Patents by Inventor Mitsuru Ueda

Mitsuru Ueda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6830869
    Abstract: A pattern formation material of this invention contains a base polymer including a first unit represented by Chemical Formula 1 and a second unit represented by Chemical Formula 2 and, and an acid generator: wherein R1 and R3 are the same or different and are a hydrogen atom, a chlorine atom, a fluorine atom, an alkyl group or an alkyl group including a fluorine atom; R2 is an atom or a group that is not released by an acid and is selected from the group consisting of a hydrogen atom, an alkyl group, a cyclic aliphatic group, an aromatic group, a heterocycle, an ester group and an ether group; R4 is a protecting group released by an acid; m is an integer of 0 through 5; and a and b satisfy 0<a<1, 0<b<1 and 0<a+b≦1.
    Type: Grant
    Filed: April 29, 2003
    Date of Patent: December 14, 2004
    Assignee: Atsushita Electric Industrial Co., Ltd.
    Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Tsuyohiko Fujigaya
  • Patent number: 6806029
    Abstract: A pattern formation material of this invention contains a base polymer including a first unit represented by Chemical Formula 1 and a second unit represented by Chemical Formula 2, and an acid generator: wherein R1 and R2 are the same or different and selected from the group consisting of a hydrogen atom, a chlorine atom, a fluorine atom, an alkyl group and an alkyl group including a fluorine atom; R3 is a protecting group released by an acid; m is an integer of 0 through 5; and a and b satisfy 0<a<1,0<b<1 and 0<a+b≦1.
    Type: Grant
    Filed: September 6, 2002
    Date of Patent: October 19, 2004
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Tsuyohiko Fujigaya
  • Patent number: 6780561
    Abstract: Provided is a polybenzoxazole precursor having a high purity which does not contain ionic by-products. The above polybenzoxazole precursor comprises a repetitive unit represented by Formula (1): wherein A1 represents a tetravalent aromatic group; N and OH which are bonded to A1 are paired, and the respective pairs of N and OH are bonded to carbons which are adjacent to each other on the same aromatic ring; A2 represents a divalent organic group; and n represents a number of 2 to 300.
    Type: Grant
    Filed: November 26, 2002
    Date of Patent: August 24, 2004
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Mitsuru Ueda, Kazuya Ebara, Kenji Miyagawa, Kazuo Yamanaka, Yoichi Yonehara
  • Publication number: 20040043321
    Abstract: A pattern formation material of this invention contains a base polymer including a first unit represented by Chemical Formula 1 and a second unit represented by Chemical Formula 2 and, and an acid generator: 1
    Type: Application
    Filed: April 29, 2003
    Publication date: March 4, 2004
    Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Tsuyohiko Fujigaya
  • Publication number: 20040029035
    Abstract: A pattern formation material of this invention contains a base polymer including a unit represented by Chemical Formula 1 and, and an acid generator: 1
    Type: Application
    Filed: April 28, 2003
    Publication date: February 12, 2004
    Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Tsuyohiko Fujigaya
  • Patent number: 6632582
    Abstract: A pattern formation material contains a base polymer including a siloxane compound represented by Chemical Formula 1: wherein R1 are the same or different compounds selected from the group consisting of an alkyl compound, an ester compound, an ether compound, a sulfone compound, a sulfonyl compound and an aromatic compound.
    Type: Grant
    Filed: April 19, 2001
    Date of Patent: October 14, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Shinji Kishimura, Masaru Sasago, Mitsuru Ueda
  • Publication number: 20030143480
    Abstract: Provided is a polybenzoxazole precursor having a high purity which does not contain ionic by-products.
    Type: Application
    Filed: November 26, 2002
    Publication date: July 31, 2003
    Inventors: Mitsuru Ueda, Kazuya Ebara, Kenji Miyagawa, Kazuo Yamanaka, Yoichi Yonehara
  • Publication number: 20030091930
    Abstract: A pattern formation material of this invention contains a base polymer including a unit represented by Chemical Formula 1 and an acid generator: 1
    Type: Application
    Filed: September 12, 2002
    Publication date: May 15, 2003
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Tsuyohiko Fujigaya
  • Publication number: 20030087184
    Abstract: A pattern formation material of this invention contains a base polymer including a first unit represented by Chemical Formula 1 and a second unit represented by Chemical Formula 2, and an acid generator: 1
    Type: Application
    Filed: September 6, 2002
    Publication date: May 8, 2003
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Tsuyohiko Fujigaya
  • Patent number: 6350850
    Abstract: The present invention is a process for producing a polyester from a dicarboxylic acid and a diol, which comprises polycondensing the dicarboxylic acid and the diol under the presence of a distannoxane catalyst. Also, the present invention is a process for producing a polyester which comprises melt polycondensing the dicarboxylic acid and the diol under normal pressure in the presence of the distannoxane catalyst, wherein an organic solvent which dose not dissolved any of the dicarboxylic acid, the diol and the polyester produced from the dicarboxylic acid the diol is present and, whereby, two phases are mainly present.
