Patents by Inventor Miyuki AOYAMA

Miyuki AOYAMA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240266154
    Abstract: A plasma processing apparatus includes: a plasma processing chamber; a base support disposed within the plasma processing chamber; a base having a first through hole penetrating from an upper surface of the base to a lower surface of the base and disposed on the base support; an electrostatic chuck having a second through hole communicating with the first through hole by penetrating from a substrate support surface or a ring support surface to a lower surface of the electrostatic chuck and disposed on the base; a first insulating member disposed within the first through hole; a second insulating member disposed within the first through hole to surround at least a portion of the first insulating member; a first sealing member disposed between the first insulating member and the electrostatic chuck; and a second sealing member disposed between the first insulating member and an insulating support member.
    Type: Application
    Filed: April 19, 2024
    Publication date: August 8, 2024
    Applicant: Tokyo Electron Limited
    Inventors: Daiki HARIU, Shinya ISHIKAWA, Haruka ENDO, Miyuki AOYAMA