Patents by Inventor Miyuki Takenaka

Miyuki Takenaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9261493
    Abstract: This invention relates to a method of quantitative analysis of hexavalent chromium in a chromate coating on a substrate. In this method a substrate on which the chromate coating is formed is immersed into an aqueous solution containing lithium hydroxide to extract hexavalent chromium within an extraction solution. Quantitative analysis of extracted hexavalent chromium in the extraction solution is then performed.
    Type: Grant
    Filed: June 14, 2012
    Date of Patent: February 16, 2016
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Tetsuya Tachibe, Mitsuhiro Oki, Miyuki Takenaka
  • Patent number: 8628600
    Abstract: One embodiment of method for extracting hexavalent chromium includes preparing a liquid sample by adding a fatty acid to a polymer material, adding water or an aqueous alkali solution to this sample, and extracting hexavalent chromium contained in the sample in the water or the aqueous alkali solution.
    Type: Grant
    Filed: January 9, 2012
    Date of Patent: January 14, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Miho Muramatsu, Mitsuhiro Oki, Miyuki Takenaka
  • Publication number: 20120264225
    Abstract: A method for controlling a hazardous element in an encapsulating resin of a resin encapsulation semiconductor device includes subjecting the device to qualitative analysis with a fluorescent X-ray analyzer to judge whether the hazardous element is contained in the encapsulating resin, aligning a plurality of devices with each of upper and lower surfaces of the devices brought into a plane, setting the surfaces of the devices to cover a full X-ray irradiation plane and subjecting the devices to quantitative analysis with the fluorescent X-ray analyzer to obtain an analytical value of the hazardous element in the encapsulating resin for upper and lower surfaces of the devices, and judging whether the analytical value of the hazardous element which is less influenced by a coexistent element of the analytical values for the upper and lower surfaces of the devices exceeds a threshold value.
    Type: Application
    Filed: June 14, 2012
    Publication date: October 18, 2012
    Inventors: Mitsuhiro OKI, Miyuki TAKENAKA
  • Patent number: 8223917
    Abstract: A method for controlling a hazardous element in an encapsulating resin of a resin encapsulation semiconductor device includes subjecting the device to qualitative analysis with a fluorescent X-ray analyzer to judge whether the hazardous element is contained in the encapsulating resin, aligning a plurality of devices with each of upper and lower surfaces of the devices brought into a plane, setting the surfaces of the devices to cover a full X-ray irradiation plane and subjecting the devices to quantitative analysis with the fluorescent X-ray analyzer to obtain an analytical value of the hazardous element in the encapsulating resin for upper and lower surfaces of the devices, and judging whether the analytical value of the hazardous element which is less influenced by a coexistent element of the analytical values for the upper and lower surfaces of the devices exceeds a threshold value.
    Type: Grant
    Filed: October 8, 2009
    Date of Patent: July 17, 2012
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Mitsuhiro Oki, Miyuki Takenaka
  • Publication number: 20120137830
    Abstract: One embodiment of method for extracting hexavalent chromium includes preparing a liquid sample by adding a fatty acid to a polymer material, adding water or an aqueous alkali solution to this sample, and extracting hexavalent chromium contained in the sample in the water or the aqueous alkali solution.
    Type: Application
    Filed: January 9, 2012
    Publication date: June 7, 2012
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Miho Muramatsu, Mitsuhiro Oki, Miyuki Takenaka
  • Patent number: 8114672
    Abstract: According to one embodiment, there is provided a method of analyzing antimony contained in glass according to its valency. This method includes milling glass containing antimony into a glass powder, weighing the glass powder and dissolving the glass powder by using hydrofluoric acid and hydrochloric acid to obtain a glass solution, masking hydrofluoric acid by adding aluminum ions to the glass solution, adding sodium borohydride and hydrochloric acid to the glass solution in which hydrofluoric acid is masked to generate a hydride of antimony (III), determining a concentration of antimony (III) contained in the glass solution based on the hydride, determining a total concentration of antimony contained in the glass solution and calculating a difference between the concentration of antimony (III) and the total concentration of antimony to obtain a concentration of antimony (V) from the difference.
    Type: Grant
    Filed: September 23, 2010
    Date of Patent: February 14, 2012
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Sayaka Morimoto, Miyuki Takenaka, Mitsuhiro Oki
  • Publication number: 20110217782
    Abstract: According to one embodiment, there is provided a method of analyzing antimony contained in glass according to its valency. This method includes milling glass containing antimony into a glass powder, weighing the glass powder and dissolving the glass powder by using hydrofluoric acid and hydrochloric acid to obtain a glass solution, masking hydrofluoric acid by adding aluminum ions to the glass solution, adding sodium borohydride and hydrochloric acid to the glass solution in which hydrofluoric acid is masked to generate a hydride of antimony (III), determining a concentration of antimony (III) contained in the glass solution based on the hydride, determining a total concentration of antimony contained in the glass solution and calculating a difference between the concentration of antimony (III) and the total concentration of antimony to obtain a concentration of antimony (V) from the difference.
