Patents by Inventor Mitsuo Akutsu

Mitsuo Akutsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7696257
    Abstract: An oxime ester compound represented below is useful as a photopolymerization initiator. A photopolymerization initiator including this as an active constituent has high sensitivity and causes no concern about coloration or contamination. (X represents a halogen atom or alkyl group. R1, R2, and R3 each independently represent R, OR, COR, SR, CONRR?, or CN, wherein R and R? each represent an alkyl group, an aryl group, an aralkyl group, or a heterocyclic group; these groups may be substituted with (a) halogen atom(s) and/or (a) heterocyclic group(s); the alkylene moiety in the alkyl or aralkyl group may be interrupted by (an) unsaturated bond(s), (an) ether bond(s), (a) thioether bond(s), or (an) ester bond(s); and R and R? may form a ring. Y1 represents an oxygen, sulfur, or selenium atom; A represents a heterocyclic group; m represents an integer 0-4; p represents an integer 0-5; and q represents 0 or 1.
    Type: Grant
    Filed: August 3, 2005
    Date of Patent: April 13, 2010
    Assignee: Adeka Corporation
    Inventors: Mitsuo Akutsu, Daisuke Sawamoto, Yasunori Kozaki, Toshihiko Murai
  • Patent number: 7648651
    Abstract: A solvent composition contains a tetralin compound (a) represented by the formula (I) and a polyether compound (b) represented by the formula (II). The solvent composition is excellent in safety and almost odorless, having a high capability of dissolving various organic materials, and also excellent in affinity to various substrates. The solvent composition is suitably used for various applications including various kinds of paints, adhesives, coating materials, detergents, and the like.
    Type: Grant
    Filed: April 18, 2006
    Date of Patent: January 19, 2010
    Assignee: Adeka Corporation
    Inventors: Mitsuo Akutsu, Takahiro Otsuka
  • Publication number: 20090093588
    Abstract: A solvent composition contains a tetralin compound (a) represented by the following general formula (I) and a polyether compound (b) represented by the following general formula (II). The solvent composition is excellent in safety and almost odorless, having a high capability of dissolving various organic materials, and also excellent in affinity to various substrates. The solvent composition is suitably used for various applications including various kinds of paints, adhesives, coating materials, detergents, and the like.
    Type: Application
    Filed: April 18, 2006
    Publication date: April 9, 2009
    Applicant: ADEKA CORPORATION
    Inventors: Mitsuo Akutsu, Takahiro Otsuka
  • Patent number: 7507355
    Abstract: The solvent composition of the present invention comprises diphenylmethane derivative (a) represented in general formula (I) below, and polyether (b) represented by general formula (II) below, and has high safety, low odor-emission, excellent dissolving power for various organic materials, and high affinity for various substrates. (In the formula, n represents 1 or 2, each of x and y independently represents 0, 1, 2, or 3, each of R1 and R2 independently represents a C1-10 alkyl group, and when a plurality of R1 or R2 exist, they may be different.) (In the formula, m represents 1 to 10, p is 0, 1, 2, or 3, Prop represents a 1,2-propylene group, each of R3 and R4 independently represents a C1-10 alkyl group, and when m is 2 or more, methyl groups in 1,2-propylene groups represented by Prop may be randomly located.
    Type: Grant
    Filed: September 27, 2005
    Date of Patent: March 24, 2009
    Assignee: Adeka Corporation
    Inventors: Mitsuo Akutsu, Takahiro Otsuka
  • Publication number: 20070270522
    Abstract: An oxime ester compound represented below is useful as a photopolymerization initiator. A photopolymerization initiator including this as an active constituent has high sensitivity and causes no concern about coloration or contamination. (X represents a halogen atom or alkyl group. R1, R2, and R3 each independently represent R, OR, COR, SR, CONRR?, or CN, wherein R and R? each represent an alkyl group, an aryl group, an aralkyl group, or a heterocyclic group; these groups may be substituted with (a) halogen atom(s) and/or (a) heterocyclic group(s); the alkylene moiety in the alkyl or aralkyl group may be interrupted by (an) unsaturated bond(s), (an) ether bond(s), (a) thioether bond(s), or (an) ester bond(s); and R and R? may form a ring. Y1 represents an oxygen, sulfur, or selenium atom; A represents a heterocyclic group; m represents an integer 0-4; p represents an integer 0-5; and q represents 0 or 1.
