Patents by Inventor Mitsuru Konno

Mitsuru Konno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9040911
    Abstract: Conventionally, in a general-purpose scanning electron microscope, the maximum accelerating voltage which can be set is low, and hence thin crystal samples which can be observed under normal high-resolution observation conditions are limited to samples with large lattice spacing. For this reason, there has no means for accurately performing magnification calibration. As means for solving this problem, the present invention includes an electron source which generates an electron beam, a deflector which deflects the electron beam so as to scan a sample with the electron beam, an objective lens which focuses the electron beam on the sample, a detector which detects an elastically scattered electron and an inelastically scattered electron which are transmitted through the sample, and an aperture disposed between the sample and the detector to control detection angles of the elastically scattered electron and the inelastically scattered electron.
    Type: Grant
    Filed: March 25, 2013
    Date of Patent: May 26, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takeshi Ogashiwa, Mitsugu Sato, Mitsuru Konno
  • Publication number: 20150108351
    Abstract: Conventionally, in a general-purpose scanning electron microscope, the maximum accelerating voltage which can be set is low, and hence thin crystal samples which can be observed under normal high-resolution observation conditions are limited to samples with large lattice spacing. For this reason, there has no means for accurately performing magnification calibration. As means for solving this problem, the present invention includes an electron source which generates an electron beam, a deflector which deflects the electron beam so as to scan a sample with the electron beam, an objective lens which focuses the electron beam on the sample, a detector which detects an elastically scattered electron and an inelastically scattered electron which are transmitted through the sample, and an aperture disposed between the sample and the detector to control detection angles of the elastically scattered electron and the inelastically scattered electron.
    Type: Application
    Filed: March 25, 2013
    Publication date: April 23, 2015
    Inventors: Takeshi Ogashiwa, Mitsugu Sato, Mitsuru Konno
  • Patent number: 7612337
    Abstract: A focused ion beam system capable of acquiring surface structure information, internal structure information, and internal composition information about a sample simultaneously from the same field of view of the sample. A method of sample preparation and observation employs such focused ion beam system to accurately set a sample processing position based on information about the structure and composition of the sample acquired from multiple directions of the sample, and to process and observe the sample. The system includes, in order to acquire the sample structure and composition information simultaneously, a secondary electron detector, a transmission electron detector, and an energy dispersive X-ray spectroscope or an electron energy loss spectroscope, and employs a stub having the sample rotating and tilting function. The method includes a marking process.
    Type: Grant
    Filed: January 18, 2007
    Date of Patent: November 3, 2009
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuya Suzuki, Takeo Kamino, Toshie Yaguchi, Mitsuru Konno, Tsuyoshi Ohnishi
  • Publication number: 20070187597
    Abstract: A focused ion beam system capable of acquiring surface structure information, internal structure information, and internal composition information about a sample simultaneously from the same field of view of the sample. A method of sample preparation and observation employs such focused ion beam system to accurately set a sample processing position based on information about the structure and composition of the sample acquired from multiple directions of the sample, and to process and observe the sample. The system includes, in order to acquire the sample structure and composition information simultaneously, a secondary electron detector, a transmission electron detector, and an energy dispersive X-ray spectroscope or an electron energy loss spectroscope, and employs a stub having the sample rotating and tilting function. The method includes a marking process.
    Type: Application
    Filed: January 18, 2007
    Publication date: August 16, 2007
    Inventors: Yuya Suzuki, Takeo Kamino, Toshie Yaguchi, Mitsuru Konno, Tsuyoshi Ohnishi
  • Patent number: 5318035
    Abstract: A crosslinked molding, a process for producing the same, a sound medium using the same, and an ultrasonic coupler using the same are disclosed. The crosslinked molding comprises a crosslinked molding comprising a composition containing a rubbery elastic body comprising a hydrophobic high molecular weight material having at least one double bond in the molecule and an oily component dissolving the rubbery elastic body, the composition being crosslinked by the addition of an organic peroxide or by the irradiation of a radiation and molded.
    Type: Grant
    Filed: December 1, 1992
    Date of Patent: June 7, 1994
    Assignee: Nitto Denko Corporation
    Inventors: Masayuki Konno, Fumiya Shirai, Hideo Sato, Tetsuo Horiuchi, Mitsuru Konno, Yuichi Inoue