Abstract: The present invention relates to alternative methods for the production of crystalline silicon compounds and/or alloys such as silicon carbide layers and substrates. In one embodiment, a method of the present invention comprises heating a porous silicon deposition surface of a porous silicon substrate to a temperature operable for epitaxial deposition of at least one atom or molecule, contacting the porous silicon deposition surface with a reactive gas mixture comprising at least one chemical species comprising a group IV element and at least one silicon chemical species, and depositing a silicon-group IV element layer on the porous silicon deposition surface. In another embodiment, the chemical species comprising a group IV element can be replaced with a transition metal species to form a silicon silicide layer.

Abstract: The present invention relates to alternative methods for the production of crystalline silicon compounds and/or alloys such as silicon carbide layers and substrates. In one embodiment, a method of the present invention comprises heating a porous silicon deposition surface of a porous silicon substrate to a temperature operable for epitaxial deposition of at least one atom or molecule, contacting the porous silicon deposition surface with a reactive gas mixture comprising at least one chemical species comprising a group IV element and at least one silicon chemical species, and depositing a silicon-group IV element layer on the porous silicon deposition surface. In another embodiment, the chemical species comprising a group IV element can be replaced with a transition metal species to form a silicon silicide layer.

Abstract: The present invention relates to alternative methods for the production of crystalline silicon compounds and/or alloys such as silicon carbide layers and substrates.

Abstract: Optoelectronic devices are provided that incorporate quantum dots as the electroluminescent layer in an inorganic wide-bandgap heterostructure. The quantum dots serve as the optically active component of the device and, in multilayer quantum dot embodiments, facilitate nanoscale epitaxial lateral overgrowth (NELOG) in heterostructures having non-lattice matched substrates. The quantum dots in such devices will be electrically pumped and exhibit electroluminescence, as opposed to being optically pumped and exhibiting photoluminescence. There is no inherent “Stokes loss” in electroluminescence thus the devices of the present invention have potentially higher efficiency than optically pumped quantum dot devices. Devices resulting from the present invention are capable of providing deep green visible light, as well as, any other color in the visible spectrum, including white light by blending different sizes and compositions of the dots and controlling manufacturing processes.

Abstract: Optoelectronic devices are provided that incorporate quantum dots as the electroluminescent layer in an inorganic wide-bandgap heterostructure. The quantum dots serve as the optically active component of the device and, in multilayer quantum dot embodiments, facilitate nanoscale epitaxial lateral overgrowth (NELOG) in heterostructures having non-lattice matched substrates. The quantum dots in such devices will be electrically pumped and exhibit electroluminescence, as opposed to being optically pumped and exhibiting photoluminescence. There is no inherent “Stokes loss” in electroluminescence thus the devices of the present invention have potentially higher efficiency than optically pumped quantum dot devices. Devices resulting from the present invention are capable of providing deep green visible light, as well as, any other color in the visible spectrum, including white light by blending different sizes and compositions of the dots and controlling manufacturing processes.

Abstract: The present invention relates to alternative methods for the production of crystalline silicon compounds and/or alloys such as silicon carbide layers and substrates. In one embodiment, a method of the present invention comprises heating a porous silicon deposition surface of a porous silicon substrate to a temperature operable for expitaxial deposition of at least one atom or molecule, contacting the porous silicon deposition surface with a reactive gas mixture comprising at least one chemical species comprising a group IV element and at least one silicon chemical species, and depositing a silicon-group IV element layer on the porous silicon deposition surface. In another embodiment, the chemical species comprising a group IV element can be replaced with a transition metal species to form a silicon silicide layer.

Abstract: Optoelectronic devices are provided that incorporate quantum dots as the electroluminescent layer in an inorganic wide-bandgap heterostructure. The quantum dots serve as the optically active component of the device and, in multilayer quantum dot embodiments, facilitate nanoscale epitaxial lateral overgrowth (NELOG) in heterostructures having non-lattice matched substrates. The quantum dots in such devices will be electrically pumped and exhibit electroluminescence, as opposed to being optically pumped and exhibiting photoluminescence. There is no inherent “Stokes loss” in electroluminescence thus the devices of the present invention have potentially higher efficiency than optically pumped quantum dot devices. Devices resulting from the present invention are capable of providing deep green visible light, as well as, any other color in the visible spectrum, including white light by blending different sizes and compositions of the dots and controlling manufacturing processes.

Abstract: The invention consists of a flat panel display device that combines the simplicity of manufacture of a TFEL display with the phosphor stimulation capabilities of an FED. A phosphor such a ZnS:Mn can act as both an EL phosphor and as a cathodoluminescent phosphor. The phosphor is deposited on a porous silicon underlayer that contains a labyrinth of fissures, voids, hillocks, and microscopically rough surfaces. At the phosphor-porous silicon interface, the labyrinthine surface possesses hundreds to thousands of electric field line compression points that can be characterized by an average field enhancement. When this underlayer is the cathode, high energy electrons are injected into the phosphor producing substantial light emission even at low applied fields. Additionally, the surrounding silicon is available to integrate drive circuitry and provide a TFT at each pixel, if needed.

Abstract: The invention consists of a flat panel display device that combines the simplicity of manufacture of a TFEL display with the phosphor stimulation capabilities of an FED. A phosphor such a ZnS:Mn can act as both an EL phosphor and as a cathodoluminescent phosphor. The phosphor is deposited on a porous silicon underlayer that contains a labyrinth of fissures, voids, hillocks, and microscopically rough surfaces. At the phosphor-porous silicon interface, the labyrinthine surface possesses hundreds to thousands of electric field line compression points that can be characterized by an average field enhancement. When this underlayer is the cathode, high energy electrons are injected into the phosphor producing substantial light emission even at low applied fields. Additionally, the surrounding silicon is available to integrate drive circuitry and provide a TFT at each pixel, if needed.

Abstract: The invention consists of a flat panel display device that combines the simplicity of manufacture of a TFEL display with the phosphor stimulation capabilities of an FED. A phosphor such a ZnS:Mn can act as both an EL phosphor and as a cathodoluminescent phosphor. The phosphor is deposited on a porous silicon underlayer that contains a labyrinth of fissures, voids, hillocks, and microscopically rough surfaces. At the phosphor-porous silicon interface, the labyrinthine surface possesses hundreds to thousands of electric field line compression points that can be characterized by an average field enhancement. When this underlayer is the cathode, high energy electrons are injected into the phosphor producing substantial light emission even at low applied fields. Additionally, the surrounding silicon is available to integrate drive circuitry and provide a TFT at each pixel, if needed.