    Type: Application
    Filed: August 3, 2005
    Publication date: November 22, 2007
    Applicant: ADEKA CORPORATION
    Inventors: Mitsuo Akutsu, Daisuke Sawamoto, Yasunori Kozaki, Toshihiko Murai
  • Publication number: 20070257233
    Abstract: The solvent composition of the present invention comprises diphenylmethane derivative (a) represented in general formula (I) below, and polyether (b) represented by general formula (II) below, and has high safety, low odor-emission, excellent dissolving power for various organic materials, and high affinity for various substrates. (In the formula, n represents 1 or 2, each of x and y independently represents 0, 1, 2, or 3, each of R1 and R2 independently represents a C1-10 alkyl group, and when a plurality of R1 or R2 exist, they may be different.) (In the formula, m represents 1 to 10, p is 0, 1, 2, or 3, Prop represents a 1,2-propylene group, each of R3 and R4 independently represents a C1-10 alkyl group, and when m is 2 or more, methyl groups in 1,2-propylene groups represented by Prop may be randomly located.
    Type: Application
    Filed: September 27, 2005
    Publication date: November 8, 2007
    Applicant: ADEKA Corporation
    Inventors: Mitsuo Akutsu, Takahiro Otsuka
  • Patent number: 6432875
    Abstract: A thermal recording material includes a condensation reaction product of a carboxylic acid component (A) with a polyhydric alcohol component (B) in a thermal recording layer as an essential component, wherein the carboxylic acid component (A) includes (poly) 4-hydroxybenzoic acid represented by the following general formula (I) as an essential component and another monocarboxylic acid and/or dicarboxylic acid as an arbitrary component, and wherein the polyhydric alcohol component (B) includes a polyhydric alcohol which is a trihydric or more alcohol as an essential component and a dihydric low molecular-weight alcohol as an arbitrary component. wherein in the general formula(I), a letter p denotes an integer ranging from 0 to 2.
    Type: Grant
    Filed: December 1, 1999
    Date of Patent: August 13, 2002
    Assignee: Asahi Denka Kogyo K.K.
    Inventors: Mitsuo Akutsu, Nobuhide Tominaga, Keiji Ohya, Koichi Shigeno, Takahiro Mori
  • Patent number: 6319652
    Abstract: The energy beam curable epoxy resin composition comprising as essential components, (1) specific cationically polymerizing organic substance,(2) energybeam sensitive cation polymerization initiator, (3) cationically polymerizing organic substance except for the specific cationically polymerizing organic substance, described above, (4) radically polymerizing organic compound, and (5) energy beam sensitive radical polymerization initiator. The cured articles resulted from said resin composition, have superior properties and particularlly superior dimensional stability on humidity absorption. Therefore, a stereolithographic resin composition and a stereolithographic method are also provided.
    Type: Grant
    Filed: September 15, 1999
    Date of Patent: November 20, 2001
    Assignee: Asahi Kogaku Kogyo Kabushiki Kaisha
    Inventors: Mitsuo Akutsu, Tetsuyuki Nakayashiki, Hiroyuki Tachikawa, Kazuo Ohkawa, Satoyuki Chikaoka
  • Patent number: 6117487
    Abstract: A process for forming a metal oxide film by means of a chemical vapor deposition system, which comprises using a complex of a .beta.-diketone compound and a group IV metal glycolate, the complex being represented by formula (I): ##STR1## wherein M represents a metal atom of the group IV; R.sup.1 and R.sup.2 each represent a branched alkyl or cycloalkyl group having 4 to 8 carbon atoms; and R.sup.3 represents a straight-chain or branched alkylene group having 2 to 18 carbon atoms.
