Patents by Inventor Mitsuo Kasori
Mitsuo Kasori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7455936Abstract: An electric cell comprising a positive electrode, a negative electrode containing aluminum or aluminum alloy, and an electrolyte arranged between the positive electrode and the negative electrode, wherein the electrolyte includes: at least one ion selected from a group of a sulfate ion (SO42?) and a nitrate ion (NO3?), the concentration of the ion being in the range of 0.2 to 16 M/L; and an additive selected from a group of an organic acid, a salt of the organic acid, a hydrate of the organic acid, an ester of the organic acid, an ion of the organic acid, and derivatives thereof.Type: GrantFiled: August 27, 2004Date of Patent: November 25, 2008Assignee: Kabushiki Kaisha ToshibaInventors: Haruchika Ishii, Norio Takami, Tomokazu Morita, Mitsuo Kasori
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Patent number: 7244528Abstract: Disclosed is an aluminum negative electrode battery comprising a closed space provided by at least one member including a hydrogen gas permeating member that contains an organic material having a He gas permeability of 2×10?10 (cm3(STP)cm/sec·cm2·cmHg) or more at 30° C., and a power generating element including an electrolyte, a positive electrode and a negative electrode containing at least one of aluminum and aluminum alloy, and the power generating element provided in the closed space.Type: GrantFiled: March 14, 2003Date of Patent: July 17, 2007Assignee: Kabushiki Kaisha ToshibaInventors: Hidesato Saruwatari, Haruchika Ishii, Takahiro Hirai, Norio Takami, Mitsuo Kasori
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Publication number: 20050019672Abstract: An electric cell comprising a positive electrode, a negative electrode containing aluminum or aluminum alloy, and an electrolyte arranged between the positive electrode and the negative electrode, wherein the electrolyte includes: at least one ion selected from a group of a sulfate ion (SO42?) and a nitrate ion (NO3?), the concentration of the ion being in the range of 0.2 to 16 M/L; and an additive selected from a group of an organic acid, a salt of the organic acid, a hydrate of the organic acid, an ester of the organic acid, an ion of the organic acid, and derivatives thereof.Type: ApplicationFiled: August 27, 2004Publication date: January 27, 2005Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Haruchika Ishii, Norio Takami, Tomokazu Morita, Mitsuo Kasori
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Patent number: 6790563Abstract: An electric cell using aluminum in a negative electrode has a positive electrode, the negative electrode containing aluminum or aluminum alloy, and an electrolyte arranged between the positive electrode and the negative electrode. The electrolyte includes: at least one ion selected from a group of a sulfate ion (SO42−) and a nitrate ion (NO3−); and an additive. The additive is selected from an organic acid, a salt of the organic acid, an hydrate of the organic acid, an ester of the organic acid, an ion of the organic acid, and derivatives thereof. Thus, the electric cell of the present invention using aluminum in a negative electrode allows the improvements in the voltage and the capacity of the cell as the generation of gas depending on the self-discharge can be prevented.Type: GrantFiled: September 28, 2001Date of Patent: September 14, 2004Assignee: Kabushiki Kaisha ToshibaInventors: Haruchika Ishii, Norio Takami, Tomokazu Morita, Mitsuo Kasori
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Publication number: 20030219650Abstract: Disclosed is an aluminum negative electrode battery comprising a closed space provided by at least one member including a hydrogen gas permeating member that contains an organic material having a He gas permeability of 2×10−10 (cm3 (STP) cm/sec·cm2·cmHg) or more at 30° C., and a power generating element including an electrolyte, a positive electrode and a negative electrode containing at least one of aluminum and aluminum alloy, and the power generating element provided in the closed space.Type: ApplicationFiled: March 14, 2003Publication date: November 27, 2003Inventors: Hidesato Saruwatari, Haruchika Ishii, Takahiro Hirai, Norio Takami, Mitsuo Kasori
