Abstract: A method of manufacturing an electric component disclosed. A first electrically conducting layer including a first electrode of the electric component is formed on a substrate. An interlayer of a dielectric material is formed on the first electrically conducting layer, the dielectric material including an electrically insulating material. A further layer of a dielectric material is deposited on the interlayer of dielectric material, the further layer including a photo-patternable electrically insulating material. Both the further layer and said interlayer are structured, wherein the further layer of the dielectric material is used as a mask for the interlayer. A second electrically conducting layer including a second electrode of the electric component is then formed.

Abstract: The invention relates to a display structure comprising an electrode layer (3) superposed on a sub-layer (5) wherein a surface of the sub-layer facing the electrode layer is roughened. In particular, the display structure may relate to a TFT stack comprising a layer of an electrode metal corresponding to a pixel electrode (3). The pixel pad together with the data line (1) is used for charging of the pixel pad. The gate electrode (4) used is separated from the source and drain electrode (1, 3) by a dielectric layer (6). The structural layers of the TFT may be deposited on a suitable flexible substrate (7). In order to prevent defects in the light modulating layer (9) from being visible, a surface of the sub-layer (5) underlying the electrode layer (3) is roughened. It is desirable to provide such improvement to, among others, electrophoretic-type displays and liquid crystal-type displays.

Abstract: A method of manufacturing an electric component disclosed. A first electrically conducting layer including a first electrode of the electric component is formed on a substrate. An interlayer of a dielectric material is formed on the first electrically conducting layer, the dielectric material including an electrically insulating material. A further layer of a dielectric material is deposited on the interlayer of dielectric material, the further layer including a photo-patternable electrically insulating material. Both the further layer and said interlayer are structured, wherein the further layer of the dielectric material is used as a mask for the interlayer. A second electrically conducting layer including a second electrode of the electric component is then formed.

Abstract: An electronic component, notably one including, for example, a TFT, a storage capacitor, or a crossing between electrically conductive layers of a stack device is disclosed. The electronic component comprises a substrate whereon a first electrically conductive layer forming electrode is provided. A second electrode formed by a second electrically conductive layer is separated from the first electrode by at least a dielectric layer, comprising an interlayer of an electrically insulating material, preferably having high resistance against electrical breakdown and a further layer of a photo-patternable electrically insulating material.

Abstract: The invention relates to an electronic device including a sequence of a first thin film transistor (TFT) and a second TFT, the first TFT including a first set of electrodes separated by a first insulator, the second TFT comprising a second set of electrodes separated by a second insulator, wherein the first set of electrodes and the second set of electrodes are formed from a first shared conductive layer and a second shared conductive layer, the first insulator and the second insulator being formed by a shared dielectric layer. The invention further relates to a method of manufacturing an electronic device.

Abstract: The invention relates to a display structure comprising an electrode layer (3) superposed on a sub-layer (5) wherein a surface of the sub-layer facing the electrode layer is roughened. In particular, the display structure may relate to a TFT stack comprising a layer of an electrode metal corresponding to a pixel electrode (3). The pixel pad together with the data line (1) is used for charging of the pixel pad. The gate electrode (4) used is separated from the source and drain electrode (1, 3) by a dielectric layer (6). The structural layers of the TFT may be deposited on a suitable flexible substrate (7). In order to prevent defects in the light modulating layer (9) from being visible, a surface of the sub-layer (5) underlying the electrode layer (3) is roughened. It is desirable to provide such improvement to, among others, electrophoretic-type displays and liquid crystal-type displays.

Abstract: An electronic component, notably one including, for example, a TFT, a storage capacitor, or a crossing between electrically conductive layers of a stack device is disclosed. The electronic component comprises a substrate whereon a first electrically conductive layer forming electrode is provided. A second electrode formed by a second electrically conductive layer is separated from the first electrode by at least a dielectric layer, comprising an interlayer of an electrically insulating material, preferably having high resistance against view (a) electrical breakdown and a further layer of a photo-patternable electrically insulating material.

Abstract: The invention relates to an electronic device comprising a sequence of a first thin film transistor (TFT) and a second TFT, the first TFT comprising a first set of electrodes separated by a first insulator, the second TFT comprising a second set of electrodes separated by a second insulator, wherein the first set of electrodes and the second set of electrodes are formed from a first shared conductive layer and a second shared conductive layer, the first insulator and the second insulator being formed by a shared dielectric layer. The invention further relates to a method of manufacturing an electronic device.