    Type: Grant
    Filed: March 24, 1999
    Date of Patent: September 12, 2000
    Assignee: Asahi Denka Kogyo Kabushiki Kaisha
    Inventors: Mitsuo Akutsu, Naohiro Kubota, Akifumi Masuko, Naoki Yamada
  • Patent number: 5985510
    Abstract: The energy beam curable epoxy resin composition comprising as essential components, (1) specific cationically polymerizing organic substance, (2) energybeam sensitive cation polimerization initiator, (3) cationically polymerizing organic substance except for the specific cationically polymerizing organic substance, described above, (4) radically polymerizing organic compound, and (5) energy beam sensitive radical polymerization initiator. The cured articles resulted from said resin composition, have superior properties and particularlly superior dimensional stability on humidity absorption. Therefore, a stereolithographic resin composition and a stereolithographic method are also provided.
    Type: Grant
    Filed: November 26, 1997
    Date of Patent: November 16, 1999
    Assignee: Asahi Denka Kogyo Kabushiki Kaisha
    Inventors: Mitsuo Akutsu, Tetsuyuki Nakayashiki, Hiroyuki Tachikawa, Kazuo Ohkawa, Satoyuki Chikaoka
  • Patent number: 5607894
    Abstract: The heat-sensitive recording material of the present invention comprises a heat-sensitive recording layer containing at least one resorcylic anilide derivative represented by the following general formula: ##STR1## wherein R.sub.1 represents an alkyl or alkoxy, group having 1 to 4 carbon atoms and R.sub.2 represents a hydrogen atom or an alkyl or alkoxy group having 1 to 4 carbon atoms.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: March 4, 1997
    Assignee: Asahi Denka Kogyo Kabushiki Kaisha
    Inventors: Mitsuo Akutsu, Nobuhide Tominaga, Keiji Oya, Athuo Tomita, Kouichi Shigeno
  • Patent number: 5181988
    Abstract: A process for treating paper to prevent discoloration when exposed to light which comprises adding 1% to 10% by weight of hypophosphorous acid or its salt based on the paper at any stage during or after paper making and maintaining said hypophosphorous acid or its salt therein. The invention also provides paper which contains hypophosphorous acid or its salt to prevent discoloration when exposed to light.
    Type: Grant
    Filed: June 12, 1991
    Date of Patent: January 26, 1993
    Assignee: Asahi Denka Kogyo Kabushiki Kaisha
    Inventors: Mitsuo Akutsu, Syuji Iwakura
  • Patent number: 5175138
    Abstract: A heat-sensitive recording material which comprises a color-forming layer containing a coupling substance which is usually colorless or light-colored and a developer which gives rise to color in the coupling substance upon heating, wherein the color-forming layer contains an organic phosphate, its metal salt or its basic salt of the following general formula (I): ##STR1## wherein R.sub.1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R.sub.2 and R.sub.3 each represent a hydrogen atom or an alkyl group having 1 to 9 carbon atoms, M represents a hydrogen atom or a metal atom having a valence of 1 to 4, L represents 0 or 1, m, represents a number of 0 to 1, n represents 1 or 2, and m+n represents the valence of the metal M.
    Type: Grant
    Filed: June 17, 1991
    Date of Patent: December 29, 1992
    Assignee: Asahi Denka Kogyo Kabushiki Kaisha
    Inventors: Mitsuo Akutsu, Keiji Tabata
  • Patent number: 5081099
    Abstract: A heat-sensitive recording material wherein a color-forming layer comprising a coupling substance which is usually colorless or light-colored and a developer which gives rise to color in the coupling substance upon heating further contains, as a sensitizer, a tetrahydronaphthalene compound of the following general formula (I): ##STR1## wherein X represents an alkylene group, --O--CO--O--, --O--CO-- or --O--R'.sub.n Y--, n represents 1 or 2, Y represents --O-- or --S--, R' represents an alkylene group, and R represents a phenyl, alkylphenyl or tetrahydronaphthyl group.
