Patents by Inventor Mitsuo Akutsu
Mitsuo Akutsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7696257Abstract: An oxime ester compound represented below is useful as a photopolymerization initiator. A photopolymerization initiator including this as an active constituent has high sensitivity and causes no concern about coloration or contamination. (X represents a halogen atom or alkyl group. R1, R2, and R3 each independently represent R, OR, COR, SR, CONRR?, or CN, wherein R and R? each represent an alkyl group, an aryl group, an aralkyl group, or a heterocyclic group; these groups may be substituted with (a) halogen atom(s) and/or (a) heterocyclic group(s); the alkylene moiety in the alkyl or aralkyl group may be interrupted by (an) unsaturated bond(s), (an) ether bond(s), (a) thioether bond(s), or (an) ester bond(s); and R and R? may form a ring. Y1 represents an oxygen, sulfur, or selenium atom; A represents a heterocyclic group; m represents an integer 0-4; p represents an integer 0-5; and q represents 0 or 1.Type: GrantFiled: August 3, 2005Date of Patent: April 13, 2010Assignee: Adeka CorporationInventors: Mitsuo Akutsu, Daisuke Sawamoto, Yasunori Kozaki, Toshihiko Murai
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Patent number: 7648651Abstract: A solvent composition contains a tetralin compound (a) represented by the formula (I) and a polyether compound (b) represented by the formula (II). The solvent composition is excellent in safety and almost odorless, having a high capability of dissolving various organic materials, and also excellent in affinity to various substrates. The solvent composition is suitably used for various applications including various kinds of paints, adhesives, coating materials, detergents, and the like.Type: GrantFiled: April 18, 2006Date of Patent: January 19, 2010Assignee: Adeka CorporationInventors: Mitsuo Akutsu, Takahiro Otsuka
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Publication number: 20090093588Abstract: A solvent composition contains a tetralin compound (a) represented by the following general formula (I) and a polyether compound (b) represented by the following general formula (II). The solvent composition is excellent in safety and almost odorless, having a high capability of dissolving various organic materials, and also excellent in affinity to various substrates. The solvent composition is suitably used for various applications including various kinds of paints, adhesives, coating materials, detergents, and the like.Type: ApplicationFiled: April 18, 2006Publication date: April 9, 2009Applicant: ADEKA CORPORATIONInventors: Mitsuo Akutsu, Takahiro Otsuka
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Patent number: 7507355Abstract: The solvent composition of the present invention comprises diphenylmethane derivative (a) represented in general formula (I) below, and polyether (b) represented by general formula (II) below, and has high safety, low odor-emission, excellent dissolving power for various organic materials, and high affinity for various substrates. (In the formula, n represents 1 or 2, each of x and y independently represents 0, 1, 2, or 3, each of R1 and R2 independently represents a C1-10 alkyl group, and when a plurality of R1 or R2 exist, they may be different.) (In the formula, m represents 1 to 10, p is 0, 1, 2, or 3, Prop represents a 1,2-propylene group, each of R3 and R4 independently represents a C1-10 alkyl group, and when m is 2 or more, methyl groups in 1,2-propylene groups represented by Prop may be randomly located.Type: GrantFiled: September 27, 2005Date of Patent: March 24, 2009Assignee: Adeka CorporationInventors: Mitsuo Akutsu, Takahiro Otsuka
