Patents by Inventor Mitsunori Oda
Mitsunori Oda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9067234Abstract: A substrate coating device (10) includes a precision stage (7), a nozzle (8), and conveyors (3 to 6 and 21). The precision stage (7) has a horizontal placement surface for placing a substrate W thereon and is configured to be reciprocable between an upstream end and a downstream end in a conveying direction. The conveyors (3 to 6 and 21) are configured to convey the substrate W in the conveying direction via the placement surface of the precision stage (7) in such manner that a surface of the substrate W is positioned in a horizontal plane. The intermediate conveyor (21) is liftable between a conveying position where a conveying surface of the intermediate conveyor is coincident with the placement surface of the stage and a non-conveying position where the conveying surface is positioned below the placement surface of the stage.Type: GrantFiled: June 3, 2010Date of Patent: June 30, 2015Assignee: TAZMO CO, LTD.Inventors: Masaaki Tanabe, Hideo Hirata, Mitsunori Oda
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Patent number: 9016235Abstract: The substrate coating device (10) includes a slit nozzle (1), a first camera (3), a second camera (4), a control section (5), a pump (8), and a pressure control chamber (9). The control section (5) controls the supply of the coating liquid from the pump (8) to the slit nozzle (1) in accordance with the result of comparison between a bead shape imaged by the first camera (3) and a reference shape. The control section (5) also controls the air pressure on the upstream side of the slit nozzle (1) by the pressure control chamber (9) in accordance with the result of comparison between a distance measured from an image taken by the second camera (4) and a reference distance.Type: GrantFiled: March 12, 2010Date of Patent: April 28, 2015Assignee: Tazmo Co., LtdInventors: Yoshinori Ikagawa, Mitsunori Oda, Minoru Yamamoto, Takashi Kawaguchi, Masaaki Tanabe, Hideo Hirata
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Patent number: 8770141Abstract: A substrate coating device is provided which is capable of reducing non-uniform film thickness areas that take place in a coating start portion and a coating end portion during coating using a slit nozzle coater. The substrate coating device (10) includes at least a slider driving motor (4), a pump (8), a delivery state quantity measuring section (82), and a control section (5). The slider driving motor (4) scans a slit nozzle (1) over a substrate (100) at an established velocity relative to the substrate (100). The pump (8) controls the supply of the coating liquid to the slit nozzle (1). The delivery state quantity measuring section (82) is configured to measure a state quantity indicative of a delivery state of the coating liquid from the tip of the slit nozzle (1).Type: GrantFiled: April 19, 2010Date of Patent: July 8, 2014Assignee: Tazmo Co., Ltd.Inventors: Yoshinori Ikagawa, Mitsunori Oda, Minoru Yamamoto, Takashi Kawaguchi, Hideo Hirata, Masaaki Tanabe
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Publication number: 20120288635Abstract: A substrate coating device (10) includes a precision stage (7), a nozzle (8), and conveyors (3 to 6 and 21). The precision stage (7) has a horizontal placement surface for placing a substrate W thereon and is configured to be reciprocable between an upstream end and a downstream end in a conveying direction. The conveyors (3 to 6 and 21) are configured to convey the substrate W in the conveying direction via the placement surface of the precision stage (7) in such manner that a surface of the substrate W is positioned in a horizontal plane. The intermediate conveyor (21) is liftable between a conveying position where a conveying surface of the intermediate conveyor is coincident with the placement surface of the stage and a non-conveying position where the conveying surface is positioned below the placement surface of the stage.Type: ApplicationFiled: June 3, 2010Publication date: November 15, 2012Applicant: TAZMO CO., LTD.Inventors: Masaaki Tanabe, Hideo Hirata, Mitsunori Oda
