Patents by Inventor MOLLY CHANG
MOLLY CHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230369309Abstract: Provided is a method for inserting a pre-designed filler cell, as a replacement to a standard filler cell, including identifying at least one gap among a plurality of functional cells. In some embodiments, a pre-designed filler cell is inserted within the at least one gap. By way of example, the pre-designed filler cell includes a layout design having a pattern associated with a particular failure mode. In various embodiments, a layer is patterned on a semiconductor substrate such that the pattern of the layout design is transferred to the layer on the semiconductor substrate. Thereafter, the patterned layer is inspected using an electron beam (e-beam) inspection process.Type: ApplicationFiled: July 24, 2023Publication date: November 16, 2023Inventors: Tseng Chin LO, Molly CHANG, Ya-Wen TSENG, Chih-Ting SUN, Zi-Kuan LI, Bo-Sen CHANG, Geng-He LIN
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Patent number: 11776948Abstract: Provided is a method for inserting a pre-designed filler cell, as a replacement to a standard filler cell, including identifying at least one gap among a plurality of functional cells. In some embodiments, a pre-designed filler cell is inserted within the at least one gap. By way of example, the pre-designed filler cell includes a layout design having a pattern associated with a particular failure mode. In various embodiments, a layer is patterned on a semiconductor substrate such that the pattern of the layout design is transferred to the layer on the semiconductor substrate. Thereafter, the patterned layer is inspected using an electron beam (e-beam) inspection process.Type: GrantFiled: April 18, 2022Date of Patent: October 3, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tseng Chin Lo, Molly Chang, Ya-Wen Tseng, Chih-Ting Sun, Zi-Kuan Li, Bo-Sen Chang, Geng-He Lin
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Publication number: 20220246600Abstract: Provided is a method for inserting a pre-designed filler cell, as a replacement to a standard filler cell, including identifying at least one gap among a plurality of functional cells. In some embodiments, a pre-designed filler cell is inserted within the at least one gap. By way of example, the pre-designed filler cell includes a layout design having a pattern associated with a particular failure mode. In various embodiments, a layer is patterned on a semiconductor substrate such that the pattern of the layout design is transferred to the layer on the semiconductor substrate. Thereafter, the patterned layer is inspected using an electron beam (e-beam) inspection process.Type: ApplicationFiled: April 18, 2022Publication date: August 4, 2022Inventors: Tseng Chin LO, Molly CHANG, Ya-Wen TSENG, Chih-Ting SUN, Zi-Kuan LI, Bo-Sen CHANG, Geng-He LIN
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Patent number: 11309307Abstract: Provided is a method for inserting a pre-designed filler cell, as a replacement to a standard filler cell, including identifying at least one gap among a plurality of functional cells. In some embodiments, a pre-designed filler cell is inserted within the at least one gap. By way of example, the pre-designed filler cell includes a layout design having a pattern associated with a particular failure mode. In various embodiments, a layer is patterned on a semiconductor substrate such that the pattern of the layout design is transferred to the layer on the semiconductor substrate. Thereafter, the patterned layer is inspected using an electron beam (e-beam) inspection process.Type: GrantFiled: June 8, 2020Date of Patent: April 19, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tseng Chin Lo, Molly Chang, Ya-Wen Tseng, Chih-Ting Sun, Zi-Kuan Li, Bo-Sen Chang, Geng-He Lin
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Patent number: 10976983Abstract: In an approach for smart collaboration, a plurality of images are received. Each image of the plurality of images is from a different device of a plurality of devices. The plurality of images are combined into a single combined image. The combined image is transferred to the plurality of devices.Type: GrantFiled: March 26, 2019Date of Patent: April 13, 2021Assignee: International Business Machines CorporationInventors: Der-Joung Wang, David Shao Chung Chen, Lilian Lai, Louis Huang, Wei-Te Chiang, Molly Chang, Po-Hsun Tseng, Kuo-Liang Chou
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Publication number: 20200310737Abstract: In an approach for smart collaboration, a plurality of images are received. Each image of the plurality of images is from a different device of a plurality of devices. The plurality of images are combined into a single combined image. The combined image is transferred to the plurality of devices.Type: ApplicationFiled: March 26, 2019Publication date: October 1, 2020Inventors: Der-Joung Wang, David Shao Chung Chen, Lilian Lai, Louis Huang, Wei-Te Chiang, Molly Chang, Po-Hsun Tseng, Kuo-Liang Chou
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Publication number: 20200303366Abstract: Provided is a method for inserting a pre-designed filler cell, as a replacement to a standard filler cell, including identifying at least one gap among a plurality of functional cells. In some embodiments, a pre-designed filler cell is inserted within the at least one gap. By way of example, the pre-designed filler cell includes a layout design having a pattern associated with a particular failure mode. In various embodiments, a layer is patterned on a semiconductor substrate such that the pattern of the layout design is transferred to the layer on the semiconductor substrate. Thereafter, the patterned layer is inspected using an electron beam (e-beam) inspection process.Type: ApplicationFiled: June 8, 2020Publication date: September 24, 2020Inventors: Tseng Chin LO, Molly CHANG, Ya-Wen TSENG, Chih-Ting SUN, Zi-Kuan LI, Bo-Sen CHANG, Geng-He LIN
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Patent number: 10679980Abstract: Provided is a method for inserting a pre-designed filler cell, as a replacement to a standard filler cell, including identifying at least one gap among a plurality of functional cells. In some embodiments, a pre-designed filler cell is inserted within the at least one gap. By way of example, the pre-designed filler cell includes a layout design having a pattern associated with a particular failure mode. In various embodiments, a layer is patterned on a semiconductor substrate such that the pattern of the layout design is transferred to the layer on the semiconductor substrate. Thereafter, the patterned layer is inspected using an electron beam (e-beam) inspection process.Type: GrantFiled: August 14, 2019Date of Patent: June 9, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tseng Chin Lo, Molly Chang, Ya-Wen Tseng, Chih-Ting Sun, Zi-Kuan Li, Bo-Sen Chang, Geng-He Lin
