Patents by Inventor Mitsutaka Ohori
Mitsutaka Ohori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11543716Abstract: An electro-optical device includes a scanning line extending along a first direction and having a light shielding property, a transistor having a semiconductor layer extending along the first direction so as to overlap with the scanning line, a contact hole electrically coupled to the scanning line at a side of a channel region of the semiconductor layer, and an opening provided at a side of a first LDD region and a second LDD region of the semiconductor layer.Type: GrantFiled: June 24, 2021Date of Patent: January 3, 2023Assignee: SEIKO EPSON CORPORATIONInventor: Mitsutaka Ohori
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Publication number: 20210405474Abstract: An electro-optical device includes a scanning line extending along a first direction and having a light shielding property, a transistor having a semiconductor layer extending along the first direction so as to overlap with the scanning line, a contact hole electrically coupled to the scanning line at a side of a channel region of the semiconductor layer, and an opening provided at a side of a first LDD region and a second LDD region of the semiconductor layer.Type: ApplicationFiled: June 24, 2021Publication date: December 30, 2021Applicant: SEIKO EPSON CORPORATIONInventor: Mitsutaka Ohori
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Patent number: 10914996Abstract: A liquid crystal apparatus as an electro-optical device includes a base material as a substrate, a TFT as a transistor, a second scanning line having a light shielding property in a layer between a semiconductor layer of the TFT and the base material, and a light shielding layer disposed between the second scanning line and an adjacent second scanning line adjacent to the second scanning line so as to overlap each of an end portion of the one second scanning line and an end portion of the adjacent second scanning line, in plan view from a normal line direction on one surface of the substrate.Type: GrantFiled: October 7, 2019Date of Patent: February 9, 2021Assignee: SEIKO EPSON CORPORATIONInventors: Hidenori Kawata, Mitsutaka Ohori
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Patent number: 10866445Abstract: A liquid crystal device includes a first substrate in which a pixel electrode having reflectivity, an insulating film, and an orientation film including an oblique angle vapor deposition film are laminated in this order, and a second substrate in which a common electrode having light transmissivity and an orientation film are laminated in this order. A center wavelength ? (nm) of light source light incident from the second substrate side, a refractive index n of the insulating film, a penetration depth ? (nm) of the light source light into the pixel electrode, and a film thickness d (nm) from the pixel electrode to the center in a thickness of the orientation film satisfy the following conditional expression where m is a positive integer.Type: GrantFiled: November 13, 2018Date of Patent: December 15, 2020Assignee: SEIKO EPSON CORPORATIONInventors: Naoki Tomikawa, Kazu Kobayashi, Mitsutaka Ohori
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Patent number: 10663818Abstract: A liquid crystal panel of a liquid crystal device as an electro-optic device includes a recessed portion provided in a pixel in a base substrate, a scanning line as a first light-shielding layer and a data line as a second light-shielding layer provided on the base substrate, the scanning line and the data line being disposed sequentially from a base substrate side in a thickness direction of the base substrate with a space between the scanning line and the data line, in a thickness direction of the base substrate, a transistor provided between the scanning line and the data line, a first insulation layer covering the data line, and disposed along the recessed portion, and a second insulation layer being in contact with the first insulation layer, and having a refractive index n2 that is higher than a refractive index n1 of the first insulation layer.Type: GrantFiled: July 17, 2018Date of Patent: May 26, 2020Assignee: SEIKO EPSON CORPORATIONInventor: Mitsutaka Ohori
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Patent number: 10656455Abstract: An electro-optical device includes a pixel electrode, a light shielding member disposed along an edge of the pixel electrode in a planar view viewed in a thickness direction that is a direction perpendicular to the pixel electrode, a first insulator that is provided in a region overlapped with at least the light shielding member in the planar view, and having light transmission, and a second insulator that is provided to be in contact with the first insulator on an opening region that is an inside surrounded by the light shielding member in the planar view, and having the light transmission and a refractive index higher than that of the first insulator, in which the second insulator configures a waveguide which reflects incident light incident on the opening region at an interface between the second insulator and the first insulator, and propagates the incident light inside the second insulator.Type: GrantFiled: March 20, 2018Date of Patent: May 19, 2020Assignee: SEIKO EPSON CORPORATIONInventors: Yoshitake Tateno, Satoshi Ito, Daisuke Sawaki, Mitsutaka Ohori
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Publication number: 20200110319Abstract: A liquid crystal apparatus as an electro-optical device includes a base material as a substrate, a TFT as a transistor, a second scanning line having a light shielding property in a layer between a semiconductor layer of the TFT and the base material, and a light shielding layer disposed between the second scanning line and an adjacent second scanning line adjacent to the second scanning line so as to overlap each of an end portion of the one second scanning line and an end portion of the adjacent second scanning line, in plan view from a normal line direction on one surface of the substrate.Type: ApplicationFiled: October 7, 2019Publication date: April 9, 2020Applicant: SEIKO EPSON CORPORATIONInventors: Hidenori KAWATA, Mitsutaka OHORI