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Publication number: 20120085282Abstract: A substrate coating device is provided which is capable of reducing non-uniform film thickness areas that take place in a coating start portion and a coating end portion during coating using a slit nozzle coater. The substrate coating device (10) includes at least a slider driving motor (4), a pump (8), a delivery state quantity measuring section (82), and a control section (5). The slider driving motor (4) scans a slit nozzle (1) over a substrate (100) at an established velocity relative to the substrate (100). The pump (8) controls the supply of the coating liquid to the slit nozzle (1). The delivery state quantity measuring section (82) is configured to measure a state quantity indicative of a delivery state of the coating liquid from the tip of the slit nozzle (1).Type: ApplicationFiled: April 19, 2010Publication date: April 12, 2012Applicant: TAZMO CO., LTD.Inventors: Yoshinori Ikagawa, Mitsunori Oda, Minoru Yamamoto, Takashi Kawaguchi, Hideo Hirata, Masaaki Tanabe
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Publication number: 20120000420Abstract: The substrate coating device (10) includes a slit nozzle (1), a first camera (3), a second camera (4), a control section (5), a pump (8), and a pressure control chamber (9). The control section (5) controls the supply of the coating liquid from the pump (8) to the slit nozzle (1) in accordance with the result of comparison between a bead shape imaged by the first camera (3) and a reference shape. The control section (5) also controls the air pressure on the upstream side of the slit nozzle (1) by the pressure control chamber (9) in accordance with the result of comparison between a distance measured from an image taken by the second camera (4) and a reference distance.Type: ApplicationFiled: March 12, 2010Publication date: January 5, 2012Applicant: TAZMO CO., LTD.Inventors: Yoshinori Ikagawa, Mitsunori Oda, Minoru Yamamoto, Takashi Kawaguchi, Masaaki Tanabe, Hideo Hirata
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Patent number: 5429940Abstract: The present invention provides a process for producing oxazopyrroloquinolines which comprises culturing microorganisms to produce pyrroloquinolinequinone and adding .alpha.-amino acids or monomethylamine to the resulting culture broth which contains the pyrroloquinolinequinone and from which cells of microorganisms are not separated, thereby to convert the pyrroloquinolinequinone to the corresponding oxazopyrroloquinolines. The thus obtained oxazopyrroloquinolines include novel compounds. The present invention further provides aldose reductase inhibitors, diabetic combined disease curing agents, immunopotentiating agents and liver disease inhibiting agents which contain as active ingredient these oxazopyrroloquinolines having excellent physiological activity.Type: GrantFiled: July 12, 1993Date of Patent: July 4, 1995Assignee: Mitsubishi Gas Chemical CompanyInventors: Teizi Urakami, Mitsunori Oda, Chieko Itoh, Hisao Kobayashi, Toshio Nagai, Kazuhiro Sugamura
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Patent number: 5409957Abstract: Disclosed are a phenoxyalkylamine represented by the following general formula I and a salt of said phenoxyalkylamine represented by the following general formula II: ##STR1## wherein R represents a linear saturated hydrocarbon having 7 to 12 carbon atoms, n is an integer of from 1 to 5, m is an integer of from 2 to 4, and HX represents a mineral acid.These compounds have strong bacteriostatic and bactericidal actions for plants with no phytotoxicity. Therefore, these compounds are effectively used as the active ingredient of an agricultural and horticultural bactericide.Type: GrantFiled: March 23, 1993Date of Patent: April 25, 1995Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Mitsunori Oda, Kazutoshi Kikkawa, Akinori Tanaka, Satoko Imaruoka, Shigeo Yoshinaka
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Patent number: 5331011Abstract: Disclosed is an N-benzyl-N-phenoxyethylamine selected from the group consisting of the N-benzyl-N-phenoxyethylamine represented by the following formula (I): ##STR1## and an agriculturally acceptable acid addition salt represented by the following formula (II): ##STR2## wherein m represents a number of 1 or 2 with a proviso that when m is 1 and a chlorine atom in the ring A is present at para(4)-position of the ring A, two chlorine atoms in the ring B are present at 2,3-, 2,5-, 2,6-, 3,4- or 3,5-positions of the ring B, and HX represents an acid.Type: GrantFiled: April 7, 1993Date of Patent: July 19, 1994Assignee: Mitsubishi Gas Chemical Co., Inc.Inventors: Mitsunori Oda, Kazutoshi Kikkawa, Akinori Tanaka, Satoko Imaruoka, Shigeo Yoshinaka