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Publication number: 20020068222Abstract: An electric cell using aluminum in a negative electrode has a positive electrode, the negative electrode containing aluminum or aluminum alloy, and an electrolyte arranged between the positive electrode and the negative electrode. The electrolyte includes: at least one ion selected from a group of a sulfate ion (SO42−) and a nitrate ion (NO3−); and an additive. The additive is selected from an organic acid, a salt of the organic acid, an hydrate of the organic acid, an ester of the organic acid, an ion of the organic acid, and derivatives thereof. Thus, the electric cell of the present invention using aluminum in a negative electrode allows the improvements in the voltage and the capacity of the cell as the generation of gas depending on the self-discharge can be prevented.Type: ApplicationFiled: September 28, 2001Publication date: June 6, 2002Applicant: Kabushiki Kaisha ToshibaInventors: Haruchika Ishii, Norio Takami, Tomokazu Morita, Mitsuo Kasori
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Patent number: 6110596Abstract: Disclosed are a circuit substrate which comprises a silicon nitride ceramic plate 1 having a thermal conductivity at room temperature of 80 W/mK or more and a metal plate 2 joined to the silicon nitride ceramic plate 1 through a glass layer 3, and a semiconductor device in which the circuit substrate is mounted.Type: GrantFiled: September 26, 1996Date of Patent: August 29, 2000Assignee: Kabushiki Kaisha ToshibaInventors: Mitsuo Kasori, Akihiro Horiguchi, Hiroyasu Sumino, Fumio Ueno
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Patent number: 6107638Abstract: Disclosed is a silicon nitride circuit substrate, a manufacturing procee thereof, and a semiconductor device therewith. The circuit substrate comprises: a silicon nitride substrate; a metal circuit plate; and a intermediate layer being interposed between the silicon nitride board and the metal circuit plate for joining the silicon nitride substrate and the metal circuit plate, and having a compound containing an aluminum oxide component. The concentration of the aluminum oxide component in the intermediate layer is higher in the side of the metal circuit plate than in the side of the silicon nitride board.Type: GrantFiled: March 16, 1998Date of Patent: August 22, 2000Assignee: Kabushiki Kaisha ToshibaInventors: Hiroyasu Sumino, Akihiro Horiguchi, Mitsuo Kasori, Fumio Ueno
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Patent number: 6086990Abstract: Disclosed are a high thermal conductivity silicon nitride circuit substrate which comprises a silicon nitride ceramic plate having a thermal conductivity at 25.degree. C. of 60 W/m.multidot.K or more and a metal circuit plate joined to the silicon nitride ceramic plate through an intermediate layer containing oxygen and at least one element selected from the group consisting of titanium, zirconium, hafnium, niobium and aluminum, and a semiconductor device using the same.Type: GrantFiled: September 26, 1996Date of Patent: July 11, 2000Assignee: Kabushiki Kaisha ToshibaInventors: Hiroyasu Sumino, Akihiro Horiguchi, Mitsuo Kasori, Fumio Ueno
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Patent number: 6013356Abstract: A circuit board having at least one insulator layer and at least one conductor layer which includes at least one of the whole insulator layers in a sintered body containing .beta.-Si.sub.3 N.sub.4 as a main component and at least one element selected from the group consisting of a rare earth element and an alkaline earth element, and at least one of the whole conductor layers contains at least one element selected from the group of IVb, Vb and VIb group of the periodic table, and at least one element selected from the group of a rare earth element and an alkaline earth element, and a Si element.Type: GrantFiled: September 26, 1996Date of Patent: January 11, 2000Assignee: Kabushiki Kaisha ToshibaInventors: Akihiro Horiguchi, Hiroyasu Sumino, Mitsuo Kasori, Fumio Ueno
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Patent number: 5641718Abstract: Disclosed is a sintered aluminum nitride composition and a circuit substrate for use in semiconductor device. The sintered aluminum nitride composition comprises: aluminum nitride; a first component given by a compound containing an element which is selected from the group consisting of alkaline earth elements and group IIIa elements of the periodic table; a second component made of either a simple silicon or a silicon-containig compound; and a third component made of either a simple manganese or a manganese-containing compound. The circuit substrate has an insulating layer which is compoesd of the above-described sintered aluminum nitride composition, and an electrically conductive layer containing an electrically conductive material and the same components as those of the insulating layer.Type: GrantFiled: August 30, 1995Date of Patent: June 24, 1997Assignee: Kabushiki Kaisha ToshibaInventors: Akihiro Horiguchi, Katsuyoshi Oh-Ishi, Mitsuo Kasori, Hiroyasu Sumino, Fumio Ueno, Jun Monma, Kazuo Kimura
