Abstract: A method for producing a polytetrafluoroethylene particle, which includes subjecting tetrafluoroethylene to suspension polymerization in an aqueous medium to prepare a suspension-polymerized particle of polytetrafluoroethylene, washing and then crushing the suspension-polymerized particle or crushing the suspension-polymerized particle with washing to prepare a crushed particle, dehydrating the crushed particle to prepare a crushed particle having a water content of 40% by mass or less, and subjecting the dehydrated crushed particle to heat treatment to produce a polytetrafluoroethylene particle.

Abstract: A method for producing a polytetrafluoroethylene powder, which includes subjecting tetrafluoroethylene to suspension polymerization in an aqueous medium to prepare a suspension-polymerized particle of non melt-processible polytetrafluoroethylene, drying the suspension-polymerized particle to prepare a dry particle, subjecting the dry particle to fluorine radical treatment to prepare a fluorine radical-treated particle, and crushing the fluorine radical-treated particle to produce a polytetrafluoroethylene powder. Also disclosed is a polytetrafluoroethylene formed article obtained by forming the polytetrafluoroethylene powder, as well as a polytetrafluoroethylene compression-molded article obtained by compression molding the polytetrafluoroethylene powder.

Abstract: An abundance of specific species of phytoplankton in a phytoplankton group in which a plurality of kinds coexists is calculated in a simple manner. Based on a reference sample intensity ratio r0, a reference sample total fluorescence intensity I0, and an existing quantity K0 of specific species of phytoplankton, an intensity ratio rd of other species of plankton is calculated. An analysis sample that is expected to have similarity with the reference sample is irradiated with the excitation light, an intensity of fluorescence emitted from the analysis sample is measured in each of wavelength bands A and B, and an intensity ratio r is calculated. A total fluorescence intensity I is measured, and an existing quantity K of the specific species of the phytoplankton is calculated based on the intensity ratio rd of other species of plankton, the intensity ratio r, and the total fluorescence intensity I.

Abstract: The present disclosure relates to isolated compounds including a nucleic acid sequence capable of hybridizing to an RNA sequence 10 to 270 nucleobases downstream of the transcription start site of a mammalian microRNA-379 transcript; methods of treating a condition of a subject (e.g., diabetes, obesity, or complications thereof) with the compounds; and methods of inhibiting expression of a mammalian microRNA-379 megacluster with the compounds.

Abstract: The present disclosure relates to isolated compounds including a nucleic acid sequence capable of hybridizing to an RNA sequence 10 to 270 nucleobases downstream of the transcription start site of a mammalian microRNA-379 transcript; method of treating diabetic nephropathy in a subject with the compounds; and method of inhibiting expression of a mammalian microRNA-379 megacluster with the compounds.

Abstract: The present disclosure relates to isolated compounds including a nucleic acid sequence capable of hybridizing to an RNA sequence 10 to 270 nucleobases downstream of the transcription start site of a mammalian microRNA-379 transcript; method of treating diabetic nephropathy in a subject with the compounds; and method of inhibiting expression of a mammalian microRNA-379 megacluster with the compounds.

Abstract: The present disclosure relates to isolated compounds including a nucleic acid sequence capable of hybridizing to an RNA sequence 10 to 270 nucleobases downstream of the transcription start site of a mammalian microRNA-379 transcript; method of treating diabetic nephropathy in a subject with the compounds; and method of inhibiting expression of a mammalian microRNA-379 megacluster with the compounds.

Abstract: A microwave plasma processing system 10 includes: a processing chamber 100 in which a desired process is applied to a target object using a plasma; a susceptor 106 (stage) in the processing chamber 100 to support the target object; a high-frequency power supply 112 supplying high-frequency electric power to the susceptor 106; a capacitor 108a provided to the susceptor 106; and a measurement device 20 measuring voltages at the pair of plates of the capacitor 108a when high-frequency electric power is supplied from the high-frequency power supply 112 to the susceptor 106.

Abstract: An object is providing an electrostatic attraction apparatus and an attracting/releasing method capable of reliably attracting and quickly releasing a glass substrate. An attraction force for attracting a glass substrate is obtained according to the physical properties of the glass substrate. In addition to obtaining an attraction voltage (Vc(t)) required for obtaining the attraction force, a holding voltage (Vh(t)) for holding an attraction state and a release voltage (Vr(t)) for releasing the glass substrate are also obtained (S1 to S7). Attraction time period (tc) is actually measured and if this measured time is different from a preset attraction time (t1), the holding voltage (Vh(t)) and the release voltage (Vr(t)) are recalculated according to the actually measured attraction time period (tc) (S8 to S11).

Abstract: An object is providing an electrostatic attraction apparatus and an attracting/releasing method capable of reliably attracting and quickly releasing a glass substrate. An attraction force for attracting a glass substrate is obtained according to the physical properties of the glass substrate. In addition to obtaining an attraction voltage (Vc(t)) required for obtaining the attraction force, a holding voltage (Vh(t)) for holding an attraction state and a release voltage (Vr(t)) for releasing the glass substrate are also obtained (S1 to S7) Attraction time period (tc) is actually measured and if this measured time is different from a preset attraction time (t1), the holding voltage (Vh(t)) and the release voltage (Vr(t)) are recalculated according to the actually measured attraction time period (tc) (S8 to S11).

Abstract: A crucible is a monolithic structure extending over an entire area of a vaporizing chamber and has at least one slit groove provided in the upper surface thereof. The at least one slit groove has a length from one end of the upper surface of the crucible to other end thereof. The at least one slit groove is used as a portion for containing the evaporation material (dopant material or the like). Alternatively, a crucible is a monolithic structure extending over the entire area of the vaporizing chamber and has a plurality of holes provided in the upper surface thereof. The holes are used as portions for containing the evaporation material. Further, the crucible is divided into a plurality of regions, and individual electric heaters are provided under the lower surface of the crucible for the respective regions, whereby temperature can be individually controlled for the respective regions by the electric heaters.

Abstract: A crucible is a monolithic structure extending over an entire area of a vaporizing chamber and has at least one slit groove provided in the upper surface thereof. The at least one slit groove has a length from one end of the upper surface of the crucible to other end thereof. The at least one slit groove is used as a portion for containing the evaporation material (dopant material or the like). Alternatively, a crucible is a monolithic structure extending over the entire area of the vaporizing chamber and has a plurality of holes provided in the upper surface thereof. The holes are used as portions for containing the evaporation material. Further, the crucible is divided into a plurality of regions, and individual electric heaters are provided under the lower surface of the crucible for the respective regions, whereby temperature can be individually controlled for the respective regions by the electric heaters.

Abstract: A glass composition of the present invention is manufactured by melting glass raw materials and contains a multicomponent oxide as a main component, and the glass composition contains at least one of helium and neon in an amount of 0.01 to 2 ?L/g (0° C. 1 atm).

Abstract: A microwave plasma processing system 10 includes: a processing chamber 100 in which a desired process is applied to a target object using a plasma; a susceptor 106 (stage) in the processing chamber 100 to support the target object; a high-frequency power supply 112 supplying high-frequency electric power to the susceptor 106; a capacitor 108a provided to the susceptor 106; and a measurement device 20 measuring voltages at the pair of plates of the capacitor 108a when high-frequency electric power is supplied from the high-frequency power supply 112 to the susceptor 106.

Abstract: Disclosed is a material for coating the surface of a platinum material made of platinum or an platinum alloy. Specifically disclosed is a coating material for platinum materials which contains a fire-resistant material component including alumina and silica, and a glass component.

Abstract: A crucible is a monolithic structure extending over an entire area of a vaporizing chamber and has at least one slit groove provided in the upper surface thereof. The at least one slit groove has a length from one end of the upper surface of the crucible to other end thereof. The at least one slit groove is used as a portion for containing the evaporation material (dopant material or the like). Alternatively, a crucible is a monolithic structure extending over the entire area of the vaporizing chamber and has a plurality of holes provided in the upper surface thereof. The holes are used as portions for containing the evaporation material. Further, the crucible is divided into a plurality of regions, and individual electric heaters are provided under the lower surface of the crucible for the respective regions, whereby temperature can be individually controlled for the respective regions by the electric heaters.

Abstract: A glass composition of the present invention is manufactured by melting glass raw materials and contains a multicomponent oxide as a main component, and the glass composition contains at least one of helium and neon in an amount of 0.01 to 2 ?L/g (0° C. 1 atm).

Abstract: A crosswise controllable pilot valve for generating a pilot pressure corresponding to an amount of operation of a control lever. This valve has a spool reciprocable within a valve case between a pilot pressure supplying position for interconnecting a pump port and a supply and exhaust port, and an exhaust position for interconnecting a tank port and the supply and exhaust port, and a push rod movable in a first direction within the valve case to move the spool to the supplying position. The push rod includes a cylindrical skirt portion adjacent one end thereof having sliding surfaces for sliding relative to the valve case, and a rod portion adjacent the other end. The skirt portion, rod portion and valve case define a first space, while the skirt portion, spool and valve case define a second space.

Abstract: A color selecting structure for a TRINITRON cathode-ray tube, in which color phosphor stripes are provided and a single electron gun emits three beams, capable of minimizing vertical fringes that deteriorate the quality of a picture displayed on the screen and of attenuating the vibration of a FAG (framing aperture grille plate), includes a thin plate having a plurality of tape-shaped grid (2a) elements and apertures (2a), and fine wires (3) extended across the surface of the aperture grille plate so as to apply a pressure in the range of 6.73.times.10.sup.-6 lbf., 2.24.times.10.sup.-5 lbf. to each grid element (2a).

Abstract: A DC or high frequency ion source comprising a hollow cathode and a substantially hollow anode for applying a DC or alternating voltage; a gas inlet disposed at a first side of the cathode for supplying a discharge gas into the cathode; a cathode heater disposed between the anode and the cathode; a magnet disposed adjacent the anode to thereby improve the uniformity of a plasma; an ion extraction outlet disposed at a second side of the cathode opposite to the gas inlet and having an elongated rectangular shape; and an ion extraction electrode and an acceleration electrode for controlling the energy of extracted ions. Both the anode and cathode comprise substantially hollow boxes. The cathode includes an elongated rectangular cross section and is disposed inside the substantially hollow anode. The ion extraction electrode and the acceleration electrode have an elongated rectangular shape and an opening coextensive with the ion extraction outlet.