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Publication number: 20190371783Abstract: Provided is a method for inserting a pre-designed filler cell, as a replacement to a standard filler cell, including identifying at least one gap among a plurality of functional cells. In some embodiments, a pre-designed filler cell is inserted within the at least one gap. By way of example, the pre-designed filler cell includes a layout design having a pattern associated with a particular failure mode. In various embodiments, a layer is patterned on a semiconductor substrate such that the pattern of the layout design is transferred to the layer on the semiconductor substrate. Thereafter, the patterned layer is inspected using an electron beam (e-beam) inspection process.Type: ApplicationFiled: August 14, 2019Publication date: December 5, 2019Inventors: Tseng Chin LO, Molly CHANG, Ya-Wen TSENG, Chih-Ting SUN, Zi-Kuan LI, Bo-Sen CHANG, Geng-He LIN
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Patent number: 10388645Abstract: Provided is a method for inserting a pre-designed filler cell, as a replacement to a standard filler cell, including identifying at least one gap among a plurality of functional cells. In some embodiments, a pre-designed filler cell is inserted within the at least one gap. By way of example, the pre-designed filler cell includes a layout design having a pattern associated with a particular failure mode. In various embodiments, a layer is patterned on a semiconductor substrate such that the pattern of the layout design is transferred to the layer on the semiconductor substrate. Thereafter, the patterned layer is inspected using an electron beam (e-beam) inspection process.Type: GrantFiled: July 27, 2018Date of Patent: August 20, 2019Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Tseng Chin Lo, Molly Chang, Ya-Wen Tseng, Chih-Ting Sun, Zi-Kuan Li, Bo-Sen Chang, Geng-He Lin
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Patent number: 10283496Abstract: Provided is a method for inserting a pre-designed filler cell, as a replacement to a standard filler cell, including identifying at least one gap among a plurality of functional cells. In some embodiments, a pre-designed filler cell is inserted within the at least one gap. By way of example, the pre-designed filler cell includes a layout design having a pattern associated with a particular failure mode. In various embodiments, a layer is patterned on a semiconductor substrate such that the pattern of the layout design is transferred to the layer on the semiconductor substrate. Thereafter, the patterned layer is inspected using an electron beam (e-beam) inspection process.Type: GrantFiled: April 11, 2017Date of Patent: May 7, 2019Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Tseng Chin Lo, Molly Chang, Ya-Wen Tseng, Chih-Ting Sun, Zi-Kuan Li, Bo-Sen Chang, Geng-He Lin
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Patent number: 10282174Abstract: A method for processing software layout can include exporting layout setting information from design elements of a software; formatting the layout setting information, and storing it in a layout characteristic file; and importing the layout setting information in the layout characteristic file into design elements of another software. Layout information of each language can be stored in a customizable layout characteristic file.Type: GrantFiled: March 30, 2012Date of Patent: May 7, 2019Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Molly Chang, Xiao Feng Ji, Michael R. O'Brien
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Publication number: 20180358348Abstract: Provided is a method for inserting a pre-designed filler cell, as a replacement to a standard filler cell, including identifying at least one gap among a plurality of functional cells. In some embodiments, a pre-designed filler cell is inserted within the at least one gap. By way of example, the pre-designed filler cell includes a layout design having a pattern associated with a particular failure mode. In various embodiments, a layer is patterned on a semiconductor substrate such that the pattern of the layout design is transferred to the layer on the semiconductor substrate. Thereafter, the patterned layer is inspected using an electron beam (e-beam) inspection process.Type: ApplicationFiled: July 27, 2018Publication date: December 13, 2018Inventors: Tseng Chin LO, Molly CHANG, Ya-Wen TSENG, Chih-Ting SUN, Zi-Kuan LI, Bo-Sen CHANG, Geng-He LIN
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Publication number: 20180006010Abstract: Provided is a method for inserting a pre-designed filler cell, as a replacement to a standard filler cell, including identifying at least one gap among a plurality of functional cells. In some embodiments, a pre-designed filler cell is inserted within the at least one gap. By way of example, the pre-designed filler cell includes a layout design having a pattern associated with a particular failure mode. In various embodiments, a layer is patterned on a semiconductor substrate such that the pattern of the layout design is transferred to the layer on the semiconductor substrate. Thereafter, the patterned layer is inspected using an electron beam (e-beam) inspection process.Type: ApplicationFiled: April 11, 2017Publication date: January 4, 2018Inventors: Tseng Chin LO, Molly Chang, Ya-Wen TSENG, Chih-Ting SUN, Zi-Kuan LI, Bo-Sen CHANG, Geng-He LIN
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Publication number: 20120254833Abstract: A method for processing software layout can include exporting layout setting information from design elements of a software; formatting the layout setting information, and storing it in a layout characteristic file; and importing the layout setting information in the layout characteristic file into design elements of another software. Layout information of each language can be stored in a customizable layout characteristic file.Type: ApplicationFiled: March 30, 2012Publication date: October 4, 2012Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: MOLLY CHANG, XIAO FENG JI, MICHAEL R. O'BRIEN