Patents by Inventor Mitsunobu Shishido

Mitsunobu Shishido has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10981256
    Abstract: A polishing method and a polishing film are provided for automatically performing multi-stage batch polishing on an end surface of a workpiece. An end surface of a workpiece and a polishing plate are moved relative to each other while bringing the end surface of the workpiece into contact with a polishing film of the polishing plate. The end surface is moved in a circular motion with a diameter 2 R relative to the polishing film; the center of the circular motion is moved linearly by a distance S on the polishing film; the polishing film is provided with first, second, and third polishing surfaces; and the polishing film is further provided with cleaning surfaces between the polishing surfaces so that the range of the distance S in which one rotation in the circular motion crosses over different polishing surfaces is reduced, or does not cross over different polishing surfaces.
    Type: Grant
    Filed: May 3, 2018
    Date of Patent: April 20, 2021
    Assignees: NTT Advanced Technology Corporation, Mipox Corporation
    Inventors: Kenji Aoki, Naoki Sugita, Toshihiro Igawa, Mitsunobu Shishido
  • Publication number: 20180345440
    Abstract: A polishing method and a polishing film are provided for automatically performing multi-stage batch polishing on an end surface of a workpiece. An end surface of a workpiece and a polishing plate are moved relative to each other while bringing the end surface of the workpiece into contact with a polishing film of the polishing plate. The end surface is moved in a circular motion with a diameter 2 R relative to the polishing film; the center of the circular motion is moved linearly by a distance S on the polishing film; the polishing film is provided with first, second, and third polishing surfaces; and the polishing film is further provided with cleaning surfaces between the polishing surfaces so that the range of the distance S in which one rotation in the circular motion crosses over different polishing surfaces is reduced, or does not cross over different polishing surfaces.
    Type: Application
    Filed: May 3, 2018
    Publication date: December 6, 2018
    Inventors: Kenji Aoki, Naoki Sugita, Toshihiro Igawa, Mitsunobu Shishido