Patents by Inventor Mitsuo Kohno

Mitsuo Kohno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5744380
    Abstract: There is provided a high quality epitaxial water on which the density of microscopic defects in the epitaxial layer is reduced to keep the GOI thereof sufficiently high and to reduce a leakage current at the P-N junction thereof when devices are incorporated, to thereby improve the yield of such devices. In an epitaxial wafer obtained by forming an epitaxial layer on a substrate, the density of IR laser scatterers is 5.times.10.sup.5 pieces/cm.sup.3 or less throughout the epitaxial layer.
    Type: Grant
    Filed: February 26, 1997
    Date of Patent: April 28, 1998
    Assignee: Komatsu Electronic Metals Co., Ltd.
    Inventors: Noriyuki Uemura, Hisami Motoura, Masashi Nishimura, Mitsuo Kohno
  • Patent number: 4956540
    Abstract: There is disclosed an arc spot welding apparatus comprising a welding power supplying unit, a wire feeder connected to the welding power supplying unit by a control cable and an arc spot welding torch connected to the wire feeder by a torch cable which is operable by operating an operation switch arranged on a holder thereof to be held by an operator being characterized in that the welding torch is comprised of a nozzle assembly providing a nozzle and a power supply element, a torch holder assembly and a torch body assembly connecting said nozzle assembly and said torch holder assembly which is formed to have a length so that the operator can operate said welding torch in a standing posture.
    Type: Grant
    Filed: July 26, 1989
    Date of Patent: September 11, 1990
    Assignee: Daihen Corporation
    Inventors: Mitsuo Kohno, Masao Sakai, Moritoshi Nagasaka, Toshihiko Okada, Hiroyuki Morimoto
  • Patent number: 4766033
    Abstract: The present invention relates to a highly sensitive heat-sensitive film for stencil. This invention provides a highly heat-sensitive film for stencil, comprising a thermoplastic resin having a coefficient of temperature and melt viscosity (.DELTA.T/.DELTA. log VI) of not more than 100 and a thermal shrinkage (X%) at 100.degree. C. and a thermal shrinkage stress (Y g/mm.sup.2) at 100.degree. C. falling respectively in the ranges of the formulas; 15.ltoreq.X.ltoreq.80 and 75.ltoreq.Y.ltoreq.500; and both falling in the range of the formula; -8X+400.ltoreq.Y.ltoreq.-10X+1000; having a thickness in the range of 0.5 to 15 .mu.m, and excelling in low-energy perforation property.
    Type: Grant
    Filed: July 14, 1986
    Date of Patent: August 23, 1988
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Isao Yoshimura, Takashi Nakao, Mitsuo Kohno
  • Patent number: 4657805
    Abstract: In a dust cover for photomask reticle purposes which consists essentially of a supporting frame and a thin film bonded to a surface of the frame, the dust cover is improved in transparency by constructing at least the outermost layers of the thin film with thin films of a fluoropolymer which exhibits an average transmittance of at least 90% for rays of wavelengths from 240 to 290 nm and an average transmittance of at least 93.5% for rays of wavelengths from 290 to 500 nm, when having a thickness of 10 .mu.m, and has a refractive index of up to 1.42.
    Type: Grant
    Filed: June 13, 1985
    Date of Patent: April 14, 1987
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Yasunori Fukumitsu, Mitsuo Kohno
  • Patent number: 4613441
    Abstract: A porous membrane formed of a thermoplastic resin having a critical surface tension of not higher than 35 dyn/cm and having a three-dimensional network structure is provided. Communicating pores having a porosity of at least 60% and an average pore diameter of 0.1 to 2.0 microns are formed in the porous membrane. The strength factor F defined by the following formula is at least 1 as measured in any direction: F=A/[B(1-.alpha.)], wherein A is the tensile strength at break of the membrane, B is the tensile strength at break of a non-porous film formed of the same resin and .alpha. is the porosity fraction of the membrane. The thickness of the porous membrane is 5 to 500 microns. The porous membrane is prepared by a process wherein a porous membrane formed of a thermoplastic resin having a critical surface tension of not higher than 35 dyn/cm and having a three-dimensional network structure including communicating pores having an average pore diameter of 0.
