Patents by Inventor Mitsuyasu Iwanaga

Mitsuyasu Iwanaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7034288
    Abstract: A time-of-flight mass spectrometer capable of cutting out a major portion of carrier gas-derived ions ahead of the ion reservoir. The ion source is of the electron impact type and has source magnets for deflecting some of the produced ions away from the center axis of the ion reservoir. Electrostatic lenses for promoting the deflection of the ions caused by the source magnets and a differentially pumped slit for cutting off the deflected ions are mounted downstream of the ion source.
    Type: Grant
    Filed: June 25, 2004
    Date of Patent: April 25, 2006
    Assignee: JEOL Ltd.
    Inventors: Takaya Satoh, Yoshihiro Kammei, Tatsuji Kobayashi, Mitsuyasu Iwanaga
  • Publication number: 20050023458
    Abstract: A time-of-flight mass spectrometer capable of cutting out a major portion of carrier gas-derived ions ahead of the ion reservoir. The ion source is of the electron impact type and has source magnets for deflecting some of the produced ions away from the center axis of the ion reservoir. Electrostatic lenses for promoting the deflection of the ions caused by the source magnets and a differentially pumped slit for cutting off the deflected ions are mounted downstream of the ion source.
    Type: Application
    Filed: June 25, 2004
    Publication date: February 3, 2005
    Applicant: JEOL Ltd.
    Inventors: Takaya Satoh, Yoshihiro Kammei, Tatsuji Kobayashi, Mitsuyasu Iwanaga
  • Patent number: 5367163
    Abstract: An analytical instrument using a plasma is disclosed. The instrument includes two plasma torches, a first torch of which is used for vaporizing a sample and a second plasma torch is used for exciting the sample. When the analytical instrument is a mass spectrometer, the sample vaporized by the first plasma torch is introduced into the second plasma torch where the sample is ionized. The sample is then mass analyzed. If the sample is a small solid sample, it is momentarily vaporized by the plasma flame generated from the first plasma torch. If the sample is a large solid sample, it can be gradually vaporized from its surface. Therefore, the sample can be analyzed without requiring any pretreatment, e.g., dissolving the sample in an acid.
    Type: Grant
    Filed: December 14, 1993
    Date of Patent: November 22, 1994
    Assignee: Jeol Ltd.
    Inventors: Kiichiro Otsuka, Mitsuyasu Iwanaga