Patents by Inventor Mohammed Radwan
Mohammed Radwan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12265154Abstract: According to a method for assisting reverse driving of a combination (1), an actual value for a hitch angle of the combination (1) is determined by a computing unit (6) depending on sensor data generated by a hitch angle sensor. A hitch length of a trailer (3), given by a distance between a trailer body (11) and a hitch (7) of a vehicle (2), is determined depending on environmental sensor data of the combination (1). A collision value for the hitch angle is determined by the computing unit (6) depending on the hitch length, and the safety measure is triggered by the computing unit (6) depending on the actual value and the collision value for the hitch angle.Type: GrantFiled: January 11, 2022Date of Patent: April 1, 2025Assignee: VALEO SCHALTER UND SENSOREN GMBHInventors: Mohamed Radwan, Ahmed Elagroudy
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Publication number: 20240353578Abstract: The disclosure notably relates to a computer-implemented method for localization of a moving vehicle based on GNSS data and vehicle sensor data. The method comprises, in real-time, obtaining vehicle motion data stemming from at least one vehicle sensor. The method also comprises obtaining, while the GNSS signal is available, GNSS data of a positioning of the vehicle. The GNSS data includes a distance variation and an orientation variation. The method also comprises calibrating parameters of an odometer of the vehicle. The calibration is based on a data fusion that uses a Kalman filter. The Kalman filter determines a predicted distance variation and a predicted orientation variation of the vehicle based on a current calibration of the odometer parameters and on the motion data. The Kalman filter also compares the predicted distance variation and predicted orientation variation to the distance variation and the orientation variation of the GNSS data.Type: ApplicationFiled: April 19, 2024Publication date: October 24, 2024Applicant: VALEO COMFORT AND DRIVING ASSISTANCEInventors: Mohamed Radwan, Alaaeldin Zaky
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Publication number: 20240353566Abstract: The disclosure notably relates to for determination of the altitude of a moving vehicle based on GNSS data and vehicle sensor data. The method comprises, in real-time obtaining a sensor vehicle pitch rate stemming from at least one vehicle sensor. The method also comprises, in real-time, while the GNSS signal is available, obtaining a GNSS vehicle pitch rate that stems from GNSS data of an altitude of the vehicle. The method also comprises, in real-time, calibrating the sensor vehicle pitch rate based on the GNSS vehicle pitch rate, the calibration being based on formulating the GNSS vehicle pitch rate as an affine function of the sensor vehicle pitch rate.Type: ApplicationFiled: April 16, 2024Publication date: October 24, 2024Applicant: VALEO COMFORT AND DRIVING ASSISTANCEInventors: Mohamed Radwan, Ahmed Elgendy, Haytham Fawzy
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Publication number: 20220221580Abstract: According to a method for assisting reverse driving of a combination (1), an actual value for a hitch angle of the combination (1) is determined by a computing unit (6) depending on sensor data generated by a hitch angle sensor. A hitch length of a trailer (3), given by a distance between a trailer body (11) and a hitch (7) of a vehicle (2), is determined depending on environmental sensor data of the combination (1). A collision value for the hitch angle is determined by the computing unit (6) depending on the hitch length, and the safety measure is triggered by the computing unit (6) depending on the actual value and the collision value for the hitch angle.Type: ApplicationFiled: January 11, 2022Publication date: July 14, 2022Applicant: Valeo Schalter und Sensoren GmbHInventors: Mohamed Radwan, Ahmed Elagroudy
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Patent number: 9111999Abstract: When performing plasma assisted etch processes for patterning complex metallization systems of microstructure devices, the probability of creating plasma-induced damage, such as arcing, may be reduced or substantially eliminated by using a superior ramp-up system for the high frequency power and the low frequency power. To this end, the high frequency power may be increased at a higher rate compared to the low frequency power component, wherein, additionally, a time delay may be applied so that, at any rate, the high frequency component reaches its target power level prior to the low frequency component.Type: GrantFiled: March 27, 2015Date of Patent: August 18, 2015Assignee: GLOBALFOUNDRIES Inc.Inventors: Mohammed Radwan, Matthias Zinke
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Publication number: 20150200131Abstract: When performing plasma assisted etch processes for patterning complex metallization systems of microstructure devices, the probability of creating plasma-induced damage, such as arcing, may be reduced or substantially eliminated by using a superior ramp-up system for the high frequency power and the low frequency power. To this end, the high frequency power may be increased at a higher rate compared to the low frequency power component, wherein, additionally, a time delay may be applied so that, at any rate, the high frequency component reaches its target power level prior to the low frequency component.Type: ApplicationFiled: March 27, 2015Publication date: July 16, 2015Inventors: Mohammed Radwan, Matthias Zinke
