Patents by Inventor Mitsutaka Hasegawa

Mitsutaka Hasegawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8029877
    Abstract: There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (h) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.
    Type: Grant
    Filed: June 8, 2010
    Date of Patent: October 4, 2011
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Shinji Hayashi, Shunsuke Sega, Hiromu Taguchi, Mitsutaka Hasegawa
  • Publication number: 20100238388
    Abstract: There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (h) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.
    Type: Application
    Filed: June 8, 2010
    Publication date: September 23, 2010
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Shinji HAYASHI, Shunsuke SEGA, Hiromu TAGUCHI, Mitsutaka HASEGAWA
  • Patent number: 7758930
    Abstract: There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (h) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.
    Type: Grant
    Filed: April 20, 2009
    Date of Patent: July 20, 2010
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Shinji Hayashi, Shunsuke Sega, Hiromu Taguchi, Mitsutaka Hasegawa
  • Publication number: 20090202749
    Abstract: There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (h) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.
    Type: Application
    Filed: April 20, 2009
    Publication date: August 13, 2009
    Inventors: Shinji HAYASHI, Shunsuke SEGA, Hiromu TAGUCHI, Mitsutaka HASEGAWA
  • Patent number: 7537810
    Abstract: There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (b) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.
    Type: Grant
    Filed: March 24, 2004
    Date of Patent: May 26, 2009
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Shinji Hayashi, Shunsuke Sega, Hiromu Taguchi, Mitsutaka Hasegawa
  • Patent number: 7399574
    Abstract: Provided are a curable resin and a curable resin composition which have alkali-solubility and curability that can freely be adjusted and a high sensitivity, a liquid crystal panel substrate which can maintain an even cell gap, and a liquid crystal panel using the liquid crystal panel substrate to exhibit a superior display quality. A curable resin composition comprising an imide-containing copolymer having a molecular structure wherein a constitutional unit at least the following units are connected: a constitutional unit having a cyclic imide group represented by the formula (1), a constitutional unit having an acid functional group such as a carboxyl group; and a constitutional unit having a photopolymerizing functional group. In a liquid crystal panel substrate (color filter 103), plural spacers (column-shaped spacers 12) are disposed in a non-display region on a substrate 5.
    Type: Grant
    Filed: September 26, 2002
    Date of Patent: July 15, 2008
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Shinji Hayashi, Shunsuke Sega, Hiromu Taguchi, Mitsutaka Hasegawa, Eiichi Okazaki, Keiji Maeda
  • Publication number: 20060229376
    Abstract: There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymnerization initiator (b) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.
    Type: Application
    Filed: March 24, 2004
    Publication date: October 12, 2006
    Inventors: Shinji Hayashi, Shunsuke Sega, Hiromu Taguchi, Mitsutaka Hasegawa
  • Patent number: 6706818
    Abstract: This invention provides a curable resin composition for one-pack type water-based paint which is readily cured regardless of coating environment, said resin composition comprising copolymer (I) which is produced by the copolymerization of unsaturated group-containing urethane prepolymer (A) which is obtained from a reaction of diisocyanate compound (a), glycol compound (b), carboxyl group-containing glycol compound (c) and hydroxyl group-containing ethylenically unsaturated monomer (d), with maleimide group-containing ethylenically unsaturated monomer (e), carbonyl group-containing ethylenically unsaturated monomer (f) and another ethylenically unsaturated monomer (g), and compound (II) which has, per molecule, two or more same or different functional groups selected from hydrazide group, semicarbazide group and hydrazone group
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: March 16, 2004
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Yushichi Ishihara, Masami Sugishima, Nobushige Numa, Mitsutaka Hasegawa, Hiroshi Inukai
  • Publication number: 20030139496
    Abstract: This invention provides a curable resin composition for one-pack type water-based paint which is readily cured regardless of coating environment, said resin composition characteristically comprising both copolymer (I) which is produced from the emulsion polymerization of 1 to 30 % by weight of maleimide group-containing ethylenically unsaturated monomer (a), 1 to 30 % by weight of carbonyl group-containing ethylenically unsaturated monomer (b), 0.01 to 2 % by weight of compound (c) having two or more polymerizable unsaturated group per molecule and 38 to 97.99 % by weight of another ethylenically unsaturated monomer (d), and compound (II) which has, per molecule, two or more same or different functional groups selected from hydrazide group, semicarbazide group and hydrazone group.
