Patents by Inventor Mohammed Aheem

Mohammed Aheem has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma Etch Resistant, Highly Oriented Yttria Films, Coated Substrates and Related Methods
    Publication number: 20120103519
    Abstract: Included within the scope of the invention are plasma etch-resistant films for substrates. The films include a yttria material and a at least a portion of the yttria material is in a crystal phase having an orientation defined by a Miller Index notation {111}. Also included are methods of manufacturing plasma etch-resistant films on a substrate. Such methods include applying a yttria material-containing composition onto at least a portion of a surface of a substrate to form a film. The film includes a yttria material and at least a portion of the yttria material is in a crystal phase having an orientation defined by a Miller Index notation {111}.
    Type: Application
    Filed: October 24, 2011
    Publication date: May 3, 2012
    Inventors: Mohammed Aheem, Sang-Ho Lee, Thomas Mercer, Vasil Vorsa