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Patent number: 10503005Abstract: In a wire grid polarization element, a second light transmissing substrate is disposed on first surface side of the first light transmissing substrate on which a metallic wire grid is formed, and on the first surface of the first substrate, a recessed portion is formed in a region overlapping a region where the wire grid is formed in plan view. For this reason, it is possible to secure a space in which the wire grid is disposed between the first substrate and the second substrate without using a spacer. In addition, at the time of sealing the space in which the wire grid is disposed, the first substrate and the second substrate are bonded to each other on the outer side of the recessed portion.Type: GrantFiled: March 6, 2018Date of Patent: December 10, 2019Assignee: SEIKO EPSON CORPORATIONInventors: Mitsutaka Ohori, Koichiro Akasaka, Yoshitomo Kumai
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Publication number: 20190146265Abstract: A liquid crystal device includes a first substrate in which a pixel electrode having reflectivity, an insulating film, and an orientation film including an oblique angle vapor deposition film are laminated in this order, and a second substrate in which a common electrode having light transmissivity and an orientation film are laminated in this order. A center wavelength ? (nm) of light source light incident from the second substrate side, a refractive index n of the insulating film, a penetration depth ? (nm) of the light source light into the pixel electrode, and a film thickness d (nm) from the pixel electrode to the center in a thickness of the orientation film satisfy the following conditional expression where m is a positive integer.Type: ApplicationFiled: November 13, 2018Publication date: May 16, 2019Applicant: SEIKO EPSON CORPORATIONInventors: Naoki TOMIKAWA, Kazu KOBAYASHI, Mitsutaka OHORI
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Publication number: 20190033672Abstract: A liquid crystal panel of a liquid crystal device as an electro-optic device includes a recessed portion provided in a pixel in a base substrate, a scanning line as a first light-shielding layer and a data line as a second light-shielding layer provided on the base substrate, the scanning line and the data line being disposed sequentially from a base substrate side in a thickness direction of the base substrate with a space between the scanning line and the data line, in a thickness direction of the base substrate, a transistor provided between the scanning line and the data line, a first insulation layer covering the data line, and disposed along the recessed portion, and a second insulation layer being in contact with the first insulation layer, and having a refractive index n2 that is higher than a refractive index n1 of the first insulation layer.Type: ApplicationFiled: July 17, 2018Publication date: January 31, 2019Applicant: SEIKO EPSON CORPORATIONInventor: Mitsutaka OHORI
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Publication number: 20180314086Abstract: An electro-optical device includes a pixel electrode, a light shielding member disposed along an edge of the pixel electrode in a planar view viewed in a thickness direction that is a direction perpendicular to the pixel electrode, a first insulator that is provided in a region overlapped with at least the light shielding member in the planar view, and having light transmission, and a second insulator that is provided to be in contact with the first insulator on an opening region that is an inside surrounded by the light shielding member in the planar view, and having the light transmission and a refractive index higher than that of the first insulator, in which the second insulator configures a waveguide which reflects incident light incident on the opening region at an interface between the second insulator and the first insulator, and propagates the incident light inside the second insulator.Type: ApplicationFiled: March 20, 2018Publication date: November 1, 2018Applicant: SEIKO EPSON CORPORATIONInventors: Yoshitake TATENO, Satoshi ITO, Daisuke SAWAKI, Mitsutaka OHORI
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Publication number: 20180267357Abstract: In a wire grid polarization element, a second light transmissing substrate is disposed on first surface side of the first light transmissing substrate on which a metallic wire grid is formed, and on the first surface of the first substrate, a recessed portion is formed in a region overlapping a region where the wire grid is formed in plan view. For this reason, it is possible to secure a space in which the wire grid is disposed between the first substrate and the second substrate without using a spacer. In addition, at the time of sealing the space in which the wire grid is disposed, the first substrate and the second substrate are bonded to each other on the outer side of the recessed portion.Type: ApplicationFiled: March 6, 2018Publication date: September 20, 2018Applicant: SEIKO EPSON CORPORATIONInventors: Mitsutaka OHORI, Koichiro AKASAKA, Yoshitomo KUMAI
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Publication number: 20180173064Abstract: An electro-optical device includes a thin film transistor provided for each pixel and a light shielding film that shields at least one end portion of the semiconductor layer of the thin film transistor. The light shielding film is a source electrode and a drain electrode which are in contact with an end portions of a first source and drain region and a second source and drain region of the semiconductor layer and a side surfaces thereof, and the electrodes are in contact with an intermediate layer in a lower layer of the semiconductor layer.Type: ApplicationFiled: December 4, 2017Publication date: June 21, 2018Applicant: SEIKO EPSON CORPORATIONInventor: Mitsutaka OHORI
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Patent number: 6335232Abstract: On a transparent substrate where a gate electrode is formed, an amorphous silicon film is deposited by plasma CVD with a gate insulating film interposed therebetween. The silicon film is heated in an nitrogen atmosphere at 430±20° C. for an hour or longer to discharge hydrogen remaining in the film when it is formed. The silicon film is then melted by laser irradiation to crystallize, to thereby form a polycrystalline silicon film serving as an active region. Thus, when amorphous silicon is crystallized to form a polycrystalline silicon film, it is made possible to prevent creation of a rough film surface and penetration of impurity ions in the atmosphere into the polycrystalline silicon.Type: GrantFiled: October 2, 1998Date of Patent: January 1, 2002Assignee: Sanyo Electric Co., Ltd.Inventors: Mitsutaka Ohori, Shiro Nakanishi