Patents by Inventor Mitsuo Suga
Mitsuo Suga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11854201Abstract: A current observation area is determined exploratorily from among a plurality of candidate areas, on the basis of a plurality of observed areas in a biological tissue. A plurality of reference images obtained by means of low-magnification observation of the biological tissue are utilized at this time. A learning image is acquired by means of high-magnification observation of the determined current observation area. A plurality of convolution filters included in an estimator can be utilized to evaluate the plurality of candidate areas.Type: GrantFiled: November 23, 2020Date of Patent: December 26, 2023Assignee: NIKON CORPORATIONInventors: Kohki Konishi, Mitsuo Suga, Hideo Nishioka
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Publication number: 20210073992Abstract: A current observation area is determined exploratorily from among a plurality of candidate areas, on the basis of a plurality of observed areas in a biological tissue. A plurality of reference images obtained by means of low-magnification observation of the biological tissue are utilized at this time. A learning image is acquired by means of high-magnification observation of the determined current observation area. A plurality of convolution filters included in an estimator can be utilized to evaluate the plurality of candidate areas.Type: ApplicationFiled: November 23, 2020Publication date: March 11, 2021Applicant: NIKON CORPORATIONInventors: Kohki KONISHI, Mitsuo SUGA, Hideo NISHIOKA
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Publication number: 20110284745Abstract: A sample holder, inspection apparatus, and an inspection method using the sample holder having a film including a first surface and a second surface. A liquid sample may be held on the first surface. The film is made of two or more layers. A primary beam irradiation device is installed in a reduced-pressure space. Consequently, the sample can be observed or inspected while maintaining the sample at the atmospheric pressure.Type: ApplicationFiled: May 3, 2011Publication date: November 24, 2011Applicant: JEOL LTD.Inventors: Hidetoshi Nishiyama, Nobuo Saotome, Mitsuo Suga
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Patent number: 8030622Abstract: A specimen holder is offered which can reduce the amount of chemical sprayed over a specimen consisting of cultured cells. The specimen holder has an open specimen-holding surface. At least a part of the specimen-holding surface is formed by a film and a tapering portion formed around the film. The specimen can be cultured on the specimen-holding surface of the film. The presence of the tapering portion can reduce the amount of used reagent. The specimen can be irradiated via the film with a primary beam for observation or inspection of the specimen. Consequently, the specimen, such as cells, can be well observed or inspected in vivo while the specimen is being cultured. Especially, if an electron beam is used as the primary beam, the specimen can be well observed or inspected in vivo by SEM (scanning electron microscopy).Type: GrantFiled: June 4, 2009Date of Patent: October 4, 2011Assignee: JEOL Ltd.Inventors: Hidetoshi Nishiyama, Mitsuru Koizumi, Mitsuo Suga
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Patent number: 7928380Abstract: A sample holder used in SEM (scanning electron microscopy) or TEM (transmission electron microscopy) permitting observation and inspection at higher resolution. The holder has a frame-like member provided with an opening that is covered with a film. The film has a first surface on which a sample is held. The thickness D of the film and the length L of the portion of the film providing a cover over the opening in the frame-like member satisfy a relationship given by L/D <200,000.Type: GrantFiled: December 23, 2008Date of Patent: April 19, 2011Assignee: JEOL Ltd.Inventors: Mitsuo Suga, Hidetoshi Nishiyama
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Patent number: 7906760Abstract: An electron microscope method for inspecting a liquid specimen and a reagent solution therefor. A culture medium and biological cells are put in the sample holder. A plugging agent is mixed into the liquid sample. The cells can be irradiated with a primary beam via a film. An image of the cells or information about the cells is obtained by detecting a resulting secondary signal. If the film is destroyed, the plugging agent plugs up the damaged portion of the film. Consequently, liquid leakage can be minimized.Type: GrantFiled: December 15, 2008Date of Patent: March 15, 2011Assignee: JEOL Ltd.Inventors: Hidetoshi Nishiyama, Mitsuo Suga, Mitsuru Koizumi
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Patent number: 7876113Abstract: Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias is monitored. As a result, charge is alleviated at a location where junction leakage is caused in a time period shorter than that of a normal portion and therefore, a potential difference is produced between the normal portion and a failed portion and is observed in a potential contrast image as a difference in brightness. By consecutively repeating operation of acquiring the image, executing an image processing in real time and storing a position and brightness of the failed portion, the automatic inspection of a designated region can be executed. Information of image, brightness and distribution of the failed portion is preserved and outputted automatically after inspection.Type: GrantFiled: January 17, 2008Date of Patent: January 25, 2011Assignee: Hitachi, Ltd.Inventors: Mari Nozoe, Mitsuo Suga, Yoichiro Neo, Hidetoshi Nishiyama
