Patents by Inventor Mitsuo Muto
Mitsuo Muto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11970639Abstract: The present invention provides: a temporary adhesive for wafer processing, said temporary adhesive being used for the purpose of provisionally bonding a wafer to a support, while being composed of a photocurable silicone resin composition that contains a non-functional organopolysiloxane; a wafer processed body; and a method for producing a thin wafer, said method using a temporary adhesive for wafer processing.Type: GrantFiled: April 22, 2021Date of Patent: April 30, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Mitsuo Muto, Michihiro Sugo, Shohei Tagami
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Publication number: 20230178412Abstract: A temporary adhesion method for temporarily adhering a wafer to a support via a temporary adhesive layer, the wafer having a first main surface including a circuit and a second main surface to be processed, the second main surface being located on an opposite side to the first main surface, wherein a temporary adhesion between the first main surface of the wafer and the support is performed via the temporary adhesive layer including a dry adhesive fiber structure having a plurality of pillar structures.Type: ApplicationFiled: April 26, 2021Publication date: June 8, 2023Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Tamotsu OOWADA, Shohei TAGAMI, Mitsuo MUTO, Masahito TANABE
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Publication number: 20230088354Abstract: The present invention provides: a temporary adhesive for wafer processing, said temporary adhesive being used for the purpose of provisionally bonding a wafer to a support, while being composed of a photocurable silicone resin composition that contains a non-functional organopolysiloxane; a wafer processed body; and a method for producing a thin wafer, said method using a temporary adhesive for wafer processing.Type: ApplicationFiled: April 22, 2021Publication date: March 23, 2023Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Mitsuo Muto, Michihiro Sugo, Shohei Tagami
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Publication number: 20230002647Abstract: Provided are: a wafer processing temporary adhesive that is for temporarily adhering a wafer to a support and that comprises a thermosetting resin composition containing a non-functional organopolysiloxane; a wafer laminate; and a thin wafer manufacturing method.Type: ApplicationFiled: December 1, 2020Publication date: January 5, 2023Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Mitsuo Muto, Shohei Tagami, Michihiro Sugo
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Publication number: 20220396662Abstract: Provided are a photocurable fluoropolyether-based elastomer composition having both a favorable preservation stability and fast curability, being bondable at a low temperature in a short period of time, and generating no air bubbles in the resin at the time of curing; and a bonding method thereof. The photocurable fluoropolyether-based elastomer composition contains: (A) a linear polyfluoro compound; (B) a fluorine-containing organohydrogenpolysiloxane; (C) a photoactive hydrosilylation reaction catalyst; and (D) a zeolite having an average primary particle size of not larger than 30 ?m.Type: ApplicationFiled: November 5, 2020Publication date: December 15, 2022Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Hiroyuki YASUDA, Mitsuo MUTO, Kenichi FUKUDA
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Publication number: 20220352001Abstract: A temporary adhesive material for wafer processing temporarily bonds a support to a wafer having a circuit-forming front and back surface for processing, including a composite temporary adhesive material layer having at least a two-layer structure of first and second temporary adhesive layers, the first layer including a thermoplastic resin layer that is releasably adhered to the wafer's front surface; and the second layer including a photo-curing siloxane polymer layer laminated on the first layer. A wafer processing laminate, a temporary adhesive material for wafer processing, and a method for manufacturing a thin wafer using the same, which suppress wafer warpage at the time of heat-bonding, have excellent delaminatability and cleaning removability, allow layer formation with uniform film thickness on a heavily stepped substrate, are highly compatible with steps of forming TSV, etc., have excellent thermal process resistance, and are capable of increasing productivity of thin wafers.Type: ApplicationFiled: September 17, 2020Publication date: November 3, 2022Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Mitsuo MUTO, Shohei TAGAMI, Michihiro SUGO
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Publication number: 20220002580Abstract: Provided is a method for forming a coating film of a photocurable fluoropolyether-based elastomer composition, with which a uniform cured product of the composition can be obtained even in an interface, dark portion and deep portion of a base material without being subjected to a curing inhibition from the base material (resin base material in particular). The method for forming the coating film of the photocurable fluoropolyether-based elastomer composition includes a step of applying a light-irradiated photocurable fluoropolyether-based elastomer composition to a surface of a base material.Type: ApplicationFiled: November 15, 2019Publication date: January 6, 2022Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Mitsuo MUTO, Kenichi FUKUDA, Noriyuki KOIKE, Toshihiko YASUJIMA, Tomoki TANASE
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Patent number: 9840601Abstract: A photo-curable composition having superior curability at room temperature and storage stability, and also offer a rubber-like cured product thereof having a good profile of properties including heat resistance, low-temperature performance, chemical resistance, solvent resistance and oil resistance. Specifically, A photo-curable composition which includes (A) 100 parts by mass of a linear polyfluoro compound having at least two alkenyl groups in a molecule and a linear perfluoropolyether structure in a backbone of the molecule, (B) a fluorine-containing organohydrogenpolysiloxane having at least two hydrogens bonded to a silicon atom in a molecule, and (C) 0.1 to 500 ppm of a photoactive hydrosililation catalyst relative to the mass of component (A) in terms of metal atom, wherein an amount of component (B) is 0.5 to 3.0 mol of Si—H groups in component (B) relative to 1.0 mol of alkenyl groups in component (A).Type: GrantFiled: January 26, 2017Date of Patent: December 12, 2017Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Mitsuo Muto, Kenichi Fukuda
