Patents by Inventor Mojtaba Samiee

Mojtaba Samiee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260159949
    Abstract: Various embodiments of the present technology may provide a radiation shield formed from a body having a plurality of cutouts. The radiation shield may also include a plurality of removable segments that are shaped to be disposed within the cutouts.
    Type: Application
    Filed: December 3, 2025
    Publication date: June 11, 2026
    Inventors: Xu Huang, Shuyang Zhang, Ali Al janabi, Estiaque Haidar Shourov, Jian-Wei Liang, Mojtaba Samiee
  • Publication number: 20260107745
    Abstract: A substrate processing method for forming a thin film includes providing or forming a transition metal nitride film on a substrate in a reaction chamber and exposing the transition metal nitride film to a hydrogen treatment to form a treated transition metal compound film. The hydrogen treatment may lower the resistivity of the transition metal nitride film and/or be used to desirably tune other properties and/or composition of the transition metal nitride film.
    Type: Application
    Filed: October 7, 2025
    Publication date: April 16, 2026
    Inventors: Estiaque Haidar Shourov, Balaji Kannan, Jian-Wei Liang, Mojtaba Samiee, Madhan Kumar Arulanandam, Ali Al janabi, Wei Li
  • Publication number: 20250305133
    Abstract: Disclosed is a method, system and apparatus for depositing a composite film, comprising providing a substrate in a reaction chamber, depositing a first material layer comprising a first metal nitride according to a first cyclic deposition process, depositing a second material layer comprising aluminum carbide according to a second cyclic deposition process and depositing a third material layer comprising a second metal nitride according to a third cyclic deposition process.
    Type: Application
    Filed: March 21, 2025
    Publication date: October 2, 2025
    Inventors: Wei Li, Sisi Wang, Mojtaba Samiee, Balaji Kannan
  • Publication number: 20240420958
    Abstract: Methods, system and apparatus for semiconductor processing including supporting a substrate comprising one or more oxide layers disposed on the substrate on a substrate support in a first reaction chamber, contacting a top surface of the one or more oxide layers of the substrate with an excited species, supporting the substrate in a second reaction chamber and depositing a transition metal layer over the top surface subsequent to contacting the top surface with the excited species.
    Type: Application
    Filed: June 12, 2024
    Publication date: December 19, 2024
    Inventors: Venkata Surya Naga Raju Chava, Estiaque Haidar Shourov, Robert Brennan Milligan, Mojtaba Samiee, Balaji Kannan, Dong Li, Rajkumar Jakkaraju
  • Publication number: 20230238243
    Abstract: Methods of forming structures including a layer of metal carbon nitride (MCN) and of mitigating metal loss from and/or tuning the layer of metal carbon nitride are disclosed. Systems for forming the layers and mitigating metal loss and structures formed using the methods are also disclosed.
    Type: Application
    Filed: January 23, 2023
    Publication date: July 27, 2023
    Inventors: Mojtaba Samiee, Petri Raisanen, Dong Li, Yasiel Cabrera
  • Patent number: D1098060
    Type: Grant
    Filed: February 5, 2024
    Date of Patent: October 14, 2025
    Assignee: ASM IP Holding B.V.
    Inventors: Raghav Vishnu Rao, Mojtaba Samiee, Ali Aljanabi, Shuyang Zhang, Estiaque Haidar Shourov
  • Patent number: D1109284
    Type: Grant
    Filed: June 7, 2024
    Date of Patent: January 13, 2026
    Assignee: ASM IP Holding B.V.
    Inventors: Changyu Meng, Shuyang Zhang, Jereld Lee Winkler, Estiaque Haidar Shourov, Mojtaba Samiee, Jian-Wei Liang, Ziad Marwan Naboulsi