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Publication number: 20100243888Abstract: An inspection apparatus and method capable of well observing or inspecting a specimen contained in a liquid. The inspection apparatus has a film including first and second surfaces. Furthermore, the apparatus has a vacuum chamber for reducing the pressure in the ambient in contact with the second surface of the film, primary beam irradiation column connected with the vacuum chamber, and a shutter for partially partitioning the space between the film and the primary beam irradiation column within the vacuum chamber. A liquid sample is held on the first surface of the film. The primary beam irradiation column irradiates the sample. Backscattered electrons (a secondary beam) produced from the sample by the primary beam irradiation are directed at the shutter, producing secondary electrons (a tertiary signal).Type: ApplicationFiled: March 17, 2010Publication date: September 30, 2010Applicant: JEOL LTD.Inventors: Hidetoshi Nishiyama, Mitsuru Koizumi, Mitsuo Suga
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Publication number: 20100019146Abstract: Specimen holder, specimen inspection apparatus, and specimen inspection method for observing or inspecting a specimen consisting of cultured cells. The specimen holder has a body portion and a film. The body portion has a specimen-holding surface opened to permit access from the outside. The film has a first surface forming the specimen-holding surface. The specimen disposed on the first surface of the film can be irradiated with a primary beam for observation or inspection of the specimen via the film. A region coated with an electrically conductive film is formed on the bottom surface of the body portion facing away from the specimen-holding surface. An optically transparent region not coated with the electrically conductive film is also formed on the bottom surface.Type: ApplicationFiled: July 10, 2009Publication date: January 28, 2010Applicant: JEOL LTD.Inventors: Hidetoshi Nishiyama, Mitsuru Koizumi, Mitsuo Suga
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Publication number: 20090314955Abstract: A specimen holder is offered which can reduce the amount of chemical sprayed over a specimen consisting of cultured cells. The specimen holder has an open specimen-holding surface. At least a part of the specimen-holding surface is formed by a film and a tapering portion formed around the film. The specimen can be cultured on the specimen-holding surface of the film. The presence of the tapering portion can reduce the amount of used reagent. The specimen can be irradiated via the film with a primary beam for observation or inspection of the specimen. Consequently, the specimen, such as cells, can be well observed or inspected in vivo while the specimen is being cultured. Especially, if an electron beam is used as the primary beam, the specimen can be well observed or inspected in vivo by SEM (scanning electron microscopy).Type: ApplicationFiled: June 4, 2009Publication date: December 24, 2009Applicant: JEOL LTD.Inventors: Hidetoshi Nishiyama, Mitsuru Koizumi, Mitsuo Suga
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Publication number: 20090250609Abstract: An electron microscope method for inspecting a liquid specimen and a reagent solution therefor. A culture medium and biological cells are put in the sample holder. A plugging agent is mixed into the liquid sample. The cells can be irradiated with a primary beam via a film. An image of the cells or information about the cells is obtained by detecting a resulting secondary signal. If the film is destroyed, the plugging agent plugs up the damaged portion of the film. Consequently, liquid leakage can be minimized.Type: ApplicationFiled: December 15, 2008Publication date: October 8, 2009Applicant: JEOL LTD.Inventors: Hidetoshi Nishiyama, Mitsuo Suga, Mitsuru Koizumi
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Publication number: 20090166536Abstract: A sample holder used in SEM (scanning electron microscopy) or TEM (transmission electron microscopy) permitting observation and inspection at higher resolution. The holder has a frame-like member provided with an opening that is covered with a film. The film has a first surface on which a sample is held. The thickness D of the film and the length L of the portion of the film providing a cover over the opening in the frame-like member satisfy a relationship given by L/D <200,000.Type: ApplicationFiled: December 23, 2008Publication date: July 2, 2009Applicant: JEOL LTD.Inventors: Mitsuo Suga, Hidetoshi Nishiyama
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Patent number: 7202476Abstract: A charged-particle beam instrument is offered which can inspect side and rear surfaces of a sample. Two electron optical microscope columns are mounted in a vacuum chamber. Each of the microscope columns has an electron gun, a condenser lens system, a deflector, and a secondary electron detector. A sample stage assembly on which a sample is placed is mounted in the vacuum chamber. The stage assembly consists of a rotary stage, an X-stage, and a Y-stage. One of the microscope columns is placed in a position where the electron beam from the column can scan at least an upper part of a side surface of the sample. The other microscope column is placed in a position where the beam from the column can scan at least a lower part of the side surface of the sample.Type: GrantFiled: March 7, 2006Date of Patent: April 10, 2007Assignee: JEOL Ltd.Inventors: Mitsuo Suga, Tomohiro Mihira
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Publication number: 20060219914Abstract: A charged-particle beam instrument is offered which can inspect side and rear surfaces of a sample. Two electron optical microscope columns are mounted in a vacuum chamber. Each of the microscope columns has an electron gun, a condenser lens system, a deflector, and a secondary electron detector. A sample stage assembly on which a sample is placed is mounted in the vacuum chamber. The stage assembly consists of a rotary stage, an X-stage, and a Y-stage. One of the microscope columns is placed in a position where the electron beam from the column can scan at least an upper part of a side surface of the sample. The other microscope column is placed in a position where the beam from the column can scan at least a lower part of the side surface of the sample.Type: ApplicationFiled: March 7, 2006Publication date: October 5, 2006Applicant: JEOL Ltd.Inventors: Mitsuo Suga, Tomohiro Mihira