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Patent number: 5244487Abstract: Disclosed are novel adenine derivatives represented by the formula I and agriculturally acceptable acid addition salts thereof represented by the formula: ##STR1## wherein n is an integer of 2-4. Compositions for increasing yield of crops such as leguminous crops and gramineous crops which contain the above adenine derivatives or salts thereof as an active ingredient and methods for increasing yield of crops using these compositions are also disclosed.Type: GrantFiled: February 11, 1991Date of Patent: September 14, 1993Assignee: Mitsubishi Gas Chemical Co., Inc.Inventors: Takashi Oritani, Mitsunori Oda, Taketo Maruyama, Takashi Suzuki, Akinori Tanaka, Toshio Kajita, Shigeo Yoshinaka, Masakazu Furushima
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Patent number: 5236930Abstract: The present invention provides a process for producing oxazopyrroloquinolines which comprises culturing microorganisms to produce pyrroloquinolinequinone and adding .alpha.-amino acids or monomethylamine to the resulting culture broth which contains the pyrroloquinolinequinone and from which cells of microorganisms are not separated, thereby to convert the pyrroloquinolinequinone to the corresponding oxazopyrroloquinolines.The thus obtained oxazopyrroloquinolines include novel compounds.The present invention further provides aldose reductase inhibitors, diabetic combined disease curing agents, immunopotentiating agents and liver disease inhibiting agents which contain as active ingredient these oxazopyrroloquinolines having excellent physiological activity.Type: GrantFiled: January 23, 1992Date of Patent: August 17, 1993Assignee: Mitbushi Gas Chemical Company, Inc.Inventors: Teizi Urakami, Mitsunori Oda, Chieko Itoh, Hisao Kobayashi, Toshio Nagai, Kazuhiro Sugamura
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Patent number: 5221694Abstract: Disclosed is an N-benzyl-N-phenoxyethylamine selected from the group consisting of the N-benzyl-N-phenoxyethylamine represented by the following formula (I): ##STR1## and an agriculturally acceptable acid addition salt represented by the following formula (II): ##STR2## wherein m represents a number of 1 or 2 with a proviso that when m is 1 and a chlorine atom in the ring A is present at para(4)-position of the ring A, two chlorine atoms in the ring B are present at 2,3-, 2,5-, 2,6-, 3,4- or 3,5-positions of the ring B and HX represents an acid.Type: GrantFiled: April 26, 1991Date of Patent: June 22, 1993Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Mitsunori Oda, Kazutoshi Kikkawa, Akinori Tanaka, Satoko Imaruoka, Shigeo Yoshinaka
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Patent number: 5211738Abstract: A denine derivatives represented by the following formula: ##STR1## (wherein n is 1 or 2 and R and R' represent hydrogen or a methyl, ethyl, allyl, or propargyl group) and agriculturally acceptable acid addition salts thereof, which have cytokinin activity and besides, excellent rooting action, is applied to as plant growth regulators.Type: GrantFiled: April 2, 1992Date of Patent: May 18, 1993Assignee: Mitsubishi Gas Chemical Co., Inc.Inventors: Yoshinori Sasaki, Takashi Oritani, Akinori Tanaka, Taketo Maruyama, Mitsunori Oda, Takashi Suzuki, Yoshiaki Suzuki, Masakazu Furushima
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Patent number: 5061711Abstract: Disclosed is a method of curing liver diseases by administration of pyrrolo quinoline quinon triesters (PQQ triesters). The PQQ triesters include PQQ triallyl ester and PQQ tribenzyl ester which are novel. The PQQ triesters being ester form, they have no toxicity and can be orally adminstered.Type: GrantFiled: October 3, 1990Date of Patent: October 29, 1991Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Teizi Urakami, Mitsunori Oda, Chieko Itoh
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Patent number: 4929267Abstract: Use of agriculturally acceptable salts of compounds of the following formula for promoting the growth of plants. ##STR1## wherein Hal represents a chlorine, bromine or iodine atom, X.sub.1 represents a hydrogen or chlorine atom, or a methyl, trifluoromethyl, nitro, methoxy or t-butyl group, and X.sub.2 represents a hydrogen atom, or both X.sub.1 and X.sub.2 represent a chlorine atom or a methyl group; and Y represents a hydrogen atom, or a C.sub.2-6 alkylcarbonyl, benzoyl, N-phenylcarbamoyl, N-3,4-dichlorophenylcarbamoyl, chloropropylcarbonyl, methoxycarbonyl, carbamoyl or methacryloyl group.Type: GrantFiled: December 8, 1986Date of Patent: May 29, 1990Assignee: Mitsubishi Gas Chemical CompanyInventors: Akinori Suzuki, Suong B. Hyeon, Toshio Kajita, Masakazu Furushima, Shigeo Yoshinaka, Takashi Suzuki, Mitsunori Oda, Akinori Tanaka