Patents by Inventor Mitsuru Uda
Mitsuru Uda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11926227Abstract: In a moving-object power supply system, a control unit selects, as a power transmission segment, one of segments included in at least one power transmission section. The control unit supplies, through a power supply circuit, power to the power transmission segment to thereby generate a magnetic field through a power transmission coil of the power transmission segment. The control unit determines, based on an ascertained first electrical characteristic of the power transmission segment and an ascertained second electrical characteristic of at least one power non-transmission segment, whether there is a malfunction in each of the power transmission segment and the at least one power non-transmission segment.Type: GrantFiled: November 17, 2021Date of Patent: March 12, 2024Assignee: DENSO CORPORATIONInventors: Kouji Mazaki, Nobuhisa Yamaguchi, Eisuke Takahashi, Mitsuru Shibanuma, Shinpei Takita, Masaya Takahashi, Hayato Sumiya, Masaki Kanesaki, Takuya Kiguchi, Kazuhiro Uda, Yuusei Nakayashiki
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Patent number: 7719672Abstract: The invention provides a macro inspection apparatus including: a stage on which an inspection object is placed; a light source that irradiates light on an upper surface of the inspection object from an angular direction arbitrarily selected relative to the upper surface of the inspection object; and a line sensor which is placed in an angular direction selected relative to the upper surface of the inspection object so that an optical axis thereof corresponds with an edge of the upper surface area irradiated by the light source and which receives reflected light from the edge of the upper surface area of the inspection object.Type: GrantFiled: December 3, 2008Date of Patent: May 18, 2010Assignee: International Business Machines CorporationInventors: Atsushi Kohayase, Mitsuru Uda
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Publication number: 20090147248Abstract: The invention provides a macro inspection apparatus including: a stage on which an inspection object is placed; a light source that irradiates light on an upper surface of the inspection object from an angular direction arbitrarily selected relative to the upper surface of the inspection object; and a line sensor which is placed in an angular direction selected relative to the upper surface of the inspection object so that an optical axis thereof corresponds with an edge of the upper surface area irradiated by the light source and which receives reflected light from the edge of the upper surface area of the inspection object.Type: ApplicationFiled: December 3, 2008Publication date: June 11, 2009Inventors: Atsushi Kohayase, Mitsuru Uda
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Patent number: 7525651Abstract: Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern 32 is for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plate 30 on which a pattern is mounted, light sources 40, 42 and 44 which can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectors 52 and 54 which can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns.Type: GrantFiled: October 25, 2007Date of Patent: April 28, 2009Assignee: International Business Machines CorporationInventors: Mitsuru Uda, Kazunari Terakawa, Akira Susuki, Chiaki Oishi, Yasuharu Yamada, Teruhiko Havano
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Patent number: 7440118Abstract: The present invention provides an apparatus and method for detecting flatness and/or unevenness of a surface of an overcoat layer on a colored pixel layer of a color filter with a high degree of accuracy. The apparatus includes: a light source 34, placed almost directly above the surface of a plate 30, for emitting an emission-line spectrum corresponding to at least one color of coloring particles in a color filter 32; a photo-receiver 36, placed obliquely upward with respect to the surface of the plate 30 and having a spectral sensitivity corresponding to the emission-line spectrum of the light source, for receiving reflected light from the color filter 32 on the plate 30 during inspection; and a detection means 42 for creating a brightness distribution for a color using a color signal output from the photo-receiver 36 as corresponding to its spectral sensitivity to detect the flatness (unevenness) of the surface of an overcoat layer 16.Type: GrantFiled: May 18, 2006Date of Patent: October 21, 2008Assignee: International Business Machines CorporationInventors: Mitsuru Uda, Atsushi Kohayase, Hiroshi Yamashita
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Publication number: 20080192257Abstract: Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern 32 is for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plate 30 on which a pattern is mounted, light sources 40, 42 and 44 which can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectors 52 and 54 which can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns.Type: ApplicationFiled: October 25, 2007Publication date: August 14, 2008Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Mitsuru Uda, Kazunari Terakawa, Akira Susuki, Chiaki Oishi, Yasuharu Yamada, Teruhiko Havano
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Patent number: 7310141Abstract: Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern 32 is for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plate 30 on which a pattern is mounted, light sources 40, 42 and 44 which can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectors 52 and 54 which can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns.Type: GrantFiled: November 28, 2002Date of Patent: December 18, 2007Assignee: International Business Machines CorporationInventors: Mitsuru Uda, Kazunari Terakawa, Akira Suzuki, Chiaki Oishi, Yasuharu Yamada, Teruhiko Hayano