    Type: Grant
    Filed: July 19, 1990
    Date of Patent: January 14, 1992
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: Mitsuo Akutsu, Syuji Iwakura, Keiji Oya
  • Patent number: 4980336
    Abstract: A heat-sensitive recording material wherein 1,2-bis(3,4-dimethylphenyl)ethane is contained as a sensitizer in a color-forming layer comprising a usually colorless or light-colored coupling substance and a developer which causes coloring of the coupling substance upon heating.
    Type: Grant
    Filed: October 27, 1989
    Date of Patent: December 25, 1990
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: Mitsuo Akutsu, Syuji Iwakura, Keiji Tabata, Keiji Oya
  • Patent number: 4944980
    Abstract: An optical recording material having excellent light stability, shelf stability and solubility in a solvent comprises, as an indispensable constituent, a compound of the following general formula: ##STR1## wherein R represents a cycloalkyl group having 3 to 12 carbon atoms, X.sup.- represents a halide anion, a perchlorate anion or a quencher anion, rings A and B each represent a benzene or naphthalene ring which may be substituted with a halogen atom, and n represents 1 to 4.
    Type: Grant
    Filed: July 25, 1989
    Date of Patent: July 31, 1990
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: Mitsuo Akutsu, Syuji Iwakura, Keiji Oya
  • Patent number: 4918046
    Abstract: A heat-sensitive recording material which comprises a usually colorless or light-colored coloring material together with one or more compounds selected from among bissulfonate compounds, 2-substituted cyclohexyl sulfonate derivatives and biscycloalkyl aryldisulfonate derivatives.
    Type: Grant
    Filed: December 16, 1988
    Date of Patent: April 17, 1990
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: Mitsuo Akutsu, Syuji Iwakura, Keiji Oya, Keiji Tabata
  • Patent number: 4889672
    Abstract: The process for producing a ceramic molding of the present invention comprises adding 0.1 to 20 parts by weight of an adduct of epoxidized polybutadiene with an organic amine to 100 parts by weight of a ceramic powder.
    Type: Grant
    Filed: February 2, 1988
    Date of Patent: December 26, 1989
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: Mitsuo Akutsu, Keiji Tabata
  • Patent number: 4774367
    Abstract: The phenol compound of the present invention can be readily produced by, for example, reacting glyoxal, glutaraldehyde or crotonaldehyde with particular phenols. The phenol compound of the present invention is useful not only as a developer but also as an antioxidant for, e.g., synthetic resins and as an intermediate in the production of medicines or agricultural chemicals.The heat-sensitive recording material of the present invention, which contains the phenol compound as described above, shows little discoloration of the developed color and little coloration of the ground even at a high temperature and high humidity. Thus it is highly superior to conventional ones.
    Type: Grant
    Filed: January 16, 1987
    Date of Patent: September 27, 1988
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: MItsuo Akutsu, Kazuhito Iuchi, Keiji Tabata
  • Patent number: 4707507
    Abstract: Water-soluble or dispersible 2,2,6,6-tetramethylquaternary ammonium halides are provided, effective as stabilizers to increase the resistance to deterioration when exposed to light of synthetic resins, and having the formula: ##STR1## wherein: R.sub.1, R.sub.3 and R.sub.4 are alkyl having from one to about twelve carbon atoms;n is 1 or 2;when n is 1, R.sub.2 is alkyl having from one to about twelve carbon atoms; andwhen n is 2, R.sub.2 is alkylene having from one to about twelve carbon atoms; andX is halogen as well as stabilizer compositions and synthetic resin compositions containing the same.
    Type: Grant
    Filed: September 4, 1986
    Date of Patent: November 17, 1987
    Assignee: Adeka Argus Chemical Co., Ltd.
    Inventors: Mitsuo Akutsu, Mitsuharu Kanai