Patents by Inventor Mitsuru Uda

Mitsuru Uda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11926227
    Abstract: In a moving-object power supply system, a control unit selects, as a power transmission segment, one of segments included in at least one power transmission section. The control unit supplies, through a power supply circuit, power to the power transmission segment to thereby generate a magnetic field through a power transmission coil of the power transmission segment. The control unit determines, based on an ascertained first electrical characteristic of the power transmission segment and an ascertained second electrical characteristic of at least one power non-transmission segment, whether there is a malfunction in each of the power transmission segment and the at least one power non-transmission segment.
    Type: Grant
    Filed: November 17, 2021
    Date of Patent: March 12, 2024
    Assignee: DENSO CORPORATION
    Inventors: Kouji Mazaki, Nobuhisa Yamaguchi, Eisuke Takahashi, Mitsuru Shibanuma, Shinpei Takita, Masaya Takahashi, Hayato Sumiya, Masaki Kanesaki, Takuya Kiguchi, Kazuhiro Uda, Yuusei Nakayashiki
  • Patent number: 7719672
    Abstract: The invention provides a macro inspection apparatus including: a stage on which an inspection object is placed; a light source that irradiates light on an upper surface of the inspection object from an angular direction arbitrarily selected relative to the upper surface of the inspection object; and a line sensor which is placed in an angular direction selected relative to the upper surface of the inspection object so that an optical axis thereof corresponds with an edge of the upper surface area irradiated by the light source and which receives reflected light from the edge of the upper surface area of the inspection object.
    Type: Grant
    Filed: December 3, 2008
    Date of Patent: May 18, 2010
    Assignee: International Business Machines Corporation
    Inventors: Atsushi Kohayase, Mitsuru Uda
  • Publication number: 20090147248
    Abstract: The invention provides a macro inspection apparatus including: a stage on which an inspection object is placed; a light source that irradiates light on an upper surface of the inspection object from an angular direction arbitrarily selected relative to the upper surface of the inspection object; and a line sensor which is placed in an angular direction selected relative to the upper surface of the inspection object so that an optical axis thereof corresponds with an edge of the upper surface area irradiated by the light source and which receives reflected light from the edge of the upper surface area of the inspection object.
    Type: Application
    Filed: December 3, 2008
    Publication date: June 11, 2009
    Inventors: Atsushi Kohayase, Mitsuru Uda
  • Patent number: 7525651
    Abstract: Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern 32 is for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plate 30 on which a pattern is mounted, light sources 40, 42 and 44 which can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectors 52 and 54 which can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns.
    Type: Grant
    Filed: October 25, 2007
    Date of Patent: April 28, 2009
    Assignee: International Business Machines Corporation
    Inventors: Mitsuru Uda, Kazunari Terakawa, Akira Susuki, Chiaki Oishi, Yasuharu Yamada, Teruhiko Havano
  • Patent number: 7440118
    Abstract: The present invention provides an apparatus and method for detecting flatness and/or unevenness of a surface of an overcoat layer on a colored pixel layer of a color filter with a high degree of accuracy. The apparatus includes: a light source 34, placed almost directly above the surface of a plate 30, for emitting an emission-line spectrum corresponding to at least one color of coloring particles in a color filter 32; a photo-receiver 36, placed obliquely upward with respect to the surface of the plate 30 and having a spectral sensitivity corresponding to the emission-line spectrum of the light source, for receiving reflected light from the color filter 32 on the plate 30 during inspection; and a detection means 42 for creating a brightness distribution for a color using a color signal output from the photo-receiver 36 as corresponding to its spectral sensitivity to detect the flatness (unevenness) of the surface of an overcoat layer 16.
    Type: Grant
    Filed: May 18, 2006
    Date of Patent: October 21, 2008
    Assignee: International Business Machines Corporation
    Inventors: Mitsuru Uda, Atsushi Kohayase, Hiroshi Yamashita
  • Publication number: 20080192257
    Abstract: Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern 32 is for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plate 30 on which a pattern is mounted, light sources 40, 42 and 44 which can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectors 52 and 54 which can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns.
    Type: Application
    Filed: October 25, 2007
    Publication date: August 14, 2008
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Mitsuru Uda, Kazunari Terakawa, Akira Susuki, Chiaki Oishi, Yasuharu Yamada, Teruhiko Havano
  • Patent number: 7310141
    Abstract: Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern 32 is for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plate 30 on which a pattern is mounted, light sources 40, 42 and 44 which can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectors 52 and 54 which can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns.
