Patents by Inventor Mitsutoshi Jikei
Mitsutoshi Jikei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11873389Abstract: A composition including a fluorine-containing polymer and a silicon-containing compound, wherein the phosphorus content in the composition is 20 ppm or less. Also disclosed is a molded article obtained from the composition, and a second composition containing a fluorine-containing polymer and a silicon-containing polymer, wherein a content of an amide solvent in the composition is less than 1000 ppm.Type: GrantFiled: December 27, 2019Date of Patent: January 16, 2024Assignees: Akita University, DAIKIN INDUSTRIES, LTD.Inventors: Kazuya Matsumoto, Mitsutoshi Jikei, Shushi Yamada, Tsuyoshi Noguchi, Fumihiro Kamiya, Yoshiho Yanagida
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Publication number: 20220073722Abstract: A composition including a fluorine-containing polymer and a silicon-containing compound, wherein the phosphorus content in the composition is 20 ppm or less. Also disclosed is a molded article obtained from the composition, and a second composition containing a fluorine-containing polymer and a silicon-containing polymer, wherein a content of an amide solvent in the composition is less than 1000 ppm.Type: ApplicationFiled: December 27, 2019Publication date: March 10, 2022Applicants: AKITA UNIVERSITY, DAIKIN INDUSTRIES, LTD.Inventors: Kazuya MATSUMOTO, Mitsutoshi JIKEI, Shushi YAMADA, Tsuyoshi NOGUCHI, Fumihiro KAMIYA, Yoshiho YANAGIDA
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Publication number: 20220057331Abstract: A crystallinity measurement device includes a Raman spectroscopy unit configured to acquire a Raman spectrum of resin-containing material including crystalline thermoplastic resin; and an analysis unit configured to calculate crystallinity of the crystalline thermoplastic resin based on an intensity of a low-wavenumber spectrum that is a spectrum in a region of less than 600 cm?1, in the Raman spectrum.Type: ApplicationFiled: September 20, 2019Publication date: February 24, 2022Inventors: Nobuyuki KAMIHARA, Naomoto ISHIKAWA, Kiyoka TAKAGI, Sota KAMO, Makoto YAMAGUCHI, Mitsutoshi JIKEI, Kazuya MATSUMOTO, Mikio MURAOKA
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Patent number: 10815369Abstract: The invention provides a composition capable of providing a molded article that has excellent heat resistance and a small weight change against oxygen plasma exposure and fluorine plasma exposure during a semiconductor manufacturing step. The composition contains a fluorine-containing polymer and a hyperbranched polymer of a cage silsesquioxane with a specific structure.Type: GrantFiled: August 8, 2017Date of Patent: October 27, 2020Assignees: Akita University, DAIKIN INDUSTRIES, LTD.Inventors: Kazuya Matsumoto, Mitsutoshi Jikei, Sumito Yamakawa, Tadatake Sakurada, Fumihiro Kamiya, Tsuyoshi Noguchi
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Patent number: 10377881Abstract: The invention provides a composition capable of providing a molded article that has excellent heat resistance and a small weight change against both fluorine plasma exposure and oxygen plasma exposure during a semiconductor manufacturing step. The composition contains a fluorine-containing polymer and a cage silsesquioxane having a specific structure.Type: GrantFiled: February 17, 2016Date of Patent: August 13, 2019Assignees: Akita University, DAIKIN INDUSTRIES, LTD.Inventors: Kazuya Matsumoto, Mitsutoshi Jikei, Kunio Nishi, Tsuyoshi Noguchi, Fumihiro Kamiya
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Publication number: 20190169415Abstract: The invention provides a composition capable of providing a molded article that has excellent heat resistance and a small weight change against oxygen plasma exposure and fluorine plasma exposure during a semiconductor manufacturing step. The composition contains a fluorine-containing polymer and a hyperbranched polymer of a cage silsesquioxane with a specific structure.Type: ApplicationFiled: August 8, 2017Publication date: June 6, 2019Applicants: AKITA UNIVERSITY, DAIKIN INDUSTRIES, LTD.Inventors: Kazuya MATSUMOTO, Mitsutoshi JIKEI, Sumito YAMAKAWA, Tadatake SAKURADA, Fumihiro KAMIYA, Tsuyoshi NOGUCHI
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Publication number: 20180030246Abstract: The invention provides a composition capable of providing a molded article that has excellent heat resistance and a small weight change against both fluorine plasma exposure and oxygen plasma exposure during a semiconductor manufacturing step. The composition contains a fluorine-containing polymer and a cage silsesquioxane having a specific structure.Type: ApplicationFiled: February 17, 2016Publication date: February 1, 2018Applicants: AKITA UNIVERSITY, DAIKIN INDUSTRIES, LTD.Inventors: Kazuya MATSUMOTO, Mitsutoshi JIKEI, Kunio NISHI, Tsuyoshi NOGUCHI, Fumihiro KAMIYA
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Patent number: 8173046Abstract: A conductive polymer film is produced by drying out a solution of conductive polymer and a dopant thereof to obtain a dried film. A dried film obtained from the solution is treated, in a reaction vessel, with an organic solvent and pressurized carbon dioxide.Type: GrantFiled: June 2, 2008Date of Patent: May 8, 2012Assignees: Akita UniversityInventors: Mitsutoshi Jikei, Hajimu Yasuda, Hideo Yoshida
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Publication number: 20100133477Abstract: A conductive polymer film is produced by drying out a solution of conductive polymer and a dopant thereof to obtain a dried film. A dried film obtained from the solution is treated, in a reaction vessel, with an organic solvent and pressurized carbon dioxide.Type: ApplicationFiled: June 2, 2008Publication date: June 3, 2010Applicants: Hideo Yoshida, Akita UniversityInventors: Mitsutoshi Jikei, Hajimu Yasuda, Hideo Yoshida
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Publication number: 20060228549Abstract: An object of the present invention is to provide a novel polymer coated metal oxide. A polymer coated metal oxide according to the present invention is characterized in that a polymer has a siloxane skeletal structure. A polymer coated metal oxide manufacturing method according to the present invention is a method of contacting a metal oxide with a solution of a polymer having a siloxane skeletal structure. As a result, a polymer can be bonded to the surface of a metal oxide. Herein, it is preferable that a polymer should have a branching structure. Also, it is preferable that the polymer having the branching structure should be a dendritic polymer. Further, it is preferable that a metal oxide should be glass, silica gel, titanium oxide, barium titanate, indium tin oxide (ITO), aluminum oxide, nickel oxide, iron oxide and the like.Type: ApplicationFiled: February 18, 2004Publication date: October 12, 2006Inventors: Masaaki Kakimoto, Mitsutoshi Jikei, Eriko Suzuki
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Patent number: 6288202Abstract: A process of forming a polycarbonate comprises providing a reaction mixture of at least one polycarbonate-forming monomer and carbon dioxide; and then reacting the polycarbonate-forming monomer and carbon dioxide in the reaction mixture to form the polycarbonate. In one embodiment, the polycarbonate is present in a condensate, and the process further comprises removing carbon dioxide from the reaction mixture; and then collecting the condensate from the reaction mixture. Moreover, uncrystallized polycarbonate may be treated with carbon dioxide to form crystalline polycarbonate. The crystalline polycarbonate is then rendered useful for solid state polymerization.Type: GrantFiled: April 11, 1997Date of Patent: September 11, 2001Assignee: The University of North Carolina at Chapel HillInventors: Joseph M. DeSimone, Ramone Givens, Mitsutoshi Jikei, Jeffrey D. Cohen
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Patent number: 5290911Abstract: A process for preparing a polyarylene thioether, comprising oxidation coupling polymerizing with oxygen and a catalyst in the presence of an acid, at least one compound selected from the group consisting of thiophenols of the formula (II): ##STR1## wherein R.sup.9 to R.sup.12 are identical or different and each is hydrogen, alkyl having 1 to 10 carbon atoms, halogen or alkoxyl having 1 to 10 carbon atoms. Reaction conditions of the process are very mild, and the process is relatively simple and easy. In addition, the process is commercially advantageous in that very inexpensive reactants and catalysts can be used.Type: GrantFiled: August 7, 1992Date of Patent: March 1, 1994Assignees: Research Institute for Production Development, Idemitsu Petrochemmical Co., Ltd.Inventors: Eishun Tsuchida, Hiroyuki Nishide, Kimihisa Yamamoto, Mitsutoshi Jikei
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Patent number: 5250657Abstract: Polyarylene thioether is easily prepared by oxidative polymerizing an aromatic compound of the formula: ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are independently a hydrogen atom, a halogen atom, a lower alkyl group or a lower alkoxy group, and Y is a hydrogen atom or a group of the formula: ##STR2## wherein R.sup.5, R.sup.6, R.sup.7 and R.sup.8 are independently a hydrogen atom, a halogen atom, a lower alkyl group or a lower alkoxy group and X is --O--, --S--, a methylene group or an ethylene group with a sulfidizing agent in the presence of an acid and an oxidizing agent, or in the presence of an acid, a catalyst for oxidative polymerization and oxygen, or in the presence of a Friedel-Crafts catalyst.Type: GrantFiled: January 29, 1991Date of Patent: October 5, 1993Assignee: Seisan Kaihatsu Kagaku KenkyushoInventors: Eishun Tsuchida, Hiroyuki Nishide, Kimihisa Yamamoto, Mitsutoshi Jikei, Junya Katoh
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Patent number: 5153305Abstract: A process for preparing a polyarylene thioether, comprising oxidation polymerizing at least one compound selected from the group consisting of diaryl disulfides represented by the formula (I): ##STR1## wherein, S is a sulfur atom, R.sup.1 to R.sup.8 are identical or different and each is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a halogen atom or an alkoxyl group having 1 to 10 carbon atoms, with at least one catalyst selected from the group consisting of vanadyl acetylacetonato, vanadyltetraphenyl porphyrin, vanadium acetylacetonato, vanadyl porphyrin, vanadium porphyrin, oxymolybdenum acetylacetonato and oxytungsten acetylacetonato, in the presence of an acid. Reaction conditions of the process are very mild, and the process is relatively simple and easy. In addition, the process is commercially advantageous in that very inexpensive reactants and catalysts can be used.Type: GrantFiled: July 11, 1990Date of Patent: October 6, 1992Assignees: Research Institute For Production Development, Idemitsu Petrochemical Co., Ltd.Inventors: Eishun Tsuchida, Hiroyuki Nishide, Kimihisa Yamamoto, Mitsutoshi Jikei