Patents by Inventor Mitsutoshi Jikei

Mitsutoshi Jikei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11873389
    Abstract: A composition including a fluorine-containing polymer and a silicon-containing compound, wherein the phosphorus content in the composition is 20 ppm or less. Also disclosed is a molded article obtained from the composition, and a second composition containing a fluorine-containing polymer and a silicon-containing polymer, wherein a content of an amide solvent in the composition is less than 1000 ppm.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: January 16, 2024
    Assignees: Akita University, DAIKIN INDUSTRIES, LTD.
    Inventors: Kazuya Matsumoto, Mitsutoshi Jikei, Shushi Yamada, Tsuyoshi Noguchi, Fumihiro Kamiya, Yoshiho Yanagida
  • Publication number: 20220073722
    Abstract: A composition including a fluorine-containing polymer and a silicon-containing compound, wherein the phosphorus content in the composition is 20 ppm or less. Also disclosed is a molded article obtained from the composition, and a second composition containing a fluorine-containing polymer and a silicon-containing polymer, wherein a content of an amide solvent in the composition is less than 1000 ppm.
    Type: Application
    Filed: December 27, 2019
    Publication date: March 10, 2022
    Applicants: AKITA UNIVERSITY, DAIKIN INDUSTRIES, LTD.
    Inventors: Kazuya MATSUMOTO, Mitsutoshi JIKEI, Shushi YAMADA, Tsuyoshi NOGUCHI, Fumihiro KAMIYA, Yoshiho YANAGIDA
  • Publication number: 20220057331
    Abstract: A crystallinity measurement device includes a Raman spectroscopy unit configured to acquire a Raman spectrum of resin-containing material including crystalline thermoplastic resin; and an analysis unit configured to calculate crystallinity of the crystalline thermoplastic resin based on an intensity of a low-wavenumber spectrum that is a spectrum in a region of less than 600 cm?1, in the Raman spectrum.
    Type: Application
    Filed: September 20, 2019
    Publication date: February 24, 2022
    Inventors: Nobuyuki KAMIHARA, Naomoto ISHIKAWA, Kiyoka TAKAGI, Sota KAMO, Makoto YAMAGUCHI, Mitsutoshi JIKEI, Kazuya MATSUMOTO, Mikio MURAOKA
  • Patent number: 10815369
    Abstract: The invention provides a composition capable of providing a molded article that has excellent heat resistance and a small weight change against oxygen plasma exposure and fluorine plasma exposure during a semiconductor manufacturing step. The composition contains a fluorine-containing polymer and a hyperbranched polymer of a cage silsesquioxane with a specific structure.
    Type: Grant
    Filed: August 8, 2017
    Date of Patent: October 27, 2020
    Assignees: Akita University, DAIKIN INDUSTRIES, LTD.
    Inventors: Kazuya Matsumoto, Mitsutoshi Jikei, Sumito Yamakawa, Tadatake Sakurada, Fumihiro Kamiya, Tsuyoshi Noguchi
  • Patent number: 10377881
    Abstract: The invention provides a composition capable of providing a molded article that has excellent heat resistance and a small weight change against both fluorine plasma exposure and oxygen plasma exposure during a semiconductor manufacturing step. The composition contains a fluorine-containing polymer and a cage silsesquioxane having a specific structure.
    Type: Grant
    Filed: February 17, 2016
    Date of Patent: August 13, 2019
    Assignees: Akita University, DAIKIN INDUSTRIES, LTD.
    Inventors: Kazuya Matsumoto, Mitsutoshi Jikei, Kunio Nishi, Tsuyoshi Noguchi, Fumihiro Kamiya
  • Publication number: 20190169415
    Abstract: The invention provides a composition capable of providing a molded article that has excellent heat resistance and a small weight change against oxygen plasma exposure and fluorine plasma exposure during a semiconductor manufacturing step. The composition contains a fluorine-containing polymer and a hyperbranched polymer of a cage silsesquioxane with a specific structure.
    Type: Application
    Filed: August 8, 2017
    Publication date: June 6, 2019
    Applicants: AKITA UNIVERSITY, DAIKIN INDUSTRIES, LTD.
    Inventors: Kazuya MATSUMOTO, Mitsutoshi JIKEI, Sumito YAMAKAWA, Tadatake SAKURADA, Fumihiro KAMIYA, Tsuyoshi NOGUCHI
  • Publication number: 20180030246
    Abstract: The invention provides a composition capable of providing a molded article that has excellent heat resistance and a small weight change against both fluorine plasma exposure and oxygen plasma exposure during a semiconductor manufacturing step. The composition contains a fluorine-containing polymer and a cage silsesquioxane having a specific structure.
    Type: Application
    Filed: February 17, 2016
    Publication date: February 1, 2018
    Applicants: AKITA UNIVERSITY, DAIKIN INDUSTRIES, LTD.
    Inventors: Kazuya MATSUMOTO, Mitsutoshi JIKEI, Kunio NISHI, Tsuyoshi NOGUCHI, Fumihiro KAMIYA
  • Patent number: 8173046
    Abstract: A conductive polymer film is produced by drying out a solution of conductive polymer and a dopant thereof to obtain a dried film. A dried film obtained from the solution is treated, in a reaction vessel, with an organic solvent and pressurized carbon dioxide.
    Type: Grant
    Filed: June 2, 2008
    Date of Patent: May 8, 2012
    Assignees: Akita University
    Inventors: Mitsutoshi Jikei, Hajimu Yasuda, Hideo Yoshida
  • Publication number: 20100133477
    Abstract: A conductive polymer film is produced by drying out a solution of conductive polymer and a dopant thereof to obtain a dried film. A dried film obtained from the solution is treated, in a reaction vessel, with an organic solvent and pressurized carbon dioxide.
    Type: Application
    Filed: June 2, 2008
    Publication date: June 3, 2010
    Applicants: Hideo Yoshida, Akita University
    Inventors: Mitsutoshi Jikei, Hajimu Yasuda, Hideo Yoshida
  • Publication number: 20060228549
    Abstract: An object of the present invention is to provide a novel polymer coated metal oxide. A polymer coated metal oxide according to the present invention is characterized in that a polymer has a siloxane skeletal structure. A polymer coated metal oxide manufacturing method according to the present invention is a method of contacting a metal oxide with a solution of a polymer having a siloxane skeletal structure. As a result, a polymer can be bonded to the surface of a metal oxide. Herein, it is preferable that a polymer should have a branching structure. Also, it is preferable that the polymer having the branching structure should be a dendritic polymer. Further, it is preferable that a metal oxide should be glass, silica gel, titanium oxide, barium titanate, indium tin oxide (ITO), aluminum oxide, nickel oxide, iron oxide and the like.
    Type: Application
    Filed: February 18, 2004
    Publication date: October 12, 2006
    Inventors: Masaaki Kakimoto, Mitsutoshi Jikei, Eriko Suzuki
  • Patent number: 6288202
    Abstract: A process of forming a polycarbonate comprises providing a reaction mixture of at least one polycarbonate-forming monomer and carbon dioxide; and then reacting the polycarbonate-forming monomer and carbon dioxide in the reaction mixture to form the polycarbonate. In one embodiment, the polycarbonate is present in a condensate, and the process further comprises removing carbon dioxide from the reaction mixture; and then collecting the condensate from the reaction mixture. Moreover, uncrystallized polycarbonate may be treated with carbon dioxide to form crystalline polycarbonate. The crystalline polycarbonate is then rendered useful for solid state polymerization.
    Type: Grant
    Filed: April 11, 1997
    Date of Patent: September 11, 2001
    Assignee: The University of North Carolina at Chapel Hill
    Inventors: Joseph M. DeSimone, Ramone Givens, Mitsutoshi Jikei, Jeffrey D. Cohen
  • Patent number: 5290911
    Abstract: A process for preparing a polyarylene thioether, comprising oxidation coupling polymerizing with oxygen and a catalyst in the presence of an acid, at least one compound selected from the group consisting of thiophenols of the formula (II): ##STR1## wherein R.sup.9 to R.sup.12 are identical or different and each is hydrogen, alkyl having 1 to 10 carbon atoms, halogen or alkoxyl having 1 to 10 carbon atoms. Reaction conditions of the process are very mild, and the process is relatively simple and easy. In addition, the process is commercially advantageous in that very inexpensive reactants and catalysts can be used.
    Type: Grant
    Filed: August 7, 1992
    Date of Patent: March 1, 1994
    Assignees: Research Institute for Production Development, Idemitsu Petrochemmical Co., Ltd.
    Inventors: Eishun Tsuchida, Hiroyuki Nishide, Kimihisa Yamamoto, Mitsutoshi Jikei
  • Patent number: 5250657
    Abstract: Polyarylene thioether is easily prepared by oxidative polymerizing an aromatic compound of the formula: ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are independently a hydrogen atom, a halogen atom, a lower alkyl group or a lower alkoxy group, and Y is a hydrogen atom or a group of the formula: ##STR2## wherein R.sup.5, R.sup.6, R.sup.7 and R.sup.8 are independently a hydrogen atom, a halogen atom, a lower alkyl group or a lower alkoxy group and X is --O--, --S--, a methylene group or an ethylene group with a sulfidizing agent in the presence of an acid and an oxidizing agent, or in the presence of an acid, a catalyst for oxidative polymerization and oxygen, or in the presence of a Friedel-Crafts catalyst.
    Type: Grant
    Filed: January 29, 1991
    Date of Patent: October 5, 1993
    Assignee: Seisan Kaihatsu Kagaku Kenkyusho
    Inventors: Eishun Tsuchida, Hiroyuki Nishide, Kimihisa Yamamoto, Mitsutoshi Jikei, Junya Katoh
  • Patent number: 5153305
    Abstract: A process for preparing a polyarylene thioether, comprising oxidation polymerizing at least one compound selected from the group consisting of diaryl disulfides represented by the formula (I): ##STR1## wherein, S is a sulfur atom, R.sup.1 to R.sup.8 are identical or different and each is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a halogen atom or an alkoxyl group having 1 to 10 carbon atoms, with at least one catalyst selected from the group consisting of vanadyl acetylacetonato, vanadyltetraphenyl porphyrin, vanadium acetylacetonato, vanadyl porphyrin, vanadium porphyrin, oxymolybdenum acetylacetonato and oxytungsten acetylacetonato, in the presence of an acid. Reaction conditions of the process are very mild, and the process is relatively simple and easy. In addition, the process is commercially advantageous in that very inexpensive reactants and catalysts can be used.
    Type: Grant
    Filed: July 11, 1990
    Date of Patent: October 6, 1992
    Assignees: Research Institute For Production Development, Idemitsu Petrochemical Co., Ltd.
    Inventors: Eishun Tsuchida, Hiroyuki Nishide, Kimihisa Yamamoto, Mitsutoshi Jikei