Abstract: An ELISA for the diagnosis of Haemonchus longistipes infection in camels is provided. The ELISA for the diagnosis of Haemonchus longistipes infection in camels includes antibodies raised against a 76 kDa protein isolated from Haemonchus longistipes. The resulting antibodies may be used in assays to detect Haemonchus longistipes infected camels. The assays may be any kind of enzyme-linked immunosorbent assay, or “ELISA”, known to those of skill in the art. The assay using the antibodies raised against a 76 kDa protein isolated from Haemonchus longistipes infected camels may be capable of detecting pre-patent Haemonchus longistipes infection.

Abstract: An ELISA for the diagnosis of Haemonchus longistipes infection in camels is provided. The ELISA for the diagnosis of Haemonchus longistipes infection in camels includes antibodies raised against a 76 kDa protein isolated from Haemonchus longistipes. The resulting antibodies may be used in assays to detect Haemonchus longistipes infected camels. The assays may be any kind of enzyme-linked immunosorbent assay, or “ELISA”, known to those of skill in the art. The assay using the antibodies raised against a 76 kDa protein isolated from Haemonchus longistipes infected camels may be capable of detecting pre-patent Haemonchus longistipes infection.

Abstract: A modulation device includes: a signal splitter configured to generate: i) an M-bit wide partial signal comprising M more significant bits of an N-bit wide input signal; and ii) an L-bit wide partial signal comprising L less significant bits of the N-bit wide input signal, where L=N?M; a first modulation unit configured to generate a 1-bit wide pulse density modulation signal on the basis of the L-bit wide partial signal; a summation unit configured to generate an M-bit wide summation signal on the basis of the M-bit wide partial signal and the 1-bit wide pulse density modulation signal; and a second modulation unit configured to generate a 1-bit wide pulse width modulation signal on the basis of the M-bit wide summation signal.

Abstract: A method for measuring an actuator in a projection exposure apparatus for semiconductor lithography, comprises: driving and deflecting a first actuator with a constant control signal; deflecting a further actuator by way of the mechanical coupling; and determining the capacitance of the further actuator, which was deflected by way of the coupling. A projection exposure apparatus for semiconductor lithography comprises a control device and a measuring device, wherein the measuring device is configured to determine the capacitance of at least one actuator in the projection exposure apparatus.

Abstract: A mirror including a substrate (110), a reflection layer system (120), and at least one continuous piezoelectric layer (130, . . . ) arranged between the substrate and the layer system. An electric field producing a locally variable deformation is applied to the piezoelectric layer via a first, layer-system-side electrode arrangement and a second, substrate-side electrode arrangement. At least one of the electrode arrangements is assigned a mediator layer (170) setting an at least regionally continuous profile of the electrical potential along the respective electrode arrangement. The electrode arrangement to which the mediator layer is assigned has a plurality of electrodes (160, . . . ), each of which is configured to receive an electrical voltage relative to the respective other electrode arrangement. In the region that couples two respectively adjacent electrodes, the mediator layer is subdivided into a plurality of regions (171, . . . ) that are electrically insulated from one another.

Abstract: A drive device comprises a drive unit, a source, a filter unit, and a determining unit.

Abstract: A variable stiffness joint and method to alter the stiffness of the joint with multiple stiffness levels is described wherein a plurality of stiffness bits (m) are used for enabling 2 m stiffness level variations for the joint. Each stiffness bit comprises an elastic element in mechanical connection with a clutch (21, 22, 23). The joint revolves with zero stiffness level when all the clutches (21, 22, 23) are disengaged whereas a clutch (21, 22, 23) involves one of the elastic elements which alter the stiffness of the joint. Engaging other clutches (21, 22, 23) involve more elastic elements for altering the joint stiffness and the resultant joint stiffness is determined by adding the stiffness values of all the involved springs (6, 7, 8).

Abstract: A modulation device includes: a signal splitter configured to generate: i) an M-bit wide partial signal comprising M more significant bits of an N-bit wide input signal; and ii) an L-bit wide partial signal comprising L less significant bits of the N-bit wide input signal, where L=N?M; a first modulation unit configured to generate a 1-bit wide pulse density modulation signal on the basis of the L-bit wide partial signal; a summation unit configured to generate an M-bit wide summation signal on the basis of the M-bit wide partial signal and the 1-bit wide pulse density modulation signal; and a second modulation unit configured to generate a 1-bit wide pulse width modulation signal on the basis of the M-bit wide summation signal.

Abstract: A variable stiffness joint and method to alter the stiffness of the joint with multiple stiffness levels is described wherein a plurality of stiffness bits (m) are used for enabling 2 m stiffness level variations for the joint. Each stiffness bit comprises an elastic element in mechanical connection with a clutch (21, 22, 23). The joint revolves with zero stiffness level when all the clutches (21, 22, 23) are disengaged whereas a clutch (21, 22, 23) involves one of the elastic elements which alter the stiffness of the joint. Engaging other clutches (21, 22, 23) involve more elastic elements for altering the joint stiffness and the resultant joint stiffness is determined by adding the stiffness values of all the involved springs (6, 7, 8).

Abstract: The disclosure provides a method and an apparatus for modifying imaging properties of a microlithographic optical system. In a method according to the disclosure, the imaging properties are modified by way of control signals coupled into the optical system by way of at least one interface. The values of the control signals that are in each case coupled in during the controlling for a desired modification of the imaging properties are ascertained on the basis of a model. The model is created by virtue of performing, in a learning phase in which the modification of the imaging properties that is in each case attained for different values of the control signals is ascertained, a successive individual adaptation of the model to the optical system. The learning phase is performed without prior specification of explicit information relating to internal mechanisms of action within the optical system.

Abstract: The disclosure provides a method and an apparatus for modifying imaging properties of a microlithographic optical system. In a method according to the disclosure, the imaging properties are modified by way of control signals coupled into the optical system by way of at least one interface. The values of the control signals that are in each case coupled in during the controlling for a desired modification of the imaging properties are ascertained on the basis of a model. The model is created by virtue of performing, in a learning phase in which the modification of the imaging properties that is in each case attained for different values of the control signals is ascertained, a successive individual adaptation of the model to the optical system. The learning phase is performed without prior specification of explicit information relating to internal mechanisms of action within the optical system.