    Type: Application
    Filed: September 23, 2010
    Publication date: September 8, 2011
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Sayaka Morimoto, Miyuki Takenaka, Mitsuhiro Oki
  • Patent number: 7727767
    Abstract: Disclosed is a method for the quantitative analysis of a metal element contained in a resin material, which permits quantitatively analyzing the harmful substance such as lead contained in a resin material, comprising decomposing the resin material within a container having at least the inner surface formed of a glassy carbon in the presence of an aqueous solution of an oxidizing acid, heating the organic residue of the decomposed resin material so as to convert the residue into an ash, and quantitatively measuring the metal element contained in the organic residue converted into the ash.
    Type: Grant
    Filed: September 8, 2006
    Date of Patent: June 1, 2010
    Assignee: Kaushiki Kaisha Toshiba
    Inventor: Miyuki Takenaka
  • Publication number: 20100091944
    Abstract: A method for controlling a hazardous element in an encapsulating resin of a resin encapsulation semiconductor device includes subjecting the device to qualitative analysis with a fluorescent X-ray analyzer to judge whether the hazardous element is contained in the encapsulating resin, aligning a plurality of devices with each of upper and lower surfaces of the devices brought into a plane, setting the surfaces of the devices to cover a full X-ray irradiation plane and subjecting the devices to quantitative analysis with the fluorescent X-ray analyzer to obtain an analytical value of the hazardous element in the encapsulating resin for upper and lower surfaces of the devices, and judging whether the analytical value of the hazardous element which is less influenced by a coexistent element of the analytical values for the upper and lower surfaces of the devices exceeds a threshold value.
    Type: Application
    Filed: October 8, 2009
    Publication date: April 15, 2010
    Inventors: Mitsuhiro OKI, Miyuki TAKENAKA
  • Publication number: 20080250847
    Abstract: A detector for detecting a gaseous component in a gas is comprised of a sensor having a gas detecting region configured to output an electric signal in response to detection of the gaseous component and a contact portion configured to conduct the electric signal; an enclosure housing the sensor and having a through hole configured to introduce the gas to the gas detecting region; a wiring partly facing to the contact portion and being led out of the enclosure; an electric conductor interposed between the contact portion and the wiring; a packing member surrounding the through hole and so as to make a gap between the sensor and the enclosure impervious to the gas.
    Type: Application
    Filed: April 3, 2008
    Publication date: October 16, 2008
    Applicants: KABUSHIKI KAISHA TOSHIBA, TOSHIBA MATERIALS CO., LTD.
    Inventors: Tomoyuki KITANI, Miyuki Takenaka, Mitsuhiro Oki, Masami Okamura
  • Publication number: 20070048873
    Abstract: A method of quantitative analysis of hexavalent chromium in a chromate coating includes immersing a substrate on which a chromate coating is formed in an aqueous solution containing lithium hydroxide to extract hexavalent chromium, and performing quantitative analysis of extracted hexavalent chromium.
    Type: Application
    Filed: August 29, 2006
    Publication date: March 1, 2007
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Tetsuya Tachibe, Mitsuhiro Oki, Miyuki Takenaka
  • Publication number: 20070026526
    Abstract: Disclosed is a method for the quantitative analysis of a metal element contained in a resin material, which permits quantitatively analyzing the harmful substance such as lead contained in a resin material, comprising decomposing the resin material within a container having at least the inner surface formed of a glassy carbon in the presence of an aqueous solution of an oxidizing acid, heating the organic residue of the decomposed resin material so as to convert the residue into an ash, and quantitatively measuring the metal element contained in the organic residue converted into the ash.
    Type: Application
    Filed: September 8, 2006
    Publication date: February 1, 2007
    Inventor: Miyuki Takenaka
  • Publication number: 20050271556
    Abstract: An analytical vessel for analyzing trace elements, which is formed of glassy carbon produced through carbonization of a resin composition. A method of analyzing trace elements, which comprises the steps of introducing a solution which is capable of decomposing an assay sample into an analytical vessel containing the assay sample and made of glassy carbon produced through carbonization of a resin composition to thereby dissolve the assay sample, thus obtaining a sample solution; and measuring trace elements included in the assay sample and dissolved in the sample solution.
    Type: Application
    Filed: May 12, 2005
    Publication date: December 8, 2005
    Inventors: Miyuki Takenaka, Motonaka Yabuki
  • Patent number: 6077451
    Abstract: Disclosed is a method and an apparatus for etching a silicon material in order to prepare a sample for measuring the impurities which are contained in the silicon material. The silicon material is etched by contacting the silicon material with an etching gas containing a fluorine compound which is selected from the group consisting of xenon fluoride, hydrogen fluoride, oxygen fluoride and halogen fluoride, to produce a product by reaction of the silicon material with the etching gas. The product is heated to evaporate and remove the product from an impurity which is contained in the silicon material and not reactive to the etching gas.
    Type: Grant
    Filed: March 27, 1997
    Date of Patent: June 20, 2000
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Miyuki Takenaka, Yuji Yamada, Masaru Hayashi, Hideki Matsunaga, Akira Okada