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Publication number: 20170137583Abstract: A photo-curable composition having superior curability at room temperature and storage stability, and also offer a rubber-like cured product thereof having a good profile of properties including heat resistance, low-temperature performance, chemical resistance, solvent resistance and oil resistance. Specifically, A photo-curable composition which includes (A) 100 parts by mass of a linear polyfluoro compound having at least two alkenyl groups in a molecule and a linear perfluoropolyether structure in a backbone of the molecule, (B) a fluorine-containing organohydrogenpolysiloxane having at least two hydrogens bonded to a silicon atom in a molecule, and (C) 0.1 to 500 ppm of a photoactive hydrosililation catalyst relative to the mass of component (A) in terms of metal atom, wherein an amount of component (B) is 0.5 to 3.0 mol of Si—H groups in component (B) relative to 1.0 mol of alkenyl groups in component (A).Type: ApplicationFiled: January 26, 2017Publication date: May 18, 2017Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Mitsuo MUTO, Kenichi FUKUDA
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Publication number: 20160222170Abstract: A photo-curable composition having superior curability at room temperature and storage stability, and also offer a rubber-like cured product thereof having a good profile of properties including heat resistance, low-temperature performance, chemical resistance, solvent resistance and oil resistance. Specifically, A photo-curable composition which includes (A) 100 parts by mass of a linear polyfluoro compound having at least two alkenyl groups in a molecule and a linear perfluoropolyether structure in a backbone of the molecule, (B) a fluorine-containing organohydrogenpolysiloxane having at least two hydrogens bonded to a silicon atom in a molecule, and (C) 0.1 to 500 ppm of a photoactive hydrosililation catalyst relative to the mass of component (A) in terms of metal atom, wherein an amount of component (B) is 0.5 to 3.0 mol of Si—H groups in component (B) relative to 1.0 mol of alkenyl groups in component (A).Type: ApplicationFiled: February 3, 2016Publication date: August 4, 2016Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Mitsuo MUTO, Kenichi FUKUDA
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Patent number: 9221968Abstract: A curable perfluoropolyether based gel composition is provided comprising (A) a linear fluorinated polymer containing at least two alkenyl groups, (B) a polyfluoromonoalkenyl compound containing one alkenyl group and having a perfluoropolyether structure in its backbone, (C) a cyclic organohydrogenpolysiloxane having at least two silicon-bonded hydrogen atoms and at least one perfluoroalkyl group or perfluoropolyether structure-containing group, and (D) a hydrosilylation reaction catalyst. The composition cures into a gel having improved acid resistance as well as heat resistance, solvent resistance, chemical resistance, weatherability, parting property, and water/oil repellency.Type: GrantFiled: March 24, 2015Date of Patent: December 29, 2015Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Kenichi Fukuda, Mitsuo Muto, Mikio Shiono
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Publication number: 20150274960Abstract: A curable perfluoropolyether based gel composition is provided comprising (A) a linear fluorinated polymer containing at least two alkenyl groups, (B) a polyfluoromonoalkenyl compound containing one alkenyl group and having a perfluoropolyether structure in its backbone, (C) a cyclic organohydrogenpolysiloxane having at least two silicon-bonded hydrogen atoms and at least one perfluoroalkyl group or perfluoropolyether structure-containing group, and (D) a hydrosilylation reaction catalyst. The composition cures into a gel having improved acid resistance as well as heat resistance, solvent resistance, chemical resistance, weatherability, parting property, and water/oil repellency.Type: ApplicationFiled: March 24, 2015Publication date: October 1, 2015Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Kenichi FUKUDA, Mitsuo Muto, Mikio Shiono
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Publication number: 20140114041Abstract: A curable fluoropolyether gel composition comprising (A) a linear polyfluoro compound having at least two alkenyl groups and a perfluoropolyether structure in its backbone, (B) a polyfluoromonoalkenyl compound having one alkenyl group and a perfluoropolyether structure in its backbone, (C) a fluorinated organohydrogensiloxane having at least two SiH groups, and (D) a platinum-based hydrosilylation catalyst is improved by adding (E) a fluorinated acetylene alcohol as reaction regulator. The resulting composition has advantages including uniform dispersion of the catalyst, storage stability, consistent curability, and cured hardness.Type: ApplicationFiled: October 18, 2013Publication date: April 24, 2014Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Mitsuo MUTO, Kenichi FUKUDA, Mikio SHIONO
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Patent number: 8314190Abstract: A fluoropolyether base rubber composition comprising (a) a linear fluoropolyether compound containing at least two ester groups in a molecule and a divalent perfluoroalkyl ether structure in its backbone, and having a Mn of 3,000-100,000, and (b) a siloxane polymer containing at least three amino groups in a molecule cures at room temperature into a product having heat resistance, low-temperature performance, chemical resistance, solvent resistance and oil resistance.Type: GrantFiled: September 2, 2010Date of Patent: November 20, 2012Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Mitsuo Muto, Takashi Matsuda, Mikio Shiono
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Publication number: 20110060109Abstract: A fluoropolyether base rubber composition comprising (a) a linear fluoropolyether compound containing at least two ester groups in a molecule and a divalent perfluoroalkyl ether structure in its backbone, and having a Mn of 3,000-100,000, and (b) a siloxane polymer containing at least three amino groups in a molecule cures at room temperature into a product having heat resistance, low-temperature performance, chemical resistance, solvent resistance and oil resistance.Type: ApplicationFiled: September 2, 2010Publication date: March 10, 2011Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Mitsuo MUTO, Takashi MATSUDA, Mikio SHIONO