    Type: Grant
    Filed: November 28, 2002
    Date of Patent: December 18, 2007
    Assignee: International Business Machines Corporation
    Inventors: Mitsuru Uda, Kazunari Terakawa, Akira Suzuki, Chiaki Oishi, Yasuharu Yamada, Teruhiko Hayano
  • Publication number: 20060290922
    Abstract: The present invention provides an apparatus and method for detecting flatness and/or unevenness of a surface of an overcoat layer on a colored pixel layer of a color filter with a high degree of accuracy. The apparatus includes: a light source 34, placed almost directly above the surface of a plate 30, for emitting an emission-line spectrum corresponding to at least one color of coloring particles in a color filter 32; a photo-receiver 36, placed obliquely upward with respect to the surface of the plate 30 and having a spectral sensitivity corresponding to the emission-line spectrum of the light source, for receiving reflected light from the color filter 32 on the plate 30 during inspection; and a detection means 42 for creating a brightness distribution for a color using a color signal output from the photo-receiver 36 as corresponding to its spectral sensitivity to detect the flatness (unevenness) of the surface of an overcoat layer 16.
    Type: Application
    Filed: May 18, 2006
    Publication date: December 28, 2006
    Applicant: International Business Machines Corporation
    Inventors: Mitsuru Uda, Atsushi Kohayase, Hiroshi Yamashita
  • Publication number: 20050116187
    Abstract: Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern 32 is for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plate 30 on which a pattern is mounted, light sources 40, 42 and 44 which can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectors 52 and 54 which can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns.
    Type: Application
    Filed: November 28, 2002
    Publication date: June 2, 2005
    Inventors: Mitsuru Uda, Kazunari Terakawa, Akira Suzuki, Chiaki Oishi, Yasuharu Yamada, Teruhiko Hayano
  • Patent number: 6825924
    Abstract: The invention provides methods and apparatus for substrate inspection and other lighting applications. It includes an lighting apparatus 10 which comprises: an illuminator 12 including a light source for emitting lights 14; supporting means for supporting an object (e.g. a patterned substrate) 18 having a finely patterned surface 16 on which predetermined patterns are formed, which is illuminated at a predetermined angle with the lights 14 from the illuminator 12; and determining means 24 for determining whether or not predetermined patterns on the surface of the object (substrate) 16 are deformed using lights 22 diffracted by the finely patterned surface 16, wherein the illuminator 12 applies two kinds of lights 14 each having a narrow wavelength range with a peak wavelength at a respective one of two complementary colors.
    Type: Grant
    Filed: December 11, 2000
    Date of Patent: November 30, 2004
    Assignee: International Business Machines Corporation
    Inventors: Mitsuru Uda, Tsuyoshi Iguchi, Tetsuya Nogami
  • Patent number: 6781650
    Abstract: Incident light from the space between the light-reflecting films in a liquid crystal light valve of a liquid crystal display device, especially in a reflection-type liquid crystal light valve of a projection-type liquid crystal display device is effectively blocked. The liquid crystal light valve having a semiconductor substrate, a counter substrate, light-reflecting films, and liquid crystal comprises a light-blocking layer and light shields formed between the light-blocking layer and the light-reflecting films.
    Type: Grant
    Filed: September 14, 2000
    Date of Patent: August 24, 2004
    Assignee: International Business Machines Corporation
    Inventors: Evan George Colgan, Masami Shinohara, Mitsuru Uda
  • Patent number: 6654129
    Abstract: To provide a film thickness testing apparatus and a film thickness testing method in which coherence between light reflected from the surface of a film and light reflected from the surface of a substrate is improved so as to accurately visually test film thickness irregularities. Film thickness testing is conducted by using a light source part for irradiating a substrate with light having an intensity peak with a half band width of 30 nm or less and having spectral intensity in a peak wavelength region alone.
    Type: Grant
    Filed: March 1, 2000
    Date of Patent: November 25, 2003
    Assignee: International Business Machines Corporation
    Inventors: Mitsuru Uda, Masami Shinohara
  • Patent number: 6614502
    Abstract: An active matrix reflective liquid crystal device includes an array substrate which includes switching elements corresponding to pixels and an array of pixel electrodes connected to the switching elements; and an opposing substrate which has a transparent electrode opposite the array of pixel electrodes with a liquid crystal layer inserted therebetween. Each of the pixel electrodes includes an array of electrode studs, (e.g., divided electrode elements). The regions between the electrodes are filled with an insulating material, and the surface of the stud array is planarized by chemical-mechanical polishing (CMP). A dielectric light reflective film is formed on the planarized surface of the stud array, and a liquid crystal molecule alignment film is deposited thereon.
    Type: Grant
    Filed: April 4, 2001
    Date of Patent: September 2, 2003
    Assignee: International Business Machines Corporation
    Inventors: Masami Shinohara, Mitsuru Uda
  • Patent number: 6452671
    Abstract: The inspecting apparatus according to the present invention includes an illuminator for emitting radiation onto a substrate having a surface on which a fine feature pattern is formed. Inspection for defects in the pattern is performed by visually inspecting radiation diffracted by the surface. The illuminator provides radiation including two different complementary colors.
