Patents by Inventor Miyuki Tani

Miyuki Tani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5843290
    Abstract: A contactless electrolytic polishing apparatus for manufacturing a lead frame having a smooth polished surface includes a polishing tank containing polishing solution and divided by partitions into a first cathode-containing vessel, a first solution-discharge vessel, a first anode-containing vessel, a second solution-discharge vessel, a second anode-containing vessel, a third solution-discharge vessel and a second cathode-containing vessel. A direct current is applied with ripples having a frequency of 40 to 120 Hz alternately to the anode and cathode in the electrolytic polishing tank filled with an electrolytic polishing solution so that the time for which the blank positioned between both electrodes functions as the anode may be at least 3.3 times longer than that for which it functions as the cathode. The blank is then plated with a metal by employing a customary method.
    Type: Grant
    Filed: January 31, 1997
    Date of Patent: December 1, 1998
    Assignee: Sumitomo Metal Mining Co., Limited
    Inventors: Yoshimaro Tezuka, Katsuhisa Tokunaga, Mitsuyuki Kakimoto, Shigeki Ogawa, Miyuki Tani, Satoshi Kobayashi, Kiyotaka Sasaki, Motoyuki Tomizawa
  • Patent number: 5660708
    Abstract: It is an object of this invention to provide a process for manufacturing a lead frame by polishing a blank for a lead frame electrolytically and plating the electrolytically polished surface of the blank with a metal, which process enables the electrolytic polishing of the blank to be continued for a long time by employing a contactless electrolytic polishing apparatus, and can form an electrolytically polished surface which is sufficiently smooth to allow it to be plated with a very good metal coating.The contactless electrolytic polishing apparatus is employed for applying a direct current with ripples having a frequency of 40 to 120 Hz alternately to the anode and cathode in an electrolytic polishing tank filled with an electrolytic polishing solution, so that the time for which the blank positioned between both electrodes functions as the anode may be at least 3.3 times longer than that for which it functions as the cathode, and the blank is, then, plated with a metal by employing a customary method.
    Type: Grant
    Filed: November 21, 1995
    Date of Patent: August 26, 1997
    Assignee: Sumitomo Metal Mining Company, Limited
    Inventors: Yoshimaro Tezuka, Katsuhisa Tokunaga, Mitsuyuki Kakimoto, Shigeki Ogawa, Miyuki Tani, Satoshi Kobayashi, Kiyotaka Sasaki, Motoyuki Tomizawa