Patents by Inventor Mladen M. Kekez

Mladen M. Kekez has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5882591
    Abstract: Biological fluids, e.g. bodily fluids such as plasma/serum, semen, milk or blood, can be treated efficiently with ozone to inactivate certain viruses, bacteria, fungi etc. To effect and enhance the contact of such fluids with ozone, or another disinfecting or deactivating gas, the fluids are thoroughly nebulized, or atomized, i.e. dispersed into minute droplets. Nebulization has been found to afford a faster O.sub.3 -fluid reaction rate than other known methods. It is proposed to create a fine "rain" of droplets to fall through a controlled atmosphere of O.sub.3 /O.sub.2 and/or O.sub.3 /inert gas mixture. Electric and magnetic fields are superimposed over the space through which the droplets are passed.Three types of nebulizers/atomizers are described: compressed gas (O.sub.3 /O.sub.2 mixture) atomizer, ultrasonic nebulizer, and rotary nebulizer.The invention was tested on coliphage MS2 which is safe, easy to handle, and more resistant to chemical disinfections than viruses such as HIV. More than 7 log.sub.
    Type: Grant
    Filed: August 6, 1997
    Date of Patent: March 16, 1999
    Inventor: Mladen M. Kekez
  • Patent number: 4752946
    Abstract: This invention describes a pulsed plasma pinch x-ray source. In the device the initial plasma annulus is derived from an electrical gas discharge in a chamber having constricted openings arranged on a circle. This low mass plasma annulus is imploded and pinched by passing high current axially through said annulus. The hot and dense pinched plasma copiously emits x-rays and has the capability of being fired at high repetition rates. The device is simple for commercial applications, such as x-ray lithography.
    Type: Grant
    Filed: September 23, 1986
    Date of Patent: June 21, 1988
    Assignee: Canadian Patents and Development Ltd.
    Inventors: Rajendra P. Gupta, Mladen M. Kekez, John H. Lau, Gary D. Lougheed
  • Patent number: 4751723
    Abstract: With the intent of satisfying the requirement of x-ray lithography a plasma pinch x-ray source has been developed in which the initial plasma annulus is derived from a plurality of electrical arcs in vacuum. This gives a low mass liner for the standard imploding plasma liner configuration to emit suitable x-rays and has the capability of being fired at repetition rates of 10 pps or more. The simplicity of this source design is especially attractive for a commercial use environment.
    Type: Grant
    Filed: September 23, 1986
    Date of Patent: June 14, 1988
    Assignee: Canadian Patents and Development Ltd.
    Inventors: Rajendra P. Gupta, Mladen M. Kekez, John H. Lau, Gary D. Lougheed