    Type: Grant
    Filed: July 12, 2000
    Date of Patent: February 26, 2002
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Mitsuru Ueda, Hiroyuki Takahashi, Teruaki Hayakawa, Tadashi Teranishi
  • Publication number: 20020013059
    Abstract: A pattern formation material contains a base polymer including a siloxane compound represented by Chemical Formula 1:
    Type: Application
    Filed: April 19, 2001
    Publication date: January 31, 2002
    Inventors: Shinji Kishimura, Masaru Sasago, Mitsuru Ueda
  • Patent number: 6093517
    Abstract: A lithographic photoresist composition is provided containing novel calixarene compounds, particularly calix[4]resorcinarenes that are partially or wholly protected with acid-labile functionalities, as dissolution inhibitors. Also provided is a process for using the composition to generate resist images on a substrate is provided, i.e., in the manufacture of integrated circuits or the like.
    Type: Grant
    Filed: July 31, 1998
    Date of Patent: July 25, 2000
    Assignee: International Business Machines Corporation
    Inventors: Hiroshi Ito, Tomonari Nakayama, Mitsuru Ueda
  • Patent number: 5168112
    Abstract: A polycarbonate is produced by melt-polycondensing a dihydric hydroxy compound and a bisarylcarbonate in the presence of 4-(4-methyl-1-piperidinyl)-pyridine, or a salt thereof, as a catalyst. The process of the invention eliminates the use of poisonous phosgene, prevents chloride ions from being incorporated into the product polycarbonate and remains in the reaction system longer to enable the preparation of high-molecular weight polycarbonates.
    Type: Grant
    Filed: January 8, 1991
    Date of Patent: December 1, 1992
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Mitsuru Ueda, Tatsuya Kanno, Yoshihiro Iguchi, Yasuhiro Oshino
  • Patent number: 5025083
    Abstract: A polycarbonate is produced by melt-polycondensing (A) a dihydric phenol with a co-monomer selected from the group consisting of (B) bisphenol carbonate, (C) bis(2,4,6-trichlorophenyl) carbonate (D) bis(2,4,-dichlorophenyl) carbonate and (E) bis(2-cyanophenyl) carbonate in the presence of a catalyst selected from among electron-donating amine compounds and salts thereof. The process of the invention saves the use of phosgene which is poisonous and prevents the resulting polycarbonate from incorporation thereinto of chlorine ions.
    Type: Grant
    Filed: February 2, 1990
    Date of Patent: June 18, 1991
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Mitsuru Ueda, Tatsuya Kanno, Yoshihiro Iguchi, Yasuhiro Oshino
  • Patent number: 4347500
    Abstract: In an electric alarm device, a disk-shape housing has an opening on one surface and a substantially flat bottom surface on the other surface. A diaphragm is fixed to the periphery of the housing to close the opening of the housing. An armature is mounted within the housing and coupled to the diaphragm to move with the diaphragm. A solenoid coil unit is fixed to the housing within the housing to generate magnetic fluxes for attracting the armature. A switch is mounted within the housing to detect the movement of the diaphragm to conduct and break the current to the solenoid coil unit.
    Type: Grant
    Filed: August 25, 1980
    Date of Patent: August 31, 1982
    Assignee: Nippondenso Co., Ltd.
    Inventor: Mitsuru Ueda
  • Patent number: 4149131
    Abstract: An electromagnetic relay installed in an automobile. In this electromagnetic relay, a casing to house an electromagnetic coil therein is used as part of a magnetic circuit for reducing the size and weight of the electromagnetic relay. By doing this, there may be provided an electromagnetic relay whose construction is well adapted for use in automatic mechanical assembly of the relay.
    Type: Grant
    Filed: December 23, 1976
    Date of Patent: April 10, 1979
    Assignee: Nippondenso Co., Ltd.
    Inventors: Siyoutaro Kawamura, Mitsuru Ueda, Makoto Imaeda