formative layer 2a can be hardened, and the concavo-convex pattern of the mold 5 can thus be imprinted thereon, through an unprecedented method.
    Type: Application
    Filed: December 29, 2011
    Publication date: September 13, 2012
    Applicant: JAPAN ATOMIC ENERGY AGENCY
    Inventors: Akihiro Oshima, Seiichi Tagawa, Masakazu Washio, Tomoko Oyama, Tomohiro Takahashi, Satoshi Okubo, Akinobu Kobayashi, Naotsugu Nagasawa, Mitsumasa Taguchi