Abstract: The thermal sensing layer for a microbolometer includes a Ge1-xSnx film layer, where 0.17?x?0.25. The Ge1-xSnx film layer may be deposited on a substrate layer, such as pure silicon. An additional layer of silicon dioxide may be added, such that the silicon dioxide layer is sandwiched between the silicon substrate and the Ge1-xSnx film. In order to make the Ge1-xSnx thin film layer, germanium (Ge) and tin (Sn) are simultaneously sputter deposited on the substrate, where the atomic ratio of germanium to tin is between 0.83:0.17 and 0.75:0.25 inclusive. The sputter deposition may occur in an argon atmosphere, with the germanium having a deposition rate of 9.776 nm/min, and with the tin having a deposition rate between 2.885 nm/min and 4.579 nm/min.

Abstract: The thermal sensing layer for a microbolometer includes a Ge1-xSnx film layer, where 0.17?x?0.25. The Ge1-xSnx film layer may be deposited on a substrate layer, such as pure silicon. An additional layer of silicon dioxide may be added, such that the silicon dioxide layer is sandwiched between the silicon substrate and the Ge1-xSnx film, In order to make the Ge1-xSnx thin film layer, germanium (Ge) and tin (Sn) are simultaneously sputter deposited on the substrate, where the atomic ratio of germanium to tin is between 0.83:0.17 and 0.75:0.25 inclusive. The sputter deposition may occur in an argon atmosphere, with the germanium having a deposition rate of 9.776 nm/min, and with the tin having a deposition rate between 2.885 nm/min and 4.579 nm/min.

Abstract: The optical absorber for long-wave infrared radiation includes a nano-plasmonic gold structure arrayed on an absorbing dielectric substrate in an alternating checkerboard-type pattern. A plurality of plasmonic cells are formed on an upper surface of the absorbing dielectric substrate, which can be, for example, a silicon nitride (Si3N4) substrate. The plurality of plasmonic cells are arrayed in a regular rectangular grid pattern, with each plasmonic cell having a plurality of elongated strips, each extending along an identical axis of orientation within the plasmonic cell. Adjacent ones of the plasmonic cells are oriented orthogonally with respect to one another, and each elongated strip includes a titanium layer formed on the upper surface of the absorbing dielectric substrate and a gold layer formed on the titanium layer, such that the titanium layer is sandwiched between the gold layer and the upper surface of the absorbing dielectric substrate.