Abstract: Compositions, processes, and methods are provided including, but not limited to, a composition including a plurality of clay nanoparticles, wherein each clay nanoparticle comprises an anionic component and a cationic component wherein the anionic component has the formula (I): [(Si8MgbLic)O20(OH)4]??(I) wherein 5.5<b?6, and wherein c>0 and b/c>12.

Abstract: The method of making a wall-coated open tubular capillary column with a poly benzyl stationary phase is a method of preparing a capillary column for gas chromatography. An inner wall of a fused silica capillary column is cleaned and then rinsed with a sodium hydroxide solution. The fused silica capillary column is flushed with isopropanol to form a pre-treated capillary column, and the pre-treated capillary column is loaded with a mixture of phenyl tri-methoxy silane and alcohol. The loaded pre-treated capillary column is heated to form a treated capillary column, which is then washed. A thin layer of a poly benzyl stationary phase is then coated on the inner wall through condensation polymerization of benzyl chloride monomers with a Lewis acid catalyst in a non-polar solvent.

Abstract: Compositions, processes, and methods are provided including, but not limited to, a composition including a plurality of clay nanoparticles, wherein each clay nanoparticle comprises an anionic component and a cationic component wherein the anionic component has the formula (I): wherein 5.5<b?6, and wherein c>0 and b/c>12.

Abstract: A circuit design in a hierarchical description is analyzed. The analysis comprises identifying electrical properties of circuit blocks in the circuit design. Circuit components of the circuit design are associated with geometric elements of a layout design. Then instances of each of the circuit blocks are classified into groups of instances based on the electrical properties. Rule checking is performed on one or more groups in the groups of instances for each of the circuit blocks by analyzing geometric elements associate with components of one instance for each of the one or more groups.

Abstract: A circuit design in a hierarchical description is analyzed. The analysis comprises identifying electrical properties of circuit blocks in the circuit design. Circuit components of the circuit design are associated with geometric elements of a layout design. Then instances of each of the circuit blocks are classified into groups of instances based on the electrical properties. Rule checking is performed on one or more groups in the groups of instances for each of the circuit blocks by analyzing geometric elements associate with components of one instance for each of the one or more groups.

Abstract: Systems and methods for layout analysis using unit cell properties. A method includes receiving a layout design and analyzing the layout design to identify unit cells in the layout design. The method includes designating points of interest each corresponding to a respective one of the unit cells and classifying the unit cells into a plurality of classifications using the points of interest and the corresponding properties. The method includes identifying unique patterns of the unit cells, and producing a reduced layout including the unique patterns of unit cells. The method includes performing layout processing on the reduced layout and propagating the process results from each of the unique patterns of unit cells in the reduced layout to other unit cells of the layout design having the same classification.

Abstract: Aspects of the disclosed technology relate to techniques of pattern-based resolution enhancement. Surrounding areas for a plurality of geometric layout elements in a layout design are partitioned into geometric space elements. The plurality of geometric layout elements and the geometric space elements are grouped, through pattern classification, into geometric layout element groups and geometric space element groups, respectively. Optical proximity correction is performed for each of the geometric layout element groups and sub-resolution assist feature insertion is performed for each of the geometric space element groups. The results are applied to the plurality of geometric layout elements and the geometric space elements in the layout design.

Abstract: Aspects of the disclosed technology relate to techniques of context-aware pattern matching and processing. A circuit design is analyzed to identity circuit components of interest. Reference layout patterns that are associated with the circuit components of interest are extracted from a layout design based on the association of circuit components of the circuit design with geometric elements of the layout design. Pattern matching is performed to identify layout patterns that match the reference layout patterns. The identified layout patterns are then processed.

Abstract: Aspects of the disclosed technology relate to techniques of pattern-based resolution enhancement. Surrounding areas for a plurality of geometric layout elements in a layout design are partitioned into geometric space elements. The plurality of geometric layout elements and the geometric space elements are grouped, through pattern classification, into geometric layout element groups and geometric space element groups, respectively. Optical proximity correction is performed for each of the geometric layout element groups and sub-resolution assist feature insertion is performed for each of the geometric space element groups. The results are applied to the plurality of geometric layout elements and the geometric space elements in the layout design.

Abstract: Aspects of the disclosed technology relate to techniques of context-aware pattern matching and processing. A circuit design is analyzed to identity circuit components of interest. Reference layout patterns that are associated with the circuit components of interest are extracted from a layout design based on the association of circuit components of the circuit design with geometric elements of the layout design. Pattern matching is performed to identify layout patterns that match the reference layout patterns. The identified layout patterns are then processed.