    Type: Application
    Filed: May 30, 2002
    Publication date: July 24, 2003
    Inventors: Masami Sugishima, Nobushige Numa, Keiichiro Saikawa, Mitsutaka Hasegawa, Hiroshi Inukai
  • Publication number: 20030125471
    Abstract: This invention provides a curable resin composition for one-pack type water-based paint which is readily cured regardless of coating environment, said resin composition comprising copolymer (I) which is produced by the copolymerization of unsaturated group-containing urethane prepolymer (A) which is obtained from a reaction of diisocyanate compound (a), glycol compound (b), carboxyl group-containing glycol compound (c) and hydroxyl group-containing ethylenically unsaturated monomer (d), with maleimide group-containing ethylenically unsaturated monomer (e), carbonyl group-containing ethylenically unsaturated monomer (f) and another ethylenically unsaturated monomer (g), and compound (II) which has, per molecule, two or more same or different functional groups selected from hydrazide group, semicarbazide group and hydrazone group
    Type: Application
    Filed: May 30, 2002
    Publication date: July 3, 2003
    Inventors: Yushichi Ishihara, Masami Sugishima, Nobushige Numa, Mitsutaka Hasegawa, Hiroshi Inukai
  • Patent number: 6559231
    Abstract: The present invention relates to a curing type water base resin composition comprising: (I) a copolymer obtained by copolymerizing an ethylenically unsaturated monomer (a) having a maleimide group, an ethylenically unsaturated monomer (b) having a carbonyl group and other ethylenically unsaturated monomer (c) and (II) a compound having two or more groups per molecule which are the same or different and selected from a hydrazide group, a semicarbazide group and hydrazone group and further comprising, if necessary, as an additional component: (III) a copolymer having a carbonyl group and/or (IV) a water base polyurethane resin having a carbonyl group or a hydrazine group.
    Type: Grant
    Filed: November 30, 2001
    Date of Patent: May 6, 2003
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Mitsutaka Hasegawa, Hiroshi Inukai, Eiichi Okazaki, Nobushige Numa, Masami Sugishima, Koki Nakamura, Keiichiro Saikawa, Yushichi Ishihara
  • Publication number: 20030065068
    Abstract: The present invention provides a curable resin composition for a water base coating material comprising:
    Type: Application
    Filed: May 30, 2002
    Publication date: April 3, 2003
    Inventors: Hiroshi Inukai, Mitsutaka Hasegawa, Nobushige Numa, Masami Sugishima, Koki Nakamura
  • Publication number: 20020128379
    Abstract: The present invention relates to a curing type water base resin composition comprising:
    Type: Application
    Filed: November 30, 2001
    Publication date: September 12, 2002
    Inventors: Mitsutaka Hasegawa, Hiroshi Inukai, Eiichi Okazaki, Nobushige Numa, Masami Sugishima, Koki Nakamura, Keiichiro Saikawa, Yushichi Ishihara
  • Patent number: 5556999
    Abstract: Alkoxysilane composition, which is inhibited from disproportionation reaction that may cause production of monosilanes or reduction in purity of products, contains an alkoxysilane represented by the formula [I] and substantially free from alcohols:H.sub.m R.sub.n Si(OR').sub.4-m-n [I]wherein m is an integer of 1-3, n is an integer of 0-2, m+n.ltoreq.3, R is a C.sub.1 -C.sub.8 alkyl group, and R' is a C.sub.1 -C.sub.4 alkyl group, with a proviso that when there are two or more R or R', R and R' may be the same or different respectively, and at least one compound selected from the group consisting of organic sulfonic acids, sulfuric acid, SO.sub.2, carboxylic acids, carboxylic anhydrides and CO.sub.2.
    Type: Grant
    Filed: November 13, 1995
    Date of Patent: September 17, 1996
    Assignee: Toagosei Co., Ltd.
    Inventors: Yoshinori Yamada, Mitsutaka Hasegawa, Katsuyoshi Harada