Patents by Inventor Mizuki KATAOKA

Mizuki KATAOKA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210311382
    Abstract: Provided is a reflective mask blank that can reduce the shadowing effect of a reflective mask and form a fine and high-precision absorbent body pattern.
    Type: Application
    Filed: August 8, 2019
    Publication date: October 7, 2021
    Applicant: HOYA CORPORATION
    Inventors: Mizuki KATAOKA, Yohei IKEBE
  • Publication number: 20190384157
    Abstract: Provided are a reflective mask blank and a reflective mask, which are able to reduce the shadowing effects of EUV lithography and form a fine pattern. As a result, a semiconductor device can be stably manufactured with high transfer accuracy. The reflective mask blank comprises a multilayer reflective film and an absorber film in that order on a substrate, and the absorber film comprises a material comprising an amorphous metal comprising at least one or more elements among cobalt (Co) and nickel (Ni).
    Type: Application
    Filed: March 1, 2018
    Publication date: December 19, 2019
    Applicant: HOYA CORPORATION
    Inventors: Yohei IKEBE, Junichi HORIKAWA, Takahiro ONOUE, Mizuki KATAOKA