Abstract: A substrate processing apparatus configured to process a substrate includes a functional component constituting a part of the substrate processing apparatus; a nozzle, provided on a surface of the functional component, allowing a gas to pass therethrough; a nozzle flow path which is connected to the nozzle of the functional component and through which the gas flows; a flow rate sensor configured to measure a flow rate of the gas flowing through the nozzle flow path; and a controller configured to make a determination upon a state of a distance between an interfering object and the functional component based on a measurement result obtained by the flow rate sensor.

Abstract: There is provided a fluid apparatus that includes a fan configured to suction or discharge a gas; a motor configured to drive the fan; a battery configured to supply electric power to the motor; a current limiting device provided on an electrical conduction path from the battery to the motor; a first drive device configured to, when receiving a drive command from outside, flow a first drive current to the motor through the current limiting device, to thereby cause normal rotation of the motor; an operation switch to be operated by a user; and a second drive device configured to, while the operation switch is being operated by the user, flow a second drive current, which is larger than the first drive current, from the battery to the motor, to thereby cause high speed rotation of the motor,