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Patent number: 9018102Abstract: When performing plasma assisted etch processes for patterning complex metallization systems of microstructure devices, the probability of creating plasma-induced damage, such as arcing, may be reduced or substantially eliminated by using a superior ramp-up system for the high frequency power and the low frequency power. To this end, the high frequency power may be increased at a higher rate compared to the low frequency power component, wherein, additionally, a time delay may be applied so that, at any rate, the high frequency component reaches its target power level prior to the low frequency component.Type: GrantFiled: February 14, 2012Date of Patent: April 28, 2015Assignee: GLOBALFOUNDRIES Inc.Inventors: Mohammed Radwan, Matthias Zinke
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Patent number: 8813274Abstract: A toilet multi flushing device consisting of an enclosed tank (3) filled with compressible plastic sheets (6). The tank (3) has a direct connection (1) to water supply at the bottom, an outlet at the bottom of the tank (3) with an external ball valve used as a flushing valve (10). When the valve (10) is opened the water is ejected at high speed to clear the bowl. It could be mixed with fresh air to form a mist flow. The mist streams clear the bowl. Fresh air could be substituted by the air from the trap (25) to create vacuum after the trap (25) to facilitate the clearing of the bowl.Type: GrantFiled: November 30, 2005Date of Patent: August 26, 2014Inventor: Mohamed Radwan Rafaat Atassi
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Publication number: 20130264726Abstract: The invention relates to a nitride nuclear fuel characterized in that the nitride fuel is a pellet of a material with a single-phase solid solution of elements comprising at least a nitride of americium (Am), and that the material has a density of around 90% of the theoretical density. The invention further relates to a method for producing the said nuclear fuel by using the steps: mixing of starting powders, sintering of the powders into a dense pellet and a subsequent heat treatment.Type: ApplicationFiled: September 27, 2011Publication date: October 10, 2013Applicant: DIAMORPH ABInventors: Janne Wallenius, Mohamed Radwan, Mikael Jolkkonen
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Patent number: 8492279Abstract: When forming via openings in sophisticated semiconductor devices, a silicon-containing anti-reflective coating (ARC) layer may be efficiently used for adjusting the critical dimension of the via openings by using a two-step etch process in which, in at least one of the process steps, the flow rate of a reactive gas component may be controlled to increase or reduce the resulting width of an opening in the silicon ARC layer. In this manner, the spread of critical dimensions of vias around the target value may be significantly reduced while also reducing any maintenance and rework efforts.Type: GrantFiled: June 21, 2011Date of Patent: July 23, 2013Assignee: GLOBALFOUNDRIES Inc.Inventors: Mohammed Radwan, Johann Steinmetz
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Patent number: 8474248Abstract: A method to control NH3 slippage and NOx conversion in an electronic controlled internal combustion engine exhaust system equipped with a selective catalyst reducer, a diesel particulate filter, a diesel oxidation catalyst and a urea doser.Type: GrantFiled: May 6, 2009Date of Patent: July 2, 2013Assignee: Detroit Diesel CorporationInventors: Min Sun, Sathish Sankara-Chinttoanony, Bryant Chan Pham, Amr Mohamed Radwan, Zhiping Han, Wolfgang Krueger
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Publication number: 20120214305Abstract: When performing plasma assisted etch processes for patterning complex metallization systems of microstructure devices, the probability of creating plasma-induced damage, such as arcing, may be reduced or substantially eliminated by using a superior ramp-up system for the high frequency power and the low frequency power. To this end, the high frequency power may be increased at a higher rate compared to the low frequency power component, wherein, additionally, a time delay may be applied so that, at any rate, the high frequency component reaches its target power level prior to the low frequency component.Type: ApplicationFiled: February 14, 2012Publication date: August 23, 2012Applicant: GLOBALFOUNDRIES INC.Inventors: Mohammed Radwan, Matthias Zinke
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Publication number: 20120028376Abstract: When forming metal lines and vias in complex metallization systems of semiconductor devices, an additional control mechanism for adjusting the final critical dimension may be implemented in the last etch process for etching through the etch stop layer after having patterned the low-k dielectric material. To this end, the concentration of a polymerizing gas may be controlled in accordance with the initial critical dimension obtained after the lithography process, thereby efficiently re-adjusting the final critical dimension so as to be close to the desired target value.Type: ApplicationFiled: June 10, 2011Publication date: February 2, 2012Applicant: GLOBALFOUNDRIES INC.Inventors: Mohammed Radwan, Johann Steinmetz
