Patents by Inventor Miwa Watai

Miwa Watai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8735201
    Abstract: The challenge for the present invention is to provide a film-forming method and for forming a passivation film which can sufficiently inhibit the loss of carriers due to their recombination; and a method for manufacturing a solar cell element with the use of the method or the device. The film-forming device comprises a mounting portion 22 for mounting a film-forming object, a high frequency power source 25, and a shower plate 23 which is provided to face the film-forming object S mounted on the mounting portion 22, which introduces a film-forming gas, and to which the high frequency power source is connected and a high frequency voltage is applied. A low frequency power source 26 for applying a low frequency voltage is connected to the shower plate or the mounting portion mounting a substrate. The film-forming method is performed using the film-forming device, and the film-forming method is carried out in forming a passivation film.
    Type: Grant
    Filed: December 28, 2009
    Date of Patent: May 27, 2014
    Assignee: ULVAC, Inc.
    Inventors: Masashi Kubo, Makoto Kikuchi, Kazuya Saito, Miwa Watai, Miho Shimizu
  • Patent number: 8349645
    Abstract: A mask includes: a tabular first section which includes a side portion and an opening portion formed at a position corresponding to a film formation region of a substrate and on which the substrate is to be disposed so that the first section overlaps a face of the substrate on which a film is to be formed; and a second section which is provided along the side portion of the first section, and covers at least one of portions of a side face of the substrate, wherein second sections of two adjacent masks overlap each other and a superposed section is thereby formed when a plurality of masks are arrayed in a lateral direction thereof.
    Type: Grant
    Filed: October 21, 2009
    Date of Patent: January 8, 2013
    Assignee: Ulvac, Inc.
    Inventors: Miwa Watai, Kazuya Saito, Takashi Komatsu, Yusuke Mizuno, Atsushi Ota, Shunji Kuroiwa
  • Patent number: 8198115
    Abstract: A method for manufacturing a solar cell, includes: forming, on a silicon substrate whose conductivity type is p-type or n-type, a silicon layer including a dopant whose conductivity type is different from that of the silicon substrate; and diffusing the dopant included in the silicon layer into the silicon substrate by heat-treating the silicon layer.
    Type: Grant
    Filed: April 21, 2009
    Date of Patent: June 12, 2012
    Assignee: ULVAC, Inc.
    Inventors: Miwa Watai, Kazuya Saito, Takashi Komatsu, Atsushi Ota, Shunji Kuroiwa, Miho Shimizu
  • Publication number: 20110294256
    Abstract: The challenge for the present invention is to provide a film-forming method and for forming a passivation film which can sufficiently inhibit the loss of carriers due to their recombination; and a method for manufacturing a solar cell element with the use of the method or the device. The film-forming device comprises a mounting portion 22 for mounting a film-forming object, a high frequency power source 25, and a shower plate 23 which is provided to face the film-forming object S mounted on the mounting portion 22, which introduces a film-forming gas, and to which the high frequency power source is connected and a high frequency voltage is applied. A low frequency power source 26 for applying a low frequency voltage is connected to the shower plate or the mounting portion mounting a substrate. The film-forming method is performed using the film-forming device, and the film-forming method is carried out in forming a passivation film.
    Type: Application
    Filed: December 28, 2009
    Publication date: December 1, 2011
    Applicant: ULVAC, INC.
    Inventors: Masashi Kubo, Makoto Kikuchi, Kazuya Saito, Miwa Watai, Miho Shimizu
  • Publication number: 20110207261
    Abstract: A mask includes: a tabular first section which includes a side portion and an opening portion formed at a position corresponding to a film formation region of a substrate and on which the substrate is to be disposed so that the first section overlaps a face of the substrate on which a film is to be formed; and a second section which is provided along the side portion of the first section, and covers at least one of portions of a side face of the substrate, wherein second sections of two adjacent masks overlap each other and a superposed section is thereby formed when a plurality of masks are arrayed in a lateral direction thereof.
    Type: Application
    Filed: October 21, 2009
    Publication date: August 25, 2011
    Applicant: ULVAC, INC.
    Inventors: Miwa Watai, Kazuya Saito, Takashi Komatsu, Yusuke Mizuno, Atsushi Ota, Shunji Kuroiwa
  • Publication number: 20110162710
    Abstract: A solar cell includes: a photoelectric converter in which a first electrode layer, a photoelectric conversion layer, and a second electrode layer are stacked on a substrate in order; and a texture layer that is disposed between the substrate and the first electrode layer, made of a transparent material in a visible light region, and has a continuous irregular configuration on a face that is in touch with the first electrode layer.
    Type: Application
    Filed: September 10, 2009
    Publication date: July 7, 2011
    Applicant: ULVAC, INC.
    Inventors: Miwa Watai, Kazuya Saito, Takashi Komatsu, Shunji Kuroiwa, Yusuke Mizuno, Susumu Sakio, Kensuke Hiraoka
  • Publication number: 20110120553
    Abstract: A method for manufacturing a solar cell, includes a scribing step in which grooves electrically-separating a photoelectric converter into a plurality of compartment sections are formed after the photoelectric converter is formed on a substrate by stacking a first-electrode layer, a photoelectric conversion layer, and a second-electrode layer in this order; a first groove, a second groove, a third groove, and a fourth groove are formed in the scribing step; the method including an insulating-layer forming step in which an insulating layer is formed after the scribing step and a wiring layer forming step in which a wiring layer is formed; the wiring layer passes from the first-electrode layer that is exposed at a bottom face of the second groove, through the inside of the second groove and a surface of the insulating layer, to a surface of the second-electrode layer that is disposed so as to be lateral to the fourth groove opposite to the second groove; and the wiring layer electrically connects the plurality o
    Type: Application
    Filed: July 3, 2009
    Publication date: May 26, 2011
    Applicant: ULVAC, INC.
    Inventors: Miwa Watai, Kazuya Saito, Takashi Komatsu, Susumu Sakio, Masafumi Wakai, Shunji Kuroiwa
  • Publication number: 20110030780
    Abstract: A solar cell includes: a substrate having optical transparency; a photoelectric converter provided on the substrate, including a top-face electrode having optical transparency, a photoelectric conversion layer, and a back-face electrode having light reflectivity; and a low-refractive conductive layer whose refractive index is less than or equal to 2.0, the low-refractive conductive layer being made of a conductive material having optical transparency, being adjacent to the photoelectric conversion layer, and being disposed on a side of the photoelectric conversion layer opposite to the substrate.
    Type: Application
    Filed: April 24, 2009
    Publication date: February 10, 2011
    Applicant: ULVAC, INC.
    Inventors: Miwa Watai, Kazuya Saito, Takashi Komatsu, Yoshio Ide, Shin Asari, Yusuke Mizuno, Miho Shimizu
  • Publication number: 20110020976
    Abstract: A method for manufacturing a solar cell, includes: forming, on a silicon substrate whose conductivity type is p-type or n-type, a silicon layer including a dopant whose conductivity type is different from that of the silicon substrate; and diffusing the dopant included in the silicon layer into the silicon substrate by heat-treating the silicon layer.
    Type: Application
    Filed: April 21, 2009
    Publication date: January 27, 2011
    Applicant: ULVAC, INC.
    Inventors: Miwa Watai, Kazuya Saito, Takashi Komatsu, Atsushi Ota, Shunji Kuroiwa, Miho Shimizu