    Type: Grant
    Filed: April 20, 1983
    Date of Patent: September 23, 1986
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Mitsuo Kohno, Shigeki Katayama, Kazuo Matsuda
  • Patent number: 4409339
    Abstract: A sulfonated polyolefin porous membrane containing sulfonic groups in an amount, in terms of exchange capacity, of 0.05 to 1 milliequivalent per gram of the sulfonated polyolefin and having a porosity of 30 to 85% and an average pore diameter of 0.05 to 1.mu. has been found to be excellent in water permeability, removal capability, water-permeability retention, mechanical strength and elongation, etc. The porous membrane of the present invention may advantageously be employed as a fine microfilter or the like. The porous membrane of the present invention may be easily prepared by treating with a sulfonating agent a polyolefin porous membrane preferably containing an inorganic filler which is subsequently extracted from the membrane.
    Type: Grant
    Filed: October 6, 1980
    Date of Patent: October 11, 1983
    Assignee: Asahi Kasei Kogyo
    Inventors: Kazuo Matsuda, Mitsuo Kohno, Yoshinao Doi
  • Patent number: 4360582
    Abstract: A photopolymerizable element comprising a layer of a photopolymerizable composition and a liquid developer-soluble or -dispersible transparent oriented film support laminated onto one surface of the photopolymerizable composition layer is advantageously employed for the production of a polymeric image without stripping of the film support. The element may further comprise a strippable protective film provided on the other surface of the photopolymerizable composition layer. The element of this invention is useful especially for the production of photoresists which are advantageously used for the manufacture of printed circuit boards.
    Type: Grant
    Filed: August 25, 1981
    Date of Patent: November 23, 1982
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Tadashi Taguchi, Noboru Fujikawa, Mitsuo Kohno, Katsumi Yoshitake, Kunio Satake
  • Patent number: 4352926
    Abstract: Disclosed is a biaxially drawn polyhexamethylene adipamide film having a relative viscosity of at least 3.2 as measured at 25.degree. C. in aqueous 96% H.sub.2 SO.sub.4, a degree of crystallinity of from 35% to 45%, a birefringence (.DELTA.n) of not more than 0.006, as determined at any point in its entire area, and an initial modulus of elasticity in tension of at least 230 kg/mm.sup.2 as determined in ay direction across substantially its entire area. The film may be produced by a process wherein molten polyhexamethylene adipamide is extruded through a circular die gap and the tubular extrudate is brought in sliding contact with the outer periphery of an inside mandrel, thereby to be cooled, which process is characterized in that polyhexamethylene adipamide having a relative viscosity of from 3.3 to 5.0, as measured at 25.degree. C. in aqueous 96% H.sub.2 SO.sub.4, is used; the tubular extrudate formed therefrom is cooled at a cooling rate (X.degree. C./sec.
    Type: Grant
    Filed: May 14, 1980
    Date of Patent: October 5, 1982
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Yukinori Matsuoka, Yoshihiko Muto, Mitsuo Kohno
  • Patent number: 4320189
    Abstract: A novel photopolymerizable composition comprising (a) a non-gaseous ethylenically unsaturated compound, (b) a thermoplastic organic polymer binder, (c) a photopolymerization initiator and (d) a specific s-triazine compound provides improved adhesion of a photopolymer prepared therefrom to a substrate even in aqueous plating or etching solutions.
    Type: Grant
    Filed: September 29, 1980
    Date of Patent: March 16, 1982
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Tadashi Taguchi, Toshihide Takemoto, Noboru Fujikawa, Mitsuo Kohno
  • Patent number: 4301230
    Abstract: A process for producing an image which comprises the steps of:(1) applying to the surface of a substrate the surface of a photosensitive layer, the other surface of the photosensitive layer being adhered to a substantially transparent film support which is soluble or dispersible in a developer consisting essentially of a liquid capable of substantially dissolving or dispersing therein the areas of the layer other than those having a polymeric image produced by imagewise exposure in the step (2) below;(2) exposing the photosensitive layer, imagewise, to actinic radiation to form a polymeric image in the layer; and(3) washing away with the developer the film support and the areas of the layer other than those having the polymeric image to form an image of a polymeric material on the substrate.