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Publication number: 20060290922Abstract: The present invention provides an apparatus and method for detecting flatness and/or unevenness of a surface of an overcoat layer on a colored pixel layer of a color filter with a high degree of accuracy. The apparatus includes: a light source 34, placed almost directly above the surface of a plate 30, for emitting an emission-line spectrum corresponding to at least one color of coloring particles in a color filter 32; a photo-receiver 36, placed obliquely upward with respect to the surface of the plate 30 and having a spectral sensitivity corresponding to the emission-line spectrum of the light source, for receiving reflected light from the color filter 32 on the plate 30 during inspection; and a detection means 42 for creating a brightness distribution for a color using a color signal output from the photo-receiver 36 as corresponding to its spectral sensitivity to detect the flatness (unevenness) of the surface of an overcoat layer 16.Type: ApplicationFiled: May 18, 2006Publication date: December 28, 2006Applicant: International Business Machines CorporationInventors: Mitsuru Uda, Atsushi Kohayase, Hiroshi Yamashita
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Publication number: 20050116187Abstract: Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern 32 is for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plate 30 on which a pattern is mounted, light sources 40, 42 and 44 which can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectors 52 and 54 which can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns.Type: ApplicationFiled: November 28, 2002Publication date: June 2, 2005Inventors: Mitsuru Uda, Kazunari Terakawa, Akira Suzuki, Chiaki Oishi, Yasuharu Yamada, Teruhiko Hayano
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Patent number: 6825924Abstract: The invention provides methods and apparatus for substrate inspection and other lighting applications. It includes an lighting apparatus 10 which comprises: an illuminator 12 including a light source for emitting lights 14; supporting means for supporting an object (e.g. a patterned substrate) 18 having a finely patterned surface 16 on which predetermined patterns are formed, which is illuminated at a predetermined angle with the lights 14 from the illuminator 12; and determining means 24 for determining whether or not predetermined patterns on the surface of the object (substrate) 16 are deformed using lights 22 diffracted by the finely patterned surface 16, wherein the illuminator 12 applies two kinds of lights 14 each having a narrow wavelength range with a peak wavelength at a respective one of two complementary colors.Type: GrantFiled: December 11, 2000Date of Patent: November 30, 2004Assignee: International Business Machines CorporationInventors: Mitsuru Uda, Tsuyoshi Iguchi, Tetsuya Nogami
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Patent number: 6781650Abstract: Incident light from the space between the light-reflecting films in a liquid crystal light valve of a liquid crystal display device, especially in a reflection-type liquid crystal light valve of a projection-type liquid crystal display device is effectively blocked. The liquid crystal light valve having a semiconductor substrate, a counter substrate, light-reflecting films, and liquid crystal comprises a light-blocking layer and light shields formed between the light-blocking layer and the light-reflecting films.Type: GrantFiled: September 14, 2000Date of Patent: August 24, 2004Assignee: International Business Machines CorporationInventors: Evan George Colgan, Masami Shinohara, Mitsuru Uda
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Patent number: 6654129Abstract: To provide a film thickness testing apparatus and a film thickness testing method in which coherence between light reflected from the surface of a film and light reflected from the surface of a substrate is improved so as to accurately visually test film thickness irregularities. Film thickness testing is conducted by using a light source part for irradiating a substrate with light having an intensity peak with a half band width of 30 nm or less and having spectral intensity in a peak wavelength region alone.Type: GrantFiled: March 1, 2000Date of Patent: November 25, 2003Assignee: International Business Machines CorporationInventors: Mitsuru Uda, Masami Shinohara
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Patent number: 6614502Abstract: An active matrix reflective liquid crystal device includes an array substrate which includes switching elements corresponding to pixels and an array of pixel electrodes connected to the switching elements; and an opposing substrate which has a transparent electrode opposite the array of pixel electrodes with a liquid crystal layer inserted therebetween. Each of the pixel electrodes includes an array of electrode studs, (e.g., divided electrode elements). The regions between the electrodes are filled with an insulating material, and the surface of the stud array is planarized by chemical-mechanical polishing (CMP). A dielectric light reflective film is formed on the planarized surface of the stud array, and a liquid crystal molecule alignment film is deposited thereon.Type: GrantFiled: April 4, 2001Date of Patent: September 2, 2003Assignee: International Business Machines CorporationInventors: Masami Shinohara, Mitsuru Uda
