Patents by Inventor Mohammed Jaheer SHERFUDEEN

Mohammed Jaheer SHERFUDEEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gas delivery for tungsten-containing layer
    Patent number: 11939668
    Abstract: A method of forming a tungsten-containing layer over a substrate includes a) positioning a substrate on a substrate support in a process volume of a process chamber; b) providing a precursor gas to the process volume of the process chamber for a first duration; and c) providing a tungsten-containing gas to the process volume of the process chamber by opening a pulsing valve on a tungsten-containing gas delivery line for a second duration occurring after the first duration to form a tungsten-containing layer on the substrate. The tungsten-containing gas delivery line includes a first section connected to an inlet of the pulsing valve and a second section connected to an outlet of the pulsing valve, the first section connects the inlet of the pulsing valve to a reservoir of tungsten-containing gas, the second section connects the outlet of the pulsing valve to an inlet of the process chamber.
    Type: Grant
    Filed: April 26, 2022
    Date of Patent: March 26, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Zubin Huang, Mohammed Jaheer Sherfudeen, David Matthew Santi, Jallepally Ravi, Peiqi Wang, Kai Wu
  • GAS DELIVERY FOR TUNGSTEN-CONTAINING LAYER
    Publication number: 20230340662
    Abstract: A method of forming a tungsten-containing layer over a substrate includes a) positioning a substrate on a substrate support in a process volume of a process chamber; b) providing a precursor gas to the process volume of the process chamber for a first duration; and c) providing a tungsten-containing gas to the process volume of the process chamber by opening a pulsing valve on a tungsten-containing gas delivery line for a second duration occurring after the first duration to form a tungsten-containing layer on the substrate. The tungsten-containing gas delivery line includes a first section connected to an inlet of the pulsing valve and a second section connected to an outlet of the pulsing valve, the first section connects the inlet of the pulsing valve to a reservoir of tungsten-containing gas, the second section connects the outlet of the pulsing valve to an inlet of the process chamber.
    Type: Application
    Filed: April 26, 2022
    Publication date: October 26, 2023
    Inventors: Zubin HUANG, Mohammed Jaheer SHERFUDEEN, David Matthew SANTI, Jallepally Ravi, Peiqi WANG, Kai WU