Abstract: A substrate processing method includes: supplying a processing solution onto the upper surface of the substrate; executing, under atmospheric pressure, plasma processing on a liquid film of the processing solution that is formed at least in part of the upper surface of the substrate, with a thickness of the liquid film being a first thickness; and executing, under atmospheric pressure, plasma processing on the liquid film of the processing solution that is formed at least in part of the upper surface of the substrate, with the thickness of the liquid film being a second thickness, in which the first thickness is smaller than the second thickness. Thus, resists on the upper surface of the substrate can be efficiently removed.

Abstract: A substrate processing method includes: supplying a processing solution onto the upper surface of the substrate; executing, under atmospheric pressure, plasma processing on a liquid film of the processing solution that is formed at least in part of the upper surface of the substrate, with a thickness of the liquid film being a first thickness; and executing, under atmospheric pressure, plasma processing on the liquid film of the processing solution that is formed at least in part of the upper surface of the substrate, with the thickness of the liquid film being a second thickness, in which the first thickness is smaller than the second thickness. Thus, resists on the upper surface of the substrate can be efficiently removed.

Abstract: A first movable body is provided movably in a separation direction and a first engaging member is provided for each suction unit. When the first movable body is moved in the separation direction, the plurality of first engaging members are respectively engaged with the first movable body in the same sequence as an array sequence of the suction units. Thereafter, the suction units are moved in the separation direction together with the first movable body.

Abstract: A transfer apparatus includes a plurality of holders respectively coming into contact with a carrier and a roller member. Each of the holders is sequentially separated from the carrier in accordance with a movement of the roller member, moves to a retracted position where the holder does not interfere with the roller member, comes into contact with the other surface of the carrier again after the passage of the roller member, and moves in the direction away from the carrier while sucking the carrier by the suction unit.

Abstract: A pattern forming apparatus comprises: a first holder which holds a blanket carrying a pattern forming material on one surface in a horizontal posture with a carrying surface for the pattern forming material faced up; a second holder which holds a plate for patterning the pattern forming material or a substrate, to which a pattern is transferred, as a processing object such that the processing object is proximate to and facing the carrying surface of the blanket held on the first holder; and a push-up unit which partially pushes up an effective area in a central part of the blanket from a lower surface side of the blanket to bring the effective area into contact with the processing object held on the second holder and moves along the lower surface of the blanket to change a push-up position of the blanket.

Abstract: In a detaching apparatus, a detachment starter bends one end part of a first plate-like body into a cylindrical or prismatic surface in a direction opposite to a second plate-like body, thereby forming a single and straight boundary line between an adhering region and a detached region. A separator increases a distance between a first holder holding the first plate-like body and a second holder holding the second plate-like body to separate the first and second plate-like bodies.