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Patent number: 5616956Abstract: Disclosed is a circuit substrate and a semiconductor device to which the circuit substrate is applied. The circuit substrate has an insulating layer and an electrically conductive layer. The insulating layer is composed of a sintered aluminum nitride composition containing: aluminum nitride; a first component given by a compound containing an element which is selected from the group consisting of group IIa elements and group IIIa elements of the periodic table; a second component given by either a simple boron or a boron compound; and a third component give by either a simple manganese or a manganese compound. The electrically conductive layer contains: a conductive component given by a metal or an electrically conductive compound for exhibiting electric conductivity; aluminum nitride; the first component; the second component; and the third component.Type: GrantFiled: September 7, 1995Date of Patent: April 1, 1997Assignee: Kabushiki Kaisha ToshibaInventors: Akihiro Horiguchi, Jun Monma, Kazuo Kimura, Katsuyoshi Oh-Ishi, Fumio Ueno, Mitsuo Kasori, Hiroyasu Sumino
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Patent number: 5500395Abstract: Disclosed is an aluminum nitride sintered body which has a high thermal conductivity and a high strength and which can be manufactured through low-temperature, short-time sintering. This aluminum nitride sintered body has an average grain size of aluminum nitride grains of 2 .mu.m or less, a thermal conductivity of 80 W/m.K or more, and a relative density of 98% or more.Type: GrantFiled: October 11, 1994Date of Patent: March 19, 1996Assignee: Kabushiki Kaisha ToshibaInventors: Fumio Ueno, Mitsuo Kasori, Akihiro Horiguchi, Katsuyoshi Oh-Ishi
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Patent number: 5409869Abstract: Disclosed is an aluminum nitride sintered body which has a high thermal conductivity and a high strength and which can be manufactured through low-temperature, short-time sintering. This aluminum nitride sintered body has an average grain size of aluminum nitride grains of 2 .mu.m or less, a thermal conductivity of 80 W/m.K or more, and a relative density of 98% or more.Type: GrantFiled: November 18, 1993Date of Patent: April 25, 1995Assignee: Kabushiki Kaisha ToshibaInventors: Fumio Ueno, Mitsuo Kasori, Akihiro Horiguchi, Katsuyoshi Oh-Ishi
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Patent number: 5286927Abstract: Disclosed is a method of manufacturing a circuit board comprising an insulating substrate and a conductor pattern of a low resistivity which can be prevented from being peeled off the substrate by a thermal stress. The method comprises the step of forming an insulating layer on an insulating substrate, the insulating layer being provided with a groove having a depth of at least 20 .mu.m and shaped like a conductor pattern which is to be formed later, the step of filling the groove of the insulating layer with a paste composition consisting of a powdery material capable of forming an electrically conductive metal, a fine particles having a thermal expansion coefficient smaller than that of the electrically conductive metal, the fine particles being used in an amount of 0.Type: GrantFiled: October 13, 1992Date of Patent: February 15, 1994Assignee: Kabushiki Kaisha ToshibaInventors: Fumio Ueno, Mitsuo Kasori, Yoshiko Goto, Akihiro Horiguchi
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Patent number: 5284537Abstract: In an aluminum nitride structure, a plurality of aluminum nitride regions having different purities are integrally formed to satisfy a predetermined positional relationship, and neighboring regions are brought into direct contact with each other to form an abrupt junction therebetween. Therefore, the aluminum nitride structure has anisotropy in physical properties such as a thermal conductivity, a light transmittance, and a strength.Type: GrantFiled: December 10, 1992Date of Patent: February 8, 1994Assignee: Kabushiki Kaisha ToshibaInventors: Mitsuo Kasori, Akihiro Horiguchi, Yoshiko Goto, Fumio Ueno