    Type: Grant
    Filed: October 27, 2000
    Date of Patent: September 17, 2002
    Assignee: International Business Machines Corporation
    Inventors: Mitsuru Uda, Tsuyoshi Yamaguchi, Masami Shinohara
  • Publication number: 20020113959
    Abstract: A method and apparatus for inspecting a resist pattern formed on an anti-reflection coating to detect defects by applying light to the resist pattern and visually observing light diffracted from the resist pattern. Light is applied to the resist pattern from a light source at an incident angle of 45 degrees or less with respect to the top surface of the resist pattern. An inspector positioned on the same side as the light source determines the presence or absence of a defective portion of the resist pattern by visually observing light diffracted to the same side as the light source. The defective portion of the resist can be visually distinguished from the non-defective portion by the brightness and color of the light diffracted to the same side as the light source.
    Type: Application
    Filed: November 9, 2001
    Publication date: August 22, 2002
    Applicant: International Business Machines Corporation
    Inventors: Mitsuru Uda, Kazunari Terakawa, Akira Suzuki
  • Publication number: 20010030725
    Abstract: An active matrix reflective liquid crystal device includes an array substrate which includes switching elements corresponding to pixels and an array of pixel electrodes connected to the switching elements; and an opposing substrate which has a transparent electrode opposite the array of pixel electrodes with a liquid crystal layer inserted therebetween. Each of the pixel electrodes includes an array of electrode studs, (e.g., divided electrode elements). The regions between the electrodes are filled with an insulating material, and the surface of the stud array is planarized by chemical-mechanical polishing (CMP). A dielectric light reflective film is formed on the planarized surface of the stud array, and a liquid crystal molecule alignment film is deposited thereon.
    Type: Application
    Filed: April 4, 2001
    Publication date: October 18, 2001
    Applicant: International Business Machines Corporation
    Inventors: Masami Shinohara, Mitsuru Uda
  • Patent number: 6292246
    Abstract: An active matrix reflective liquid crystal device includes an array substrate which includes switching elements corresponding to pixels and an array of pixel electrodes connected to the switching elements; and an opposing substrate which has a transparent electrode opposite the array of pixel electrodes with a liquid crystal layer inserted therebetween. Each of the pixel electrodes includes an array of electrode studs, (e.g., divided electrode elements). The regions between the electrodes are filled with an insulating material, and the surface of the stud array is planarized by chemical-mechanical polishing (CMP). A dielectric light reflective film is formed on the planarized surface of the stud array, and a liquid crystal molecule alignment film is deposited thereon.
    Type: Grant
    Filed: February 24, 1999
    Date of Patent: September 18, 2001
    Assignee: International Business Machines Corporation
    Inventors: Masami Shinohara, Mitsuru Uda
  • Publication number: 20010015800
    Abstract: The invention provides methods and apparatus for substrate inspection and other lighting applications. It includes an lighting apparatus 10 which comprises: an illuminator 12 including a light source for emitting lights 14; supporting means for supporting an object (e.g. a patterned substrate) 18 having a finely patterned surface 16 on which predetermined patterns are formed, which is illuminated at a predetermined angle with the lights 14 from the illuminator 12; and determining means 24 for determining whether or not predetermined patterns on the surface of the object (substrate) 16 are deformed using lights 22 diffracted by the finely patterned surface 16, wherein the illuminator 12 applies two kinds of lights 14 each having a narrow wavelength range with a peak wavelength at a respective one of two complementary colors.
    Type: Application
    Filed: December 11, 2000
    Publication date: August 23, 2001
    Inventors: Mitsuru Uda, Tsuyoshi Iguchi, Tetsuya Nogami
  • Patent number: 6040888
    Abstract: A liquid crystal display device having pillar-shaped spacers formed in pixel array regions is provided with improved display quality by preventing the degradation of contrast and the occurrence of residual images. A plurality of pillar-shape spacers formed in their pixel array regions are provided at locations which do not overlap with each other when images are projected on the screen using three different liquid crystal light valves to project the red (R), green (G) and blue (B), constituents of images.
    Type: Grant
    Filed: November 14, 1997
    Date of Patent: March 21, 2000
    Assignee: International Business Machines Corporation
    Inventors: Shinohara Masami, Mitsuru Uda, Kunio Enami
  • Patent number: 5739890
    Abstract: This invention relates to a reflection liquid crystal display device using a reflection liquid crystal light bulb and a method for fabricating such liquid crystal display devices, and an object thereof is to provide a liquid crystal display device and its manufacture wherein the numerical aperture of the subpixel is increased to improve the display brightness.
    Type: Grant
    Filed: February 6, 1996
    Date of Patent: April 14, 1998
    Assignee: International Business Machines Corporation
    Inventors: Mitsuru Uda, Masami Shinohara, Mamoru Nishida