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Publication number: 20120028472Abstract: When forming via openings in sophisticated semiconductor devices, a silicon-containing anti-reflective coating (ARC) layer may be efficiently used for adjusting the critical dimension of the via openings by using a two-step etch process in which, in at least one of the process steps, the flow rate of a reactive gas component may be controlled to increase or reduce the resulting width of an opening in the silicon ARC layer. In this manner, the spread of critical dimensions of vias around the target value may be significantly reduced while also reducing any maintenance and rework efforts.Type: ApplicationFiled: June 21, 2011Publication date: February 2, 2012Applicant: GLOBALFOUNDRIES INC.Inventors: Mohammed Radwan, Johann Steinmetz
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Publication number: 20110236713Abstract: The invention relates to a functionally graded material shape (1) where a first material (M1) is fused with a second material (M2) through sintering and a method of production of said functionally graded material shape (1). Said first material (M1) has a first coefficient of thermal expansion (?1) and said second material (M2) has a second coefficient of thermal expansion (?2), differing from the first coefficient of thermal expansion (?1). The invention is characterized in that the shape (1) further comprises a third material (M3) adapted to, together with M1 and M2, create an intermediate composite material phase intermixed between the first and the second materials (M1, M2). Said third material (M3) has a coefficient of thermal expansion (?3) intermediate between the first coefficient of thermal expansion (?1) of the first material (M1) and the second coefficient of thermal expansion (?2) of the second material (M2).Type: ApplicationFiled: February 14, 2011Publication date: September 29, 2011Applicant: Diamorph ABInventors: Mohamed Radwan, Katarina Flodstrom, Saeid Esmaeilzadeh
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Patent number: 7994927Abstract: A water meter with an emergency shutdown is a dual purpose water meter, which records the accumulated water consumption of individual runs as any regular water meter, and detects water leakage or uncontrolled flow by comparing each single continuous run in non-equal batches with a set target quantity. The water meter shuts down the water flow if a single continuous run reach that target. The water meter is adaptable to any type of water meter or method of recording, turbine, vertical turbine, positive displacement, multiple jet, propeller, or magnetic or electronic flow measuring.Type: GrantFiled: March 12, 2006Date of Patent: August 9, 2011Inventor: Mohamed Radwan Rafaat Atassi
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Patent number: 7980066Abstract: A method to operate an electronically controlled internal combustion engine that recognizes when thermal management mode of operation is being applied to an engine but is not attaining desired exhaust temperature for aftertreatment. When the Engine Control System (ECS) recognizes that the engine in operating in thermal management mode in a futile effort, the ECS aborts thermal management mode and returns to normal operating mode.Type: GrantFiled: December 19, 2007Date of Patent: July 19, 2011Assignee: Detroit Diesel CorporationInventors: Matthew Thomas Baird, Amr Mohamed Radwan, Kevin Dean Sisken, Bryant Chan Pham
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Patent number: 7845369Abstract: A volumetric metering smart valve shuts down automatically when a certain amount of liquid has passed through the valve. This valve has a water wheel which is rotated by the liquid and which drives a disc via a gear train. If the flowing amount exceeds a preset limit, the disc operates a ratchet and spring acting on a column in a closing direction to shut down the valve.Type: GrantFiled: October 4, 2004Date of Patent: December 7, 2010Inventor: Mohamed Radwan Rafaat Atassi
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Publication number: 20090085756Abstract: A water meter with an emergency shutdown is a dual purpose water meter, which records the accumulated water consumption of individual runs as any regular water meter, and detects water leakage or uncontrolled flow by comparing each single continuous run in non-equal batches with a set target quantity. The water meter shuts down the water flow if a single continuous run reach that target. The water matter is adaptable to any type of water meter or method of recording, turbine, vertical turbine, positive displacement, multiple jet, propeller, or magnetic or electronic flow measuring.Type: ApplicationFiled: March 12, 2006Publication date: April 2, 2009Inventor: Mohamed Radwan Rafaat Atassi
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Publication number: 20080073607Abstract: A volumetric metering smart valve shuts down automatically when a certain amount of liquid has passed through the valve. This valve has a water wheel which is rotated by the liquid and which drives a disc via a gear train. If the flowing amount exceeds a preset limit, the disc operates a ratchet and spring acting on a column in a closing direction to shut down the valve.Type: ApplicationFiled: October 4, 2004Publication date: March 27, 2008Inventor: Mohamed Radwan Rafaat Atassi