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Patent number: 6924482Abstract: Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias is monitored. As a result, charge is alleviated at a location where junction leakage is caused in a time period shorter than that of a normal portion and therefore, a potential difference is produced between the normal portion and a failed portion and is observed in a potential contrast image as a difference in brightness. By consecutively repeating operation of acquiring the image, executing an image processing in real time and storing a position and brightness of the failed portion, the automatic inspection of a designated region can be executed. Information of image, brightness and distribution of the failed portion is preserved and outputted automatically after inspection.Type: GrantFiled: March 25, 2003Date of Patent: August 2, 2005Assignee: Hitachi, Ltd.Inventors: Mari Nozoe, Mitsuo Suga, Yoichiro Neo, Hidetoshi Nishiyama
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Publication number: 20030179007Abstract: Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias is monitored. As a result, charge is alleviated at a location where junction leakage is caused in a time period shorter than that of a normal portion and therefore, a potential difference is produced between the normal portion and a failed portion and is observed in a potential contrast image as a difference in brightness. By consecutively repeating operation of acquiring the image, executing an image processing in real time and storing a position and brightness of the failed portion, the automatic inspection of a designated region can be executed. Information of image, brightness and distribution of the failed portion is preserved and outputted automatically after inspection.Type: ApplicationFiled: March 25, 2003Publication date: September 25, 2003Applicant: Hitachi, LtdInventors: Mari Nozoe, Mitsuo Suga, Yoichiro Neo, Hidetoshi Nishiyama
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Patent number: 6586952Abstract: Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias is monitored. As a result, charge is alleviated at a location where junction leakage is caused in a time period shorter than that of a normal portion and therefore, a potential difference is produced between the normal portion and a failed portion and is observed in a potential contrast image as a difference in brightness. By consecutively repeating operation of acquiring the image, executing an image processing in real time and storing a position and brightness of the failed portion, the automatic inspection of a designated region can be executed. Information of image, brightness and distribution of the failed portion is preserved and outputted automatically after inspection.Type: GrantFiled: June 15, 2001Date of Patent: July 1, 2003Inventors: Mari Nozoe, Mitsuo Suga, Yoichiro Neo, Hidetoshi Nishiyama
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Publication number: 20010052781Abstract: Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias is monitored. As a result, charge is alleviated at a location where junction leakage is caused in a time period shorter than that of a normal portion and therefore, a potential difference is produced between the normal portion and a failed portion and is observed in a potential contrast image as a difference in brightness. By consecutively repeating operation of acquiring the image, executing an image processing in real time and storing a position and brightness of the failed portion, the automatic inspection of a designated region can be executed. Information of image, brightness and distribution of the failed portion is preserved and outputted automatically after inspection.Type: ApplicationFiled: June 15, 2001Publication date: December 20, 2001Inventors: Mari Nozoe, Mitsuo Suga, Yoichiro Neo, Hidetoshi Nishiyama
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Patent number: 5550389Abstract: A superconducting device low in power dissipation and high in operating speed is fabricated by use of a combination of a superconductor material and a semiconductor material. The superconducting device having a low power dissipation and high operating speed characteristic according to the present invention is suitable for configuring a large-scale integrated circuit.Type: GrantFiled: December 22, 1993Date of Patent: August 27, 1996Assignee: Hitachi, Ltd.Inventors: Toshikazu Nishino, Mutsuko Hatano, Haruhiro Hasegawa, Hideaki Nakane, Ushio Kawabe, Kazuo Saitoh, Mitsuo Suga, Kazumasa Takagi
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Patent number: 5250506Abstract: A superconductive element at least comprising first and second superconductive electrodes composed of an oxide superconductor material and a semiconductor film composed of an oxide semiconductor material put between the first and second superconductive electrodes and disposed in adjacent with the first and the second superconductive electrodes, in which the semiconductor film is formed with an oxide comprising rare earth elements other than Pr, Ba and Cu as the main ingredient element or an oxide comprising predetermined amount of rare earth elements other than Pr, predetermined amount of Pr, Ba and Cu as the main ingredient element. Extremely fine size is no more necessary to enable fabrication with the existent fine fabrication technic.Type: GrantFiled: January 29, 1991Date of Patent: October 5, 1993Assignee: Hitachi, Ltd.Inventors: Shinichiroh Saitoh, Yoshinobu Tarutani, Tokuumi Fukazawa, Masahiko Hiratani, Toshikazu Nishino, Haruhiro Hasegawa, Ushio Kawabe, Kazumasa Takagi, Mitsuo Suga