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Patent number: 6452671Abstract: The inspecting apparatus according to the present invention includes an illuminator for emitting radiation onto a substrate having a surface on which a fine feature pattern is formed. Inspection for defects in the pattern is performed by visually inspecting radiation diffracted by the surface. The illuminator provides radiation including two different complementary colors.Type: GrantFiled: October 27, 2000Date of Patent: September 17, 2002Assignee: International Business Machines CorporationInventors: Mitsuru Uda, Tsuyoshi Yamaguchi, Masami Shinohara
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Publication number: 20020113959Abstract: A method and apparatus for inspecting a resist pattern formed on an anti-reflection coating to detect defects by applying light to the resist pattern and visually observing light diffracted from the resist pattern. Light is applied to the resist pattern from a light source at an incident angle of 45 degrees or less with respect to the top surface of the resist pattern. An inspector positioned on the same side as the light source determines the presence or absence of a defective portion of the resist pattern by visually observing light diffracted to the same side as the light source. The defective portion of the resist can be visually distinguished from the non-defective portion by the brightness and color of the light diffracted to the same side as the light source.Type: ApplicationFiled: November 9, 2001Publication date: August 22, 2002Applicant: International Business Machines CorporationInventors: Mitsuru Uda, Kazunari Terakawa, Akira Suzuki
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Publication number: 20010030725Abstract: An active matrix reflective liquid crystal device includes an array substrate which includes switching elements corresponding to pixels and an array of pixel electrodes connected to the switching elements; and an opposing substrate which has a transparent electrode opposite the array of pixel electrodes with a liquid crystal layer inserted therebetween. Each of the pixel electrodes includes an array of electrode studs, (e.g., divided electrode elements). The regions between the electrodes are filled with an insulating material, and the surface of the stud array is planarized by chemical-mechanical polishing (CMP). A dielectric light reflective film is formed on the planarized surface of the stud array, and a liquid crystal molecule alignment film is deposited thereon.Type: ApplicationFiled: April 4, 2001Publication date: October 18, 2001Applicant: International Business Machines CorporationInventors: Masami Shinohara, Mitsuru Uda
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Patent number: 6292246Abstract: An active matrix reflective liquid crystal device includes an array substrate which includes switching elements corresponding to pixels and an array of pixel electrodes connected to the switching elements; and an opposing substrate which has a transparent electrode opposite the array of pixel electrodes with a liquid crystal layer inserted therebetween. Each of the pixel electrodes includes an array of electrode studs, (e.g., divided electrode elements). The regions between the electrodes are filled with an insulating material, and the surface of the stud array is planarized by chemical-mechanical polishing (CMP). A dielectric light reflective film is formed on the planarized surface of the stud array, and a liquid crystal molecule alignment film is deposited thereon.Type: GrantFiled: February 24, 1999Date of Patent: September 18, 2001Assignee: International Business Machines CorporationInventors: Masami Shinohara, Mitsuru Uda
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Publication number: 20010015800Abstract: The invention provides methods and apparatus for substrate inspection and other lighting applications. It includes an lighting apparatus 10 which comprises: an illuminator 12 including a light source for emitting lights 14; supporting means for supporting an object (e.g. a patterned substrate) 18 having a finely patterned surface 16 on which predetermined patterns are formed, which is illuminated at a predetermined angle with the lights 14 from the illuminator 12; and determining means 24 for determining whether or not predetermined patterns on the surface of the object (substrate) 16 are deformed using lights 22 diffracted by the finely patterned surface 16, wherein the illuminator 12 applies two kinds of lights 14 each having a narrow wavelength range with a peak wavelength at a respective one of two complementary colors.Type: ApplicationFiled: December 11, 2000Publication date: August 23, 2001Inventors: Mitsuru Uda, Tsuyoshi Iguchi, Tetsuya Nogami
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Patent number: 6040888Abstract: A liquid crystal display device having pillar-shaped spacers formed in pixel array regions is provided with improved display quality by preventing the degradation of contrast and the occurrence of residual images. A plurality of pillar-shape spacers formed in their pixel array regions are provided at locations which do not overlap with each other when images are projected on the screen using three different liquid crystal light valves to project the red (R), green (G) and blue (B), constituents of images.Type: GrantFiled: November 14, 1997Date of Patent: March 21, 2000Assignee: International Business Machines CorporationInventors: Shinohara Masami, Mitsuru Uda, Kunio Enami
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Patent number: 5739890Abstract: This invention relates to a reflection liquid crystal display device using a reflection liquid crystal light bulb and a method for fabricating such liquid crystal display devices, and an object thereof is to provide a liquid crystal display device and its manufacture wherein the numerical aperture of the subpixel is increased to improve the display brightness.Type: GrantFiled: February 6, 1996Date of Patent: April 14, 1998Assignee: International Business Machines CorporationInventors: Mitsuru Uda, Masami Shinohara, Mamoru Nishida