Abstract: Provided is a massage apparatus including: a leg massage unit that includes a first leg massage unit for massaging one of the legs of a user and a second leg massage unit for massaging the other one; an alignment sensor unit including a light emitting sensor provided in the first leg massage unit and a light receiving sensor provided in the second leg massage unit, which receives a signal from the light emitting sensor; and a control unit that controls the first and second leg massage units and the alignment sensor unit, wherein the first and second leg massage units are independently rotatable, and the control unit controls the alignment between the first and second leg massage units based on the signal received from the light receiving sensor.

Abstract: A temperature measuring method for a target substrate to be thermally processed in a semiconductor processing apparatus under a predetermined process condition is provided. This method includes the steps of detecting a heat flux supplied from at least part of the target substrate and detecting a temperature of a sensor by using the sensor facing the target substrate, and calculating a temperature of the target substrate from a parameter, including a thermal resistance between the sensor and the target substrate under the predetermined process condition, the detected heat flux, and the temperature of the sensor. The sensor is arranged opposite to heating means, through the target substrate, which heats the target substrate. The parameter may be obtained in advance by calibration.

Abstract: A temperature measuring method for a target substrate to be thermally processed in a semiconductor processing apparatus under a predetermined process condition is provided. This method includes the steps of detecting a heat flux supplied from at least part of the target substrate and detecting a temperature of a sensor by using the sensor facing the target substrate, and calculating a temperature of the target substrate from a parameter, including a thermal resistance between the sensor and the target substrate under the predetermined process condition, the detected heat flux, and the temperature of the sensor. The sensor is arranged opposite to heating means, through the target substrate, which heats the target substrate. The parameter may be obtained in advance by calibration.

Abstract: Semiconductor device testers are provided which measure skew between two or more output pins of a semiconductor device independent of a strobe timing input. More particularly, a skew signal is generated by a comparator circuit that changes state when the respective outputs transition state, for example, from matching to differing states. In a two output pin embodiment, for instance, when one of the output pin changes state before the other and both initially are in the same state, a flip flop is set at the time when the data on the output pins first differs, i.e. when the first output pin transitions to a new state. The flip flop is then reset when the second output pin subsequently transitions to the new state and again matches the first output pin. The resulting duration of the output of the flip flop thereby corresponds to the time of skew of the output pins regardless of the initial state of the pins.

Abstract: A temperature measuring method for a target substrate to be thermally processed in a semiconductor processing apparatus under a predetermined process condition is provided. This method includes the steps of detecting a heat flux supplied from at least part of the target substrate and detecting a temperature of a sensor by using the sensor facing the target substrate, and calculating a temperature of the target substrate from a parameter, including a thermal resistance between the sensor and the target substrate under the predetermined process condition, the detected heat flux, and the temperature of the sensor. The sensor is arranged opposite to heating means, through the target substrate, which heats the target substrate. The parameter may be obtained in advance by calibration.

Abstract: A temperature measuring method for a target substrate to be thermally processed in a semiconductor processing apparatus under a predetermined process condition is provided. This method includes the steps of detecting a heat flux supplied from at least part of the target substrate and detecting a temperature of a sensor by using the sensor facing the target substrate, and calculating a temperature of the target substrate from a parameter, including a thermal resistance between the sensor and the target substrate under the predetermined process condition, the detected heat flux, and the temperature of the sensor. The sensor is arranged opposite to heating means, through the target substrate, which heats the target substrate. The parameter may be obtained in advance by calibration.