    Type: Grant
    Filed: December 18, 1979
    Date of Patent: November 17, 1981
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Tadashi Taguchi, Noboru Fujikawa, Mitsuo Kohno, Katsumi Yoshitake, Kunio Satake
  • Patent number: 4252966
    Abstract: Disclosed is a biaxially drawn polyhexamethylene adipamide film having a relative viscosity of at least 3.2 as measured at 25.degree. C. in aqueous 96% H.sub.2 SO.sub.4, a degree of crystallinity of from 35% to 45%, a birefringence (.DELTA.n) of not more than 0.006, as determined at any point in its entire area, and an initial modulus of elasticity in tension of at least 230 kg/mm.sup.2 as determined in any direction across substantially its entire area. The film may be produced by a process wherein molten polyhexamethylene adipamide is extruded through a circular die gap and the tubular extrudate is brought in sliding contact with the outer periphery of an inside mandrel, thereby to be cooled, which process is characterized in that polyhexamethylene adipamide having a relative viscosity of from 3.3 to 5.0, as measured at 25.degree. C. in aqueous 96% H.sub.2 SO.sub.4, is used; the tubular extrudate formed therefrom is cooled at a cooling rate (X.degree. C./sec.
    Type: Grant
    Filed: October 31, 1978
    Date of Patent: February 24, 1981
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Yukinori Matsuoka, Yoshihiko Muto, Mitsuo Kohno
  • Patent number: 4211560
    Abstract: A process for producing an image which comprises the steps of:(1) applying to the surface of a substrate the surface of a photosensitive layer, the other surface of the photosensitive layer being adhered to a substantially transparent film support which is soluble or dispersible in a developer consisting essentially of a liquid capable of substantially dissolving or dispersing therein the areas of the layer other than those having a polymeric image produced by imagewise exposure in the step (2) below;(2) exposing the photosensitive layer, imagewise, to actinic radiation to form a polymeric image in the layer; and(3) washing away with the developer the film support and the areas of the layer other than those having the polymeric image to form an image of a polymeric material on the substrate.
    Type: Grant
    Filed: July 11, 1978
    Date of Patent: July 8, 1980
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Tadashi Taguchi, Noboru Fujikawa, Mitsuo Kohno, Katsumi Yoshitake, Kunio Satake
  • Patent number: 4190707
    Abstract: An alkaline battery separator made of a porous film which consists substantially of a polyolefin having a weight average molecular weight of less than 300,000 and a number average molecular weight of 15,000 or more and which has a thickness of 0.025 to 1 mm, a porosity of 50 to 80%, an average pore diameter of 0.05 to 0.5.mu. and an average ratio of the larger dimension to the smaller dimension of the pore opening of not more than 2. The alkaline battery separator has not only an extremely low electrical resistance and a high alkali resistance but also a transmission-inhibitive ability for the active materials of battery and is excellent in mechanical strength and flexibility. It does not show appreciable shrinkage by heat. For producing such an alkaline battery separator, 10 to 50 volume percent of a polyolefin, 7 to 42 volume percent of an inorganic filler and 30 to 75 volume percent of an organic liquid having a solubility parameter of from 8.6 to 9.
    Type: Grant
    Filed: October 3, 1978
    Date of Patent: February 26, 1980
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Yoshinao Doi, Mitsuo Kohno, Katsumi Yoshitake
  • Patent number: 3962183
    Abstract: Films having good dimensional stability and practically no tendency of fibrillation and also other superior mechanical properties can be obtained easily and at a high production speed by stretching a layer of a substantially amorphous polymer consisting mainly of polyethylene-1,2-diphenoxyethane-4,4'-dicarboxylate at a temperature in the range from Tg to 100.degree.C (wherein Tg is a glass transition point) in the longitudinal direction to 1.5 to 3 times the original length and further stretching the resulting film at a high temperature of 150.degree.C or higher and a high stretching velocity 40000% per minute or higher in the longitudinal direction to give a total stretching ratio of 3.1 times or more.
    Type: Grant
    Filed: March 5, 1974
    Date of Patent: June 8, 1976
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Mitsuo Kohno, Tsuneo Igarashi, Minoru Nomura