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Publication number: 20070270522Abstract: An oxime ester compound represented below is useful as a photopolymerization initiator. A photopolymerization initiator including this as an active constituent has high sensitivity and causes no concern about coloration or contamination. (X represents a halogen atom or alkyl group. R1, R2, and R3 each independently represent R, OR, COR, SR, CONRR?, or CN, wherein R and R? each represent an alkyl group, an aryl group, an aralkyl group, or a heterocyclic group; these groups may be substituted with (a) halogen atom(s) and/or (a) heterocyclic group(s); the alkylene moiety in the alkyl or aralkyl group may be interrupted by (an) unsaturated bond(s), (an) ether bond(s), (a) thioether bond(s), or (an) ester bond(s); and R and R? may form a ring. Y1 represents an oxygen, sulfur, or selenium atom; A represents a heterocyclic group; m represents an integer 0-4; p represents an integer 0-5; and q represents 0 or 1.Type: ApplicationFiled: August 3, 2005Publication date: November 22, 2007Applicant: ADEKA CORPORATIONInventors: Mitsuo Akutsu, Daisuke Sawamoto, Yasunori Kozaki, Toshihiko Murai
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Publication number: 20070257233Abstract: The solvent composition of the present invention comprises diphenylmethane derivative (a) represented in general formula (I) below, and polyether (b) represented by general formula (II) below, and has high safety, low odor-emission, excellent dissolving power for various organic materials, and high affinity for various substrates. (In the formula, n represents 1 or 2, each of x and y independently represents 0, 1, 2, or 3, each of R1 and R2 independently represents a C1-10 alkyl group, and when a plurality of R1 or R2 exist, they may be different.) (In the formula, m represents 1 to 10, p is 0, 1, 2, or 3, Prop represents a 1,2-propylene group, each of R3 and R4 independently represents a C1-10 alkyl group, and when m is 2 or more, methyl groups in 1,2-propylene groups represented by Prop may be randomly located.Type: ApplicationFiled: September 27, 2005Publication date: November 8, 2007Applicant: ADEKA CorporationInventors: Mitsuo Akutsu, Takahiro Otsuka
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Patent number: 6432875Abstract: A thermal recording material includes a condensation reaction product of a carboxylic acid component (A) with a polyhydric alcohol component (B) in a thermal recording layer as an essential component, wherein the carboxylic acid component (A) includes (poly) 4-hydroxybenzoic acid represented by the following general formula (I) as an essential component and another monocarboxylic acid and/or dicarboxylic acid as an arbitrary component, and wherein the polyhydric alcohol component (B) includes a polyhydric alcohol which is a trihydric or more alcohol as an essential component and a dihydric low molecular-weight alcohol as an arbitrary component. wherein in the general formula(I), a letter p denotes an integer ranging from 0 to 2.Type: GrantFiled: December 1, 1999Date of Patent: August 13, 2002Assignee: Asahi Denka Kogyo K.K.Inventors: Mitsuo Akutsu, Nobuhide Tominaga, Keiji Ohya, Koichi Shigeno, Takahiro Mori
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Patent number: 6319652Abstract: The energy beam curable epoxy resin composition comprising as essential components, (1) specific cationically polymerizing organic substance,(2) energybeam sensitive cation polymerization initiator, (3) cationically polymerizing organic substance except for the specific cationically polymerizing organic substance, described above, (4) radically polymerizing organic compound, and (5) energy beam sensitive radical polymerization initiator. The cured articles resulted from said resin composition, have superior properties and particularlly superior dimensional stability on humidity absorption. Therefore, a stereolithographic resin composition and a stereolithographic method are also provided.Type: GrantFiled: September 15, 1999Date of Patent: November 20, 2001Assignee: Asahi Kogaku Kogyo Kabushiki KaishaInventors: Mitsuo Akutsu, Tetsuyuki Nakayashiki, Hiroyuki Tachikawa, Kazuo Ohkawa, Satoyuki Chikaoka
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Patent number: 6117487Abstract: A process for forming a metal oxide film by means of a chemical vapor deposition system, which comprises using a complex of a .beta.-diketone compound and a group IV metal glycolate, the complex being represented by formula (I): ##STR1## wherein M represents a metal atom of the group IV; R.sup.1 and R.sup.2 each represent a branched alkyl or cycloalkyl group having 4 to 8 carbon atoms; and R.sup.3 represents a straight-chain or branched alkylene group having 2 to 18 carbon atoms.Type: GrantFiled: March 24, 1999Date of Patent: September 12, 2000Assignee: Asahi Denka Kogyo Kabushiki KaishaInventors: Mitsuo Akutsu, Naohiro Kubota, Akifumi Masuko, Naoki Yamada
