Patents by Inventor MKS Instruments, Inc.

MKS Instruments, Inc. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140263199
    Abstract: A radio frequency (RF) power delivery system includes a first RF generator and a second RF generator. The first RF generator operates as a master RF generator, and the second RF generator operates as a slave RF generator. The slave RF generator includes a detector for sensing an electrical characteristic of the RF signal of the slave RF generator. The slave RF generator also includes a detector for sensing an electrical characteristic of the RF signal from the master RF generator. Operation of the slave RF generator is controlled by a host or controller. The host or controller operates the slave RF generator in accordance with electrical properties determined by the second detector.
    Type: Application
    Filed: March 15, 2013
    Publication date: September 18, 2014
    Inventor: MKS Instruments, Inc.
  • Publication number: 20140097908
    Abstract: A radio frequency generator includes a power control module, a frequency control module and a pulse generating module. The power control module is configured to generate a power signal indicating power levels for target states of a power amplifier. The frequency control module is configured to generate a frequency signal indicating frequencies for the target states of the power amplifier. The pulse generating module is configured to (i) supply an output signal to the power amplifier, (ii) recall at least one of a latest power level or a latest frequency for one of the target states of the power amplifier, and (iii) adjust a current power level and a current frequency of the output signal from a first state to a second state based on the power signal, the frequency signal, and at least one of the latest power level and the latest frequency of the power amplifier.
    Type: Application
    Filed: March 14, 2013
    Publication date: April 10, 2014
    Applicant: MKS INSTRUMENTS, INC.
    Inventor: MKS INSTRUMENTS, INC.
  • Publication number: 20130313728
    Abstract: Devices, systems, and methods employed in wet cleaning semiconductor devices are provided. In particular, systems that can deliver deionized water with the desired concentration of CO2 and methods of generating deionized water with a desired concentration of CO2 for use in wet cleaning of semiconductor devices are provided.
    Type: Application
    Filed: April 26, 2013
    Publication date: November 28, 2013
    Inventor: MKS Instruments, Inc.
  • Publication number: 20130218529
    Abstract: Described are computer-implemented methods and apparatuses, including computer program products, for estimating an optimal value for each input factor of a design space. The design space is defined by the input factors and output responses for a physical process. The optimal values for the input factors represent a starting point for estimating the design space. Data is received for the input factors, the output responses and criteria. An initial design space is estimated based on the received data. The optimal values for the input factors are determined from the initial design space.
    Type: Application
    Filed: February 25, 2013
    Publication date: August 22, 2013
    Applicant: MKS INSTRUMENTS, INC.
    Inventor: MKS Instruments, Inc.
  • Publication number: 20130203180
    Abstract: A system and methods are described for generating reagent ions and product ions for use in a mass spectrometry system. Applications for the system and method are also disclosed for detecting volatile organic compounds in trace concentrations. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass and peak intensity values for ion species during spectrometry and faults within the system.
    Type: Application
    Filed: November 20, 2012
    Publication date: August 8, 2013
    Applicant: MKS INSTRUMENTS, INC.
    Inventor: MKS INSTRUMENTS, INC.
  • Publication number: 20130193325
    Abstract: A method is provided for monitoring one or more silicon-containing compounds present in a biogas. The method includes generating a first absorption spectrum based on a ratio of a first spectral measurement and a second spectral measurement. The first spectral measurement is from a non-absorptive gas having substantially no infrared absorptions in a specified wavelength range of interest and the second spectral measurement is from a sample gas comprising the biogas. The method includes generating at least one surrogate absorption spectrum based on, at least, individual absorption spectrum for each of a subset of one or more silicon-containing compounds selected from a larger set of known silicon-containing compounds with known concentrations. A total concentration of the one or more silicon-containing compounds in the biogas can be calculated based on the first absorption spectrum and the at least one surrogate absorption spectrum.
    Type: Application
    Filed: January 17, 2013
    Publication date: August 1, 2013
    Applicant: MKS INSTRUMENTS, INC.
    Inventor: MKS INSTRUMENTS, INC.
  • Publication number: 20130189160
    Abstract: One or more reactive gases are introduced to a capacitance manometer at a particular area or areas between the inner and outer capacitive electrodes so the error-inducing measurement effects of positive and negative bending is neutralized or minimized. Additionally, a guard structure may be used for the electrode structure of the capacitance manometer. The guard structure presents an area that is relatively insensitive to the diffusion of the gas into the diaphragm and the resulting changing surface tension, curvature and deflection, thus providing increased or optimal stability of the zero reading and pressure reading of the manometer. The guard may also provide electrostatic isolation of the electrodes.
    Type: Application
    Filed: October 11, 2012
    Publication date: July 25, 2013
    Applicant: MKS INSTRUMENTS, INC.
    Inventor: MKS Instruments, Inc.
  • Publication number: 20130118589
    Abstract: An assembly for adjusting gas flow patterns and gas-plasma interactions including a toroidal plasma chamber. The toroidal plasma chamber has an injection member, an output member, a first side member and a second side member that are all connected. The first side member has a first inner cross-sectional area in at least a portion of the first side member and a second inner cross-sectional area in at least another portion of the first side member, where the first inner cross-sectional area and the second inner-cross-sectional area being different. The second side member has a third inner cross-sectional area in at least a portion of the second side member and a fourth inner cross-sectional area in at least another portion of the second side member, where the third inner cross-sectional area and the fourth inner-cross-sectional area being different.
    Type: Application
    Filed: November 8, 2012
    Publication date: May 16, 2013
    Applicant: MKS Instruments, Inc.
    Inventor: MKS Instruments, Inc.
  • Publication number: 20130073241
    Abstract: An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc.
    Type: Application
    Filed: October 10, 2012
    Publication date: March 21, 2013
    Applicant: MKS INSTRUMENTS, INC.
    Inventor: MKS Instruments, Inc.