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Patent number: 5280850Abstract: According to this invention, there is provided a method of manufacturing a highly reliable circuit board in which a copper member is strongly, directly bonded to a substrate made of an aluminum nitride sintered body, thereby obtaining high peel strength. The method of manufacturing the circuit board includes the steps of bringing a copper member containing 100 to 1,000 ppm of oxygen into contact with an oxide layer having a thickness of 0.1 to 5 .mu.m formed on a surface of a substrate made of an aluminum nitride sintered body, and heating the substrate in an inert gas atmosphere containing 1 to 100 ppm of oxygen at a temperature not more than a temperature corresponding to a liquidus including a pure copper melting point of a hypoeutectic region of a two-component phase diagram of Cu-Cu.sub.Type: GrantFiled: October 16, 1992Date of Patent: January 25, 1994Assignee: Kabushiki Kaisha ToshibaInventors: Akihiro Horiguchi, Mitsuo Kasori, Fumio Ueno, Hiroshi Komorita
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Patent number: 5204080Abstract: An aluminum nitride structure is prepared by placing an oxygen-trapping substance at at least one position on an aluminum nitride substrate having a first concentration of solution oxygen, and heating the resultant structure in a non-oxidizing atmosphere to locally reduce the first concentration of solution oxygen in said aluminum nitride substrate under said oxygen-trapping substance to a second concentration of solution oxygen by trapping the solution oxygen in the oxygen-trapping substance, thereby forming an aluminum nitride structure in which at least one region of the aluminum nitride structure corresponding to the position of said oxygen-trapping substance, which position has said second oxygen concentration, is integrally formed with aluminum nitride regions having said first concentration of solution oxygen. The aluminum nitride structure of the present invention exhibits anisotropic physical properties.Type: GrantFiled: June 29, 1990Date of Patent: April 20, 1993Assignee: Kabushiki Kaisha ToshibaInventors: Mitsuo Kasori, Akihiro Horiguchi, Yoshiko Goto, Fumio Ueno
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Patent number: 5184399Abstract: Disclosed is a method of manufacturing a circuit board comprising an insulating substrate and a conductor pattern of a low resistivity which can be prevented from being peeled off the substrate by a thermal stress. The method comprises the step of forming an insulating layer on an insulating substrate, the insulating layer being provided with a groove having a depth of at least 20 .mu.m and shaped like a conductor pattern which is to be formed later, the step of filling the groove of the insulating layer with a paste composition consisting of a powdery material capable of forming an electrically conductive metal, a fine particles having a thermal expansion coefficient smaller than that of the electrically conductive metal, the fine particles being used in an amount of 0.Type: GrantFiled: June 28, 1991Date of Patent: February 9, 1993Assignee: Kabushiki Kaisha ToshibaInventors: Fumio Ueno, Mitsuo Kasori, Yoshiko Goto, Akihiro Horiguchi
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Patent number: 5182540Abstract: A resistor element includes a hollow cylindrical sintered body and a pair of electrodes formed on the upper and lower surfaces of the sintered body. The sintered body contains ferrite as a main constituent and contains 0.05 to 10% by volume of an insulator phase formed at the crystal grain boundary of the ferrite crystals. An insulating layer is formed to cover the side surface of the sintered body. The sintered body contains an oxide material selected from the group consisting of 0.005 to 2.0% by weight of bismuth oxide calculated in terms of Bi.sub.2 O.sub.3, 0.01 to 3.0% by weight and 0.005 to 2.0% by weight of silicon oxide and aluminum oxide calculated in terms of SiO.sub.2 and Al.sub.2 O.sub.3 respectively, and 0.01 to 3.5% by weight and 0.001 to 1.6% by weight of silicon oxide and calcium oxide calculated in terms of SiO.sub.2 and CaO, respectively.Type: GrantFiled: February 28, 1991Date of Patent: January 26, 1993Assignee: Kabushiki Kaisha ToshibaInventors: Naoki Shuto, Fumio Ueno, Yoshiko Goto, Akihiro Horiguchi, Mitsuo Kasori, Motomasa Imai