Abstract: A planar antenna board (1) comprises a dielectric (2), an antenna layer (3) formed as a conductor for a signal line on one surface of the dielectric (2), and a ground layer (4) formed as a ground conductor on the other surface of the dielectric (2). The dielectric (2) has: a low-dielectric layer (2a) arranged on the antenna-layer (3) side; an intermediate layer (2b) for which the dielectric constant is higher than that of the low-dielectric layer (2a); and an adhesive layer (2c) for which the glass transition point is higher than that of the intermediate layer (2b), and the water absorption rate is higher than that of the low-dielectric layer (2a). The low-dielectric layer (2a) is arranged on the antenna-layer (3) side with respect to the intermediate layer (2b), and the adhesive layer (2c) is arranged on the ground-layer (4) side with respect to the intermediate layer (2b).

Abstract: In a mark forming step in a manufacturing method for a component incorporated substrate in which an electronic component is positioned with reference to a mark formed in a copper layer, when an imaginary line extending from a search center of a search range of a sensor, to an edge side of the search range is represented as a search reference line and an imaginary line extending, in a state in which a mark center, is matched with the search center, from the mark center in the same direction as the search reference line to an outer ridgeline of the mark is represented as a mark reference line, the mark formed in a shape in which the outer ridgeline of the mark is present in a position where a length of the mark reference line is in a range of 30% or more of the search reference line.

Abstract: In a mark forming step in a manufacturing method for a component incorporated substrate in which an electronic component is positioned with reference to a mark formed in a copper layer, when an imaginary line extending from a search center of a search range of a sensor, to an edge side of the search range is represented as a search reference line and an imaginary line extending, in a state in which a mark center, is matched with the search center, from the mark center in the same direction as the search reference line to an outer ridgeline of the mark is represented as a mark reference line, the mark formed in a shape in which the outer ridgeline of the mark is present in a position where a length of the mark reference line is in a range of 30% or more of the search reference line.

Abstract: A silver halide photographic emulsion containing, in combination, supersensitizing amounts of at least one sensitizing dye of the following general formula (I) ##STR1## wherein Z.sub.1 and Z.sub.2 each represents an atomic group required for forming a benzimidazole ring; R.sub.1 and R.sub.2 each represents an aliphatic group and at least one of R.sub.1 and R.sub.2 represents an alkyl group having a carboxy group, a hydroxyalkyl group or an alkyl group having a sulfo group; X.sub.1 represents an acid anion; and m is 1 or 2, m being 1 when the dye forms an inner salt (a betaine-like structure) and at least one sensitizing dye of the following general formula (II) ##STR2## wherein Z.sub.3 represents an atomic group required for forming a benzoxazole ring or a .beta.-naphthoxazole ring; Z.sub.4 represents an atomic group required for forming a benzothiazole ring, a benzoselenazole ring, a .beta.-naphthothiazole ring or a .beta.-naphthoselenazole ring; R.sub.3 and R.sub.