Patents by Inventor Moh Lung LING

Moh Lung LING has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for enhancing photolithography patterning
    Patent number: 8450046
    Abstract: A method for fabricating a semiconductor device that includes: providing a substrate prepared with a photoresist layer; providing a photomask comprising a first and a second pattern having a respective first and second pitch range; providing a composite aperture comprising a first and a second off-axis illumination aperture pattern, the first off-axis aperture pattern having a configuration that improves the process window of the first pitch range and the second off-axis aperture pattern having a configuration that improves the process window for a second pitch range; exposing the photoresist layer on the substrate with radiation from an exposure source through the composite aperture and the photomask; and developing the photoresist layer to pattern the photoresist layer.
    Type: Grant
    Filed: February 24, 2009
    Date of Patent: May 28, 2013
    Assignees: GLOBALFOUNDRIES Singapore Pte. Ltd., National University of Singapore
    Inventors: Moh Lung Ling, Gek Soon Chua, Qunying Lin, Cho Jui Tay, Chenggen Quan
  • Mask system employing substantially circular optical proximity correction target and method of manufacture thereof
    Patent number: 8413083
    Abstract: A method of manufacture of a mask system includes: providing design data; generating a substantially circular optical proximity correction target from the design data; biasing a segment of the substantially circular optical proximity correction target; and generating mask data based on the shape produced by biasing the segment of the substantially circular optical proximity correction target.
    Type: Grant
    Filed: May 13, 2009
    Date of Patent: April 2, 2013
    Assignee: Globalfoundries Singapore Pte. Ltd.
    Inventors: Sia Kim Tan, Gek Soon Chua, Kwee Liang Martin Yeo, Ryan Khoon Khye Chong, Moh Lung Ling
  • MASK SYSTEM EMPLOYING SUBSTANTIALLY CIRCULAR OPTICAL PROXIMITY CORRECTION TARGET AND METHOD OF MANUFACTURE THEREOF
    Publication number: 20100293516
    Abstract: A method of manufacture of a mask system includes: providing design data; generating a substantially circular optical proximity correction target from the design data; biasing a segment of the substantially circular optical proximity correction target; and generating mask data based on the shape produced by biasing the segment of the substantially circular optical proximity correction target.
    Type: Application
    Filed: May 13, 2009
    Publication date: November 18, 2010
    Applicant: CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
    Inventors: Sia Kim Tan, Gek Soon Chua, Kwee Liang Martin Yeo, Ryan Khoon Khye Chong, Moh Lung Ling
  • METHODS FOR ENHANCING PHOTOLITHOGRAPHY PATTERNING
    Publication number: 20090214984
    Abstract: A method for fabricating a a semiconductor device that includes: providing a substrate prepared with a photoresist layer; providing a photomask comprising a first and a second pattern having a respective first and second pitch range; providing a composite aperture comprising a first and a second off-axis illumination aperture pattern, the first off-axis aperture pattern having a configuration that improves the process window of the first pitch range and the second off-axis aperture pattern having a configuration that improves the process window for a second pitch range; exposing the photoresist layer on the substrate with radiation from an exposure source through the composite aperture and the photomask; and developing the photoresist layer to pattern the photoresist layer.
    Type: Application
    Filed: February 24, 2009
    Publication date: August 27, 2009
    Applicants: CHARTERED SEMICONDUCTOR MANUFACTURING, LTD., NATIONAL UNIVERSITY OF SINGAPORE
    Inventors: Moh Lung LING, Gek Soon CHUA, Qunying LIN, Cho Jui TAY, Chenggen QUAN