Patents by Inventor Momme Mommsen

Momme Mommsen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10546717
    Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.
    Type: Grant
    Filed: March 19, 2018
    Date of Patent: January 28, 2020
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Edgar Fichter, Joerg Fober, Dirk Preikszas, Christian Hendrich, Michael Schnell, Momme Mommsen
  • Publication number: 20180211815
    Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.
    Type: Application
    Filed: March 19, 2018
    Publication date: July 26, 2018
    Inventors: Edgar Fichter, Joerg Fober, Dirk Preikszas, Christian Hendrich, Michael Schnell, Momme Mommsen
  • Patent number: 9953804
    Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.
    Type: Grant
    Filed: April 22, 2016
    Date of Patent: April 24, 2018
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Edgar Fichter, Joerg Fober, Dirk Preikszas, Christian Hendrich, Michael Schnell, Momme Mommsen
  • Patent number: 9947504
    Abstract: The system described herein relates to a particle beam apparatus for analyzing and/or for processing an object and to a method for operating a particle beam apparatus. The particle beam apparatus is designed for example as an electron beam apparatus and/or an ion beam apparatus. The particle beam apparatus comprises a beam deflection device, for example an objective lens, which is provided with a first coil and a second coil. The first coil is operated with a first coil current. The second coil is operated with a second coil current. The first coil current and/or the second coil current may always be controlled in such a way that the sum of the first coil current and the second coil current (the summation current) or the difference between the first coil current and the second coil current (the difference current) is controlled to a setpoint value.
    Type: Grant
    Filed: June 13, 2016
    Date of Patent: April 17, 2018
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Klaus Hegele, Edgar Fichter, Michel Aliman, Dirk Preikszas, Christian Hendrich, Momme Mommsen, Michael Schnell, Kai Schubert
  • Publication number: 20170236683
    Abstract: The system described herein relates to a particle beam apparatus for analyzing and/or for processing an object and to a method for operating a particle beam apparatus. The particle beam apparatus is designed for example as an electron beam apparatus and/or an ion beam apparatus. The particle beam apparatus comprises a beam deflection device, for example an objective lens, which is provided with a first coil and a second coil. The first coil is operated with a first coil current. The second coil is operated with a second coil current. The first coil current and/or the second coil current may always be controlled in such a way that the sum of the first coil current and the second coil current (the summation current) or the difference between the first coil current and the second coil current (the difference current) is controlled to a setpoint value.
    Type: Application
    Filed: June 13, 2016
    Publication date: August 17, 2017
    Inventors: Klaus Hegele, Edgar Fichter, Michel Aliman, Dirk Preikszas, Christian Hendrich, Momme Mommsen, Michael Schnell, Kai Schubert
  • Publication number: 20160314931
    Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.
    Type: Application
    Filed: April 22, 2016
    Publication date: October 27, 2016
    Inventors: Edgar Fichter, Joerg Fober, Dirk Preikszas, Christian Hendrich, Michael Schnell, Momme Mommsen
  • Patent number: 9312093
    Abstract: A particle beam device comprises a beam generator for generating a particle beam having charged particles and an electrode unit having a first electrode and a second electrode, wherein the first electrode interacts with the second electrode, in particular for guiding, shaping, aligning or correcting the particle beam. Moreover, the particle beam device comprises a low-pass filter being connected with at least one of: the first electrode and the second electrode, using an electrical connection. Additionally, the particle beam device comprises a mounting unit having an opening for the passage of the particle beam, wherein the at least one low-pass filter, the first electrode and the second electrode are arranged at the mounting unit. The electrode unit may comprise more than two electrodes, for example up to 16 electrodes.
    Type: Grant
    Filed: July 2, 2014
    Date of Patent: April 12, 2016
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Joerg Fober, Edgar Fichter, Kai Schubert, Dirk Preikszas, Christian Hendrich, Momme Mommsen, Michael Schnell, Lorenz Lechner
  • Patent number: 8063364
    Abstract: A particle optical apparatus has a particle source for generating at least one beam of charged particles, and a magnet arrangement having two pole plates, which are arranged spaced apart from one another, such that the at least one beam of charged particles in operation passes through the pole plates, wherein trenches are provided in the pole plates, in which trenches coil wires are arranged. The trenches, when viewed in a cross section transverse to an extension direction of the trenches, have a smaller width in a region of a surface of the pole plates, than in a region arranged at a distance from the surface.
    Type: Grant
    Filed: December 22, 2009
    Date of Patent: November 22, 2011
    Assignee: Carl Zeiss NTS GmbH
    Inventors: Dirk Preikszas, Michael Steigerwald, Daniel Tobias, Andreas Eisele, Momme Mommsen, Dietmar Doenitz, Christian Hendrich
  • Publication number: 20100155597
    Abstract: A particle optical apparatus has a particle source for generating at least one beam of charged particles, and a magnet arrangement having two pole plates, which are arranged spaced apart from one another, such that the at least one beam of charged particles in operation passes through the pole plates, wherein trenches are provided in the pole plates, in which trenches coil wires are arranged. The trenches, when viewed in a cross section transverse to an extension direction of the trenches, have a smaller width in a region of a surface of the pole plates, than in a region arranged at a distance from the surface.
    Type: Application
    Filed: December 22, 2009
    Publication date: June 24, 2010
    Applicant: CARL ZEISS NTS GMBH
    Inventors: Dirk PREIKSZAS, Michael STEIGERWALD, Daniel TOBIAS, Andreas EISELE, Momme MOMMSEN, Dietmar DOENITZ, Christian HENDRICH