Abstract: An X-ray diffraction apparatus for measuring crystal orientation of crystalline samples is provided. The apparatus comprises a turntable comprising at least one tray; a turntable support platform defining a plane; and a motorized turntable displacement system for remotely displacing the turntable linearly along a first axis parallel to the plane, linearly along a second axis perpendicular to the plane, and rotatably about the second axis; an X-ray assembly provided within the enclosure; and a motorized X-ray assembly displacement system for displacing the X-ray assembly linearly along a third axis, the third axis being parallel to the plane and non-parallel to the first axis; wherein for each one of the crystalline samples, at least one of the motorized turntable displacement system and the motorized X-ray assembly displacement system is actuated to align the collimated X-ray beam with the corresponding measuring position and measure the crystal orientation of the crystalline sample.

Abstract: There is provided an X-ray source for an X-ray diffraction apparatus. The source includes a target and a filament operable to generate an X-ray beam, a vacuum chamber, outer and inner housings and a rotation mechanism. The chamber encloses the target and the filament and has a window transparent to the beam. The outer housing is mountable to the apparatus and includes outer housing openings. The inner housing encloses the chamber and is mounted to the outer housing. The inner housing includes inner housing openings positioned to be aligned with the window and the outer housing openings. The rotation mechanism is in engagement with the outer housing and the inner housing and is operable to provide a rotation between the inner outer housings between a line focus configuration, wherein the filament is parallel to the window, and a point focus configuration, wherein the filament is perpendicular to the window.

Abstract: There is provided a transmission X-ray diffraction (XRD) apparatus, the transmission XRD apparatus including an X-ray source for generating a direct X-ray beam; sample holder for receiving the sample, the sample being positioned to receive the direct X-ray beam when held by the sample holder; a detector for receiving X-rays transmitted through the sample and outputting an X-ray diffraction pattern therefrom; and an optical element positioned between the X-ray source and the detector, the optical element including a Montel optic and a secondary pin-hole collimator collectively adapted to focus the direct X-ray beam on the detector, wherein a ratio between a dimension of the direct X-ray beam projected on the detector and a sample-to-detector distance is equal or smaller than 1/570. Related methods are also provided.

Abstract: A mounting system and a sample holder for an X-ray diffraction (XRD) apparatus are provided. The mounting system includes a mounting bracket, an attachment module and a biasing assembly. The mounting bracket is mountable to the XRD apparatus and is rotatable about a rotation axis. The mounting bracket includes an abutment structure defining a reference position. The attachment module is mountable onto the mounting bracket at an adjustable attaching position with respect to the reference position. The attachment module comprises an attaching element that is engageable with the abutment structure for abutting the mounting bracket proximate the reference position. The biasing assembly is mounted onto one of the mounting bracket or the attachment module for interlocking the mounting bracket with the attachment module, such that the mounting bracket is blocked in a plane substantially parallel to the rotation axis, thereby allowing the attaching position to be aligned with the rotation axis.

Abstract: A mounting system and a sample holder for an X-ray diffraction (XRD) apparatus are provided. The mounting system includes a mounting bracket, an attachment module and a biasing assembly. The mounting bracket is mountable to the XRD apparatus and is rotatable about a rotation axis. The mounting bracket includes an abutment structure defining a reference position. The attachment module is mountable onto the mounting bracket at an adjustable attaching position with respect to the reference position. The attachment module comprises an attaching element that is engageable with the abutment structure for abutting the mounting bracket proximate the reference position. The biasing assembly is mounted onto one of the mounting bracket or the attachment module for interlocking the mounting bracket with the attachment module, such that the mounting bracket is blocked in a plane substantially parallel to the rotation axis, thereby allowing the attaching position to be aligned with the rotation axis.

Abstract: A mounting system and a sample holder for an X-ray diffraction (XRD) apparatus are provided. The mounting system includes a mounting bracket, an attachment module and a biasing assembly. The mounting bracket is mountable to the XRD apparatus and is rotatable about a rotation axis. The mounting bracket includes an abutment structure defining a reference position. The attachment module is mountable onto the mounting bracket at an adjustable attaching position with respect to the reference position. The attachment module comprises an attaching element that is engageable with the abutment structure for abutting the mounting bracket proximate the reference position. The biasing assembly is mounted onto one of the mounting bracket or the attachment module for interlocking the mounting bracket with the attachment module, such that the mounting bracket is blocked in a plane substantially parallel to the rotation axis, thereby allowing the attaching position to be aligned with the rotation axis.

Abstract: A mounting system and a sample holder for an X-ray diffraction (XRD) apparatus are provided. The mounting system includes a mounting bracket, an attachment module and a biasing assembly. The mounting bracket is mountable to the XRD apparatus and is rotatable about a rotation axis. The mounting bracket includes an abutment structure defining a reference position. The attachment module is mountable onto the mounting bracket at an adjustable attaching position with respect to the reference position. The attachment module comprises an attaching element that is engageable with the abutment structure for abutting the mounting bracket proximate the reference position. The biasing assembly is mounted onto one of the mounting bracket or the attachment module for interlocking the mounting bracket with the attachment module, such that the mounting bracket is blocked in a plane substantially parallel to the rotation axis, thereby allowing the attaching position to be aligned with the rotation axis.

Abstract: A system and method for non-destructively determining the grain orientation of a crystalline material using x-ray diffraction techniques to non-destructively analyze material and, more particularly, to a system and method for determining the grain orientation of an underlying crystalline material covered by an overlying polycrystalline material. Further, the system and method relate to the use of x-ray diffraction to non-destructively characterize parts and components to determine whether to accept or reject those components or parts for use in application.

Abstract: A system and method for non-destructively determining the grain orientation of a crystalline material using x-ray diffraction techniques to non-destructively analyze material and, more particularly, to a system and method for determining the grain orientation of an underlying crystalline material covered by an overlying polycrystalline material. Further, the system and method relate to the use of x-ray diffraction to non-destructively characterize parts and components to determine whether to accept or reject those components or parts for use in application.