Patents by Inventor Monika Gschoederer

Monika Gschoederer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for fabricating an integrated semiconductor circuit
    Patent number: 7007260
    Abstract: A method for fabricating an integrated semiconductor circuit having at least two different wiring forms realized in a same metallization plane includes drawing each of the different wiring forms on respectively different layer types. In this manner, the at least two different wiring forms can be individually and jointly analyzed.
    Type: Grant
    Filed: October 18, 2002
    Date of Patent: February 28, 2006
    Assignee: Infineon Technologies AG
    Inventors: Helge Altfeld, Monika Gschöderer, Michael Eisenhut, Marc Walter, Beate Frankowsky
  • Reduced pad erosion
    Patent number: 6124206
    Abstract: An improved hard mask is provided to reduced pad erosion during semiconductor fabrication. The hard mask includes an etch stop layer between first and second hard mask layers.
    Type: Grant
    Filed: December 29, 1997
    Date of Patent: September 26, 2000
    Assignee: Siemens Aktiengesellschaft
    Inventors: Bertrand Flietner, Robert Ploessl, Monika Gschoederer