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Patent number: 5985510Abstract: The energy beam curable epoxy resin composition comprising as essential components, (1) specific cationically polymerizing organic substance, (2) energybeam sensitive cation polimerization initiator, (3) cationically polymerizing organic substance except for the specific cationically polymerizing organic substance, described above, (4) radically polymerizing organic compound, and (5) energy beam sensitive radical polymerization initiator. The cured articles resulted from said resin composition, have superior properties and particularlly superior dimensional stability on humidity absorption. Therefore, a stereolithographic resin composition and a stereolithographic method are also provided.Type: GrantFiled: November 26, 1997Date of Patent: November 16, 1999Assignee: Asahi Denka Kogyo Kabushiki KaishaInventors: Mitsuo Akutsu, Tetsuyuki Nakayashiki, Hiroyuki Tachikawa, Kazuo Ohkawa, Satoyuki Chikaoka
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Patent number: 5607894Abstract: The heat-sensitive recording material of the present invention comprises a heat-sensitive recording layer containing at least one resorcylic anilide derivative represented by the following general formula: ##STR1## wherein R.sub.1 represents an alkyl or alkoxy, group having 1 to 4 carbon atoms and R.sub.2 represents a hydrogen atom or an alkyl or alkoxy group having 1 to 4 carbon atoms.Type: GrantFiled: June 7, 1995Date of Patent: March 4, 1997Assignee: Asahi Denka Kogyo Kabushiki KaishaInventors: Mitsuo Akutsu, Nobuhide Tominaga, Keiji Oya, Athuo Tomita, Kouichi Shigeno
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Patent number: 5181988Abstract: A process for treating paper to prevent discoloration when exposed to light which comprises adding 1% to 10% by weight of hypophosphorous acid or its salt based on the paper at any stage during or after paper making and maintaining said hypophosphorous acid or its salt therein. The invention also provides paper which contains hypophosphorous acid or its salt to prevent discoloration when exposed to light.Type: GrantFiled: June 12, 1991Date of Patent: January 26, 1993Assignee: Asahi Denka Kogyo Kabushiki KaishaInventors: Mitsuo Akutsu, Syuji Iwakura
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Patent number: 5175138Abstract: A heat-sensitive recording material which comprises a color-forming layer containing a coupling substance which is usually colorless or light-colored and a developer which gives rise to color in the coupling substance upon heating, wherein the color-forming layer contains an organic phosphate, its metal salt or its basic salt of the following general formula (I): ##STR1## wherein R.sub.1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R.sub.2 and R.sub.3 each represent a hydrogen atom or an alkyl group having 1 to 9 carbon atoms, M represents a hydrogen atom or a metal atom having a valence of 1 to 4, L represents 0 or 1, m, represents a number of 0 to 1, n represents 1 or 2, and m+n represents the valence of the metal M.Type: GrantFiled: June 17, 1991Date of Patent: December 29, 1992Assignee: Asahi Denka Kogyo Kabushiki KaishaInventors: Mitsuo Akutsu, Keiji Tabata
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Patent number: 5081099Abstract: A heat-sensitive recording material wherein a color-forming layer comprising a coupling substance which is usually colorless or light-colored and a developer which gives rise to color in the coupling substance upon heating further contains, as a sensitizer, a tetrahydronaphthalene compound of the following general formula (I): ##STR1## wherein X represents an alkylene group, --O--CO--O--, --O--CO-- or --O--R'.sub.n Y--, n represents 1 or 2, Y represents --O-- or --S--, R' represents an alkylene group, and R represents a phenyl, alkylphenyl or tetrahydronaphthyl group.Type: GrantFiled: July 19, 1990Date of Patent: January 14, 1992Assignee: Adeka Argus Chemical Co., Ltd.Inventors: Mitsuo Akutsu, Syuji Iwakura, Keiji Oya
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Patent number: 4980336Abstract: A heat-sensitive recording material wherein 1,2-bis(3,4-dimethylphenyl)ethane is contained as a sensitizer in a color-forming layer comprising a usually colorless or light-colored coupling substance and a developer which causes coloring of the coupling substance upon heating.Type: GrantFiled: October 27, 1989Date of Patent: December 25, 1990Assignee: Adeka Argus Chemical Co., Ltd.Inventors: Mitsuo Akutsu, Syuji Iwakura, Keiji Tabata, Keiji Oya
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Patent number: 4944980Abstract: An optical recording material having excellent light stability, shelf stability and solubility in a solvent comprises, as an indispensable constituent, a compound of the following general formula: ##STR1## wherein R represents a cycloalkyl group having 3 to 12 carbon atoms, X.sup.- represents a halide anion, a perchlorate anion or a quencher anion, rings A and B each represent a benzene or naphthalene ring which may be substituted with a halogen atom, and n represents 1 to 4.Type: GrantFiled: July 25, 1989Date of Patent: July 31, 1990Assignee: Adeka Argus Chemical Co., Ltd.Inventors: Mitsuo Akutsu, Syuji Iwakura, Keiji Oya
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Patent number: 4918046Abstract: A heat-sensitive recording material which comprises a usually colorless or light-colored coloring material together with one or more compounds selected from among bissulfonate compounds, 2-substituted cyclohexyl sulfonate derivatives and biscycloalkyl aryldisulfonate derivatives.Type: GrantFiled: December 16, 1988Date of Patent: April 17, 1990Assignee: Adeka Argus Chemical Co., Ltd.Inventors: Mitsuo Akutsu, Syuji Iwakura, Keiji Oya, Keiji Tabata
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Patent number: 4889672Abstract: The process for producing a ceramic molding of the present invention comprises adding 0.1 to 20 parts by weight of an adduct of epoxidized polybutadiene with an organic amine to 100 parts by weight of a ceramic powder.Type: GrantFiled: February 2, 1988Date of Patent: December 26, 1989Assignee: Adeka Argus Chemical Co., Ltd.Inventors: Mitsuo Akutsu, Keiji Tabata
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Patent number: 4774367Abstract: The phenol compound of the present invention can be readily produced by, for example, reacting glyoxal, glutaraldehyde or crotonaldehyde with particular phenols. The phenol compound of the present invention is useful not only as a developer but also as an antioxidant for, e.g., synthetic resins and as an intermediate in the production of medicines or agricultural chemicals.The heat-sensitive recording material of the present invention, which contains the phenol compound as described above, shows little discoloration of the developed color and little coloration of the ground even at a high temperature and high humidity. Thus it is highly superior to conventional ones.Type: GrantFiled: January 16, 1987Date of Patent: September 27, 1988Assignee: Adeka Argus Chemical Co., Ltd.Inventors: MItsuo Akutsu, Kazuhito Iuchi, Keiji Tabata
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Patent number: 4707507Abstract: Water-soluble or dispersible 2,2,6,6-tetramethylquaternary ammonium halides are provided, effective as stabilizers to increase the resistance to deterioration when exposed to light of synthetic resins, and having the formula: ##STR1## wherein: R.sub.1, R.sub.3 and R.sub.4 are alkyl having from one to about twelve carbon atoms;n is 1 or 2;when n is 1, R.sub.2 is alkyl having from one to about twelve carbon atoms; andwhen n is 2, R.sub.2 is alkylene having from one to about twelve carbon atoms; andX is halogen as well as stabilizer compositions and synthetic resin compositions containing the same.Type: GrantFiled: September 4, 1986Date of Patent: November 17, 1987Assignee: Adeka Argus Chemical Co., Ltd.Inventors: Mitsuo Akutsu, Mitsuharu Kanai