Abstract: The present disclosure relates to isolated compounds including a nucleic acid sequence capable of hybridizing to an RNA sequence 10 to 270 nucleobases downstream of the transcription start site of a mammalian microRNA-379 transcript; methods of treating a condition of a subject (e.g., diabetes, obesity, or complications thereof) with the compounds; and methods of inhibiting expression of a mammalian microRNA-379 megacluster with the compounds.

Abstract: The present disclosure relates to isolated compounds including a nucleic acid sequence capable of hybridizing to an RNA sequence 10 to 270 nucleobases downstream of the transcription start site of a mammalian microRNA-379 transcript; method of treating diabetic nephropathy in a subject with the compounds; and method of inhibiting expression of a mammalian microRNA-379 megacluster with the compounds.

Abstract: The present disclosure relates to isolated compounds including a nucleic acid sequence capable of hybridizing to an RNA sequence 10 to 270 nucleobases downstream of the transcription start site of a mammalian microRNA-379 transcript; method of treating diabetic nephropathy in a subject with the compounds; and method of inhibiting expression of a mammalian microRNA-379 megacluster with the compounds.

Abstract: The present disclosure relates to isolated compounds including a nucleic acid sequence capable of hybridizing to an RNA sequence 10 to 270 nucleobases downstream of the transcription start site of a mammalian microRNA-379 transcript; method of treating diabetic nephropathy in a subject with the compounds; and method of inhibiting expression of a mammalian microRNA-379 megacluster with the compounds.

Abstract: A microwave plasma processing system 10 includes: a processing chamber 100 in which a desired process is applied to a target object using a plasma; a susceptor 106 (stage) in the processing chamber 100 to support the target object; a high-frequency power supply 112 supplying high-frequency electric power to the susceptor 106; a capacitor 108a provided to the susceptor 106; and a measurement device 20 measuring voltages at the pair of plates of the capacitor 108a when high-frequency electric power is supplied from the high-frequency power supply 112 to the susceptor 106.

Abstract: An object is providing an electrostatic attraction apparatus and an attracting/releasing method capable of reliably attracting and quickly releasing a glass substrate. An attraction force for attracting a glass substrate is obtained according to the physical properties of the glass substrate. In addition to obtaining an attraction voltage (Vc(t)) required for obtaining the attraction force, a holding voltage (Vh(t)) for holding an attraction state and a release voltage (Vr(t)) for releasing the glass substrate are also obtained (S1 to S7). Attraction time period (tc) is actually measured and if this measured time is different from a preset attraction time (t1), the holding voltage (Vh(t)) and the release voltage (Vr(t)) are recalculated according to the actually measured attraction time period (tc) (S8 to S11).

Abstract: An object is providing an electrostatic attraction apparatus and an attracting/releasing method capable of reliably attracting and quickly releasing a glass substrate. An attraction force for attracting a glass substrate is obtained according to the physical properties of the glass substrate. In addition to obtaining an attraction voltage (Vc(t)) required for obtaining the attraction force, a holding voltage (Vh(t)) for holding an attraction state and a release voltage (Vr(t)) for releasing the glass substrate are also obtained (S1 to S7) Attraction time period (tc) is actually measured and if this measured time is different from a preset attraction time (t1), the holding voltage (Vh(t)) and the release voltage (Vr(t)) are recalculated according to the actually measured attraction time period (tc) (S8 to S11).

Abstract: A crucible is a monolithic structure extending over an entire area of a vaporizing chamber and has at least one slit groove provided in the upper surface thereof. The at least one slit groove has a length from one end of the upper surface of the crucible to other end thereof. The at least one slit groove is used as a portion for containing the evaporation material (dopant material or the like). Alternatively, a crucible is a monolithic structure extending over the entire area of the vaporizing chamber and has a plurality of holes provided in the upper surface thereof. The holes are used as portions for containing the evaporation material. Further, the crucible is divided into a plurality of regions, and individual electric heaters are provided under the lower surface of the crucible for the respective regions, whereby temperature can be individually controlled for the respective regions by the electric heaters.

Abstract: A crucible is a monolithic structure extending over an entire area of a vaporizing chamber and has at least one slit groove provided in the upper surface thereof. The at least one slit groove has a length from one end of the upper surface of the crucible to other end thereof. The at least one slit groove is used as a portion for containing the evaporation material (dopant material or the like). Alternatively, a crucible is a monolithic structure extending over the entire area of the vaporizing chamber and has a plurality of holes provided in the upper surface thereof. The holes are used as portions for containing the evaporation material. Further, the crucible is divided into a plurality of regions, and individual electric heaters are provided under the lower surface of the crucible for the respective regions, whereby temperature can be individually controlled for the respective regions by the electric heaters.

Abstract: A glass composition of the present invention is manufactured by melting glass raw materials and contains a multicomponent oxide as a main component, and the glass composition contains at least one of helium and neon in an amount of 0.01 to 2 ?L/g (0° C. 1 atm).

Abstract: A microwave plasma processing system 10 includes: a processing chamber 100 in which a desired process is applied to a target object using a plasma; a susceptor 106 (stage) in the processing chamber 100 to support the target object; a high-frequency power supply 112 supplying high-frequency electric power to the susceptor 106; a capacitor 108a provided to the susceptor 106; and a measurement device 20 measuring voltages at the pair of plates of the capacitor 108a when high-frequency electric power is supplied from the high-frequency power supply 112 to the susceptor 106.

Abstract: Disclosed is a material for coating the surface of a platinum material made of platinum or an platinum alloy. Specifically disclosed is a coating material for platinum materials which contains a fire-resistant material component including alumina and silica, and a glass component.

Abstract: A crucible is a monolithic structure extending over an entire area of a vaporizing chamber and has at least one slit groove provided in the upper surface thereof. The at least one slit groove has a length from one end of the upper surface of the crucible to other end thereof. The at least one slit groove is used as a portion for containing the evaporation material (dopant material or the like). Alternatively, a crucible is a monolithic structure extending over the entire area of the vaporizing chamber and has a plurality of holes provided in the upper surface thereof. The holes are used as portions for containing the evaporation material. Further, the crucible is divided into a plurality of regions, and individual electric heaters are provided under the lower surface of the crucible for the respective regions, whereby temperature can be individually controlled for the respective regions by the electric heaters.

Abstract: A glass composition of the present invention is manufactured by melting glass raw materials and contains a multicomponent oxide as a main component, and the glass composition contains at least one of helium and neon in an amount of 0.01 to 2 ?L/g (0° C. 1 atm).

Abstract: A crosswise controllable pilot valve for generating a pilot pressure corresponding to an amount of operation of a control lever. This valve has a spool reciprocable within a valve case between a pilot pressure supplying position for interconnecting a pump port and a supply and exhaust port, and an exhaust position for interconnecting a tank port and the supply and exhaust port, and a push rod movable in a first direction within the valve case to move the spool to the supplying position. The push rod includes a cylindrical skirt portion adjacent one end thereof having sliding surfaces for sliding relative to the valve case, and a rod portion adjacent the other end. The skirt portion, rod portion and valve case define a first space, while the skirt portion, spool and valve case define a second space.

Abstract: A color selecting structure for a TRINITRON cathode-ray tube, in which color phosphor stripes are provided and a single electron gun emits three beams, capable of minimizing vertical fringes that deteriorate the quality of a picture displayed on the screen and of attenuating the vibration of a FAG (framing aperture grille plate), includes a thin plate having a plurality of tape-shaped grid (2a) elements and apertures (2a), and fine wires (3) extended across the surface of the aperture grille plate so as to apply a pressure in the range of 6.73.times.10.sup.-6 lbf., 2.24.times.10.sup.-5 lbf. to each grid element (2a).

Abstract: A DC or high frequency ion source comprising a hollow cathode and a substantially hollow anode for applying a DC or alternating voltage; a gas inlet disposed at a first side of the cathode for supplying a discharge gas into the cathode; a cathode heater disposed between the anode and the cathode; a magnet disposed adjacent the anode to thereby improve the uniformity of a plasma; an ion extraction outlet disposed at a second side of the cathode opposite to the gas inlet and having an elongated rectangular shape; and an ion extraction electrode and an acceleration electrode for controlling the energy of extracted ions. Both the anode and cathode comprise substantially hollow boxes. The cathode includes an elongated rectangular cross section and is disposed inside the substantially hollow anode. The ion extraction electrode and the acceleration electrode have an elongated rectangular shape and an opening coextensive with the ion extraction outlet.

Abstract: A device for detecting a semiconductor wafer in a non-contact manner irrespective of transparency or opacity thereof. At positions corresponding to a plurality of wafers loaded on a carrier, a plurality of light emitting/receiving sensors and a plurality of light receiving sensors are correspondingly provided in pairs in such a manner that their respective light emitting/receiving surfaces and their respective light receiving surface in pairs confront each other. The light emitting/receiving sensors and light receiving sensors are alternately arranged in two rows lengthwise on a sensor support board. In the case of a transparent wafer, a light sent out from a light emitting section of the light emitting/receiving sensor strikes on and is reflected by the surface of the wafer. The thus reflected light is then detected by a light receiving section of the same light emitting/receiving sensor.

Abstract: An induction heating apparatus has a coil or coils which can be opened without using electrical contacts. One continuous electric current passageway is formed by a first coil section, a second coil section, a first connecting conductor and a second connecting conductor. By feeding electric power to this electric current passageway and passing an object through a space at the central portion of the coil sections, the object is induction heated. A gap is provided between the first connecting conductor and the second connecting conductor, or the respective connecting conductors can be opened and closed relative to one another to vary the size of the space therebetween. The object to be heated is carried into the space at the central portion of the coil and is carried out therefrom through the gap or the space between the conductors.

Abstract: A sputtering apparatus including two electrodes, a sputtering target disposed on one of the electrodes, and a gas supply for supplying a discharge gas in a vacuum to produce an electric discharge between the two electrodes and whereby particles sputtered from the target due to impact thereon of ions produced by the discharge, are deposited on a substrate. The target disposed on one electrode is formed into an elongated band and the other electrode is disposed so as to enclose the target. The other electrode is also provided with a magnet for producing a magnetic field thereon, and further includes a narrow elongated slot which defines a narrow sputter particle outlet. The narrow sputter particle outlet permits a pressure to exist near the electrical discharge which is higher than the pressure near the substrate. According to a preferred embodiment, the sputtering apparatus has an ion source combined integrally therewith.