Patents by Inventor Mohammed Ameen

Mohammed Ameen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma Etch Resistant Films, Articles Bearing Plasma Etch Resistant Films and Related Methods
    Publication number: 20140099491
    Abstract: The invention includes a plasma etch-resistant film for a substrate comprising a yttria material wherein at least a portion of the yttria material is in a crystal phase having a crystal lattice structure, wherein at least 50% of the yttria material is in a form of a monoclinic crystal system. The film may be treated by exposure to a fluorine gas plasma. Also included are plasma etch-resistant articles that include a substrate and a film, wherein the film comprises an yttria material and at least a portion of the yttria material is present in the film in a crystal phase having a crystal lattice structure and at least 50% of the yttria material is in a form of a monoclinic crystal system. Several methods are contemplated within the scope of the invention.
    Type: Application
    Filed: October 9, 2012
    Publication date: April 10, 2014
    Inventors: Mohammed Ameen, Sang-Ho Lee, Thomas Mercer, Vasil Vorsa