Abstract: A line narrowing module includes a prism including an entrance side surface that light enters, an exit side surface from which the light is emitted, and a bottom surface, and configured to wavelength-disperse the light having entered the entrance side surface and to emit the light from the exit side surface; a holder portion having a stationary surface on which the bottom surface of the prism is secured; a rotary mechanism portion including a rotary stage on which the holder portion is secured, the rotary stage being configured to rotate the prism around an axis perpendicular to a dispersion plane of the light emitted from the prism; a drive unit configured to rotate the rotary stage; and a grating configured to reflect the light emitted from the prism, centroids of the prism, the holder portion, and the rotary stage being located on the axis.

Abstract: A gas laser apparatus may include a chamber filled with a laser gas; a window provided in the chamber and through which a laser beam passes; an optical path tube connected to the chamber to surround a position of the window in the chamber; a heated gas supply port configured to supply a heated purge gas into a closed space including a space in the optical path tube; and an exhaust port configured to exhaust a gas in the closed space.

Abstract: A laser apparatus includes an output coupling mirror; a grating that constitutes an optical resonator together with the output coupling mirror; a laser chamber in an optical path of the optical resonator; at least one prism in an optical path between the laser chamber and the grating; a rotary stage including an actuator that rotates the prism to change an incident angle of a laser beam from the laser chamber on the grating; a wavelength measuring unit that measures a central wavelength of the laser beam from the laser chamber through the output coupling mirror; an angle sensor that detects a rotation angle of the prism; a first control unit that controls the actuator at a first operation frequency; and a second control unit that controls the actuator at a second operation frequency.

Abstract: A line narrowing module includes a prism including an entrance side surface that light enters, an exit side surface from which the light is emitted, and a bottom surface, and configured to wavelength-disperse the light having entered the entrance side surface and to emit the light from the exit side surface; a holder portion having a stationary surface on which the bottom surface of the prism is secured; a rotary mechanism portion including a rotary stage on which the holder portion is secured, the rotary stage being configured to rotate the prism around an axis perpendicular to a dispersion plane of the light emitted from the prism; a drive unit configured to rotate the rotary stage; and a grating configured to reflect the light emitted from the prism, centroids of the prism, the holder portion, and the rotary stage being located on the axis.

Abstract: A line narrowing module includes a prism that refracts laser light in a first plane, a grating that disperses the laser light in the first plane, first to fourth elements, and a rotation mechanism and narrows the linewidth of the laser light. The second element is supported between the first and fourth elements by the first element. The rotation mechanism rotates the second element relative to the first element around an axis intersecting the first plane. The prism is located between the second and fourth elements and so supported by the second element that the rotation mechanism rotates the prism and the second element. The third element has elasticity and is compressed and located between the prism and the fourth element. The fourth element receives reaction force from the compressed third element. The second element is mechanically independent of the fourth element in the rotational direction of the rotation mechanism.

Abstract: A line narrowing module includes a prism that refracts laser light in a first plane, a grating that disperses the laser light in the first plane, first to fourth elements, and a rotation mechanism and narrows the linewidth of the laser light. The second element is supported between the first and fourth elements by the first element. The rotation mechanism rotates the second element relative to the first element around an axis intersecting the first plane. The prism is located between the second and fourth elements and so supported by the second element that the rotation mechanism rotates the prism and the second element. The third element has elasticity and is compressed and located between the prism and the fourth element. The fourth element receives reaction force from the compressed third element. The second element is mechanically independent of the fourth element in the rotational direction of the rotation mechanism.

Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.

Abstract: A mirror device may include: an optical element configured to reflect part of a laser beam and transmit the other part of the laser beam therethrough; and a holder in surface contact with the optical element to hold the optical element. A flatness of a contact surface of the holder in contact with the optical element may be equal to or smaller than a flatness of the optical element.

Abstract: A narrow band laser apparatus may include: a laser chamber; a line narrow module configured to narrow a band width of a laser beam outputted from the laser chamber and return the laser beam to the laser chamber, the line narrow module including a grating; a housing accommodating the line narrow module; three mounts fixed to the housing; and a housing moving device configured to support the housing and the line narrow module by supporting each of the three mounts and move the line narrow module by moving the housing with respect to the laser chamber in a direction substantially perpendicular to a dispersion plane of the grating.

Abstract: A mirror device may include: an optical element configured to reflect part of a laser beam and transmit the other part of the laser beam therethrough; and a holder in surface contact with the optical element to hold the optical element. A flatness of a contact surface of the holder in contact with the optical element may be equal to or smaller than a flatness of the optical element.

Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.

Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.

Abstract: An apparatus for generating extreme ultraviolet light may include a reference member, a chamber fixed to the reference member, the chamber including at least one window, a laser beam introduction optical system configured to introduce an externally supplied laser beam into the chamber through the at least one window, and a positioning mechanism configured to position the laser beam introduction optical system to the reference member.

Abstract: An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.

Abstract: An apparatus for generating extreme ultraviolet light may include a reference member, a chamber fixed to the reference member, the chamber including at least one window, a laser beam introduction optical system configured to introduce an externally supplied laser beam into the chamber through the at least one window, and a positioning mechanism configured to position the laser beam introduction optical system to the reference member.

Abstract: An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.

Abstract: An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.

Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.

Abstract: An optical system used with a laser apparatus may include a focusing optical system, a beam splitter, and an optical sensor. The focusing optical system has one or more focus, for focusing a laser beam outputted from the laser apparatus. The beam splitter is disposed between the focusing optical system and the one or more focus of the focusing optical system. The optical sensor is disposed on a beam path of a laser